Abstract: A method is disclosed for selecting a minimum of one wavelength 320 or a minimum of one wavelength range 206 of electromagnetic radiation to be used for object testing, whereby a first spectrum is captured or calculated on a first point of a first object 509, a second spectrum is captured or calculated on a second point of the first 509 or a second object, a difference spectrum is formed from the first and the second spectrum, and the minimum of one wavelength 320 or minimum of one wavelength range 26 is selected in the difference spectrum according to predetermined criteria; as well as a microscope 500 with means of the illumination 502, capture 503, and analysis 504, whereby the illumination means illuminate an object 509, and the capture means capture a first spectrum on a first point on a first object, the capture means capture a second spectrum on a second point of the first or on a second object, and the analysis means form a difference spectrum as a difference between the first and the second spectrum.

Abstract: In a device for examining a specimen with an electron beam, in particular an SEM, TEM, or CSEM, contamination products are often result from the irradiation. To reduce these contamination products, the surface of the object irradiated with the electron beam is simultaneously illuminated with light, in particular with UV light.

Abstract: An apparatus (2) and a method for the determination of positioning coordinates for at least one semiconductor substrate (6) are disclosed. A digital camera (11) for acquiring an image of the surface (4) of the semiconductor substrate (6) is provided. A computer system is provided, having a display (41) on which the image of the surface (4) of the semiconductor substrate (6) is presentable. By way of an input means (44), a user can mark at least one site (34) of interest on the surface (4) of the semiconductor substrate (6). A measuring machine (24) then automatically travels to the at least one defined site (34) and carries out the desired measurement or examination.

Abstract: In a device for examining a specimen with an electron beam, in particular an SEM, TEM, or CSEM, contamination products are often result from the irradiation. To reduce these contamination products, the surface of the object irradiated with the electron beam is simultaneously illuminated with light, in particular with UV light.