Abstract: A transfer apparatus includes a multi-arm apparatus, a controller, and a vacuum part. The multi-arm apparatus has a plurality of blades for vacuum-absorbing or vacuum-retaining a semiconductor substrate, a fixed body joined to each of blades, and a positioning apparatus joined to each fixed body for rotational or straight-line movement of the fixed body and the blades. The apparatus further includes vacuum lines that are formed within the multi-arm apparatus. The vacuum lines are selectively opened and closed. Even when there is a vacant slot in the FOUP, a plurality of wafers can be concurrently unloaded.

Abstract: An alarm system for a semiconductor device fabrication facility for monitoring the current operation state of the facility performing a process, such as ion-implantation, includes a lamp tower which is visibly recognizable from a distance via lighted lamps. The alarm system includes a logical circuit for executing logical-combination based on at least one input signal indicating respective operation states of the facility; and a driver which outputs at least one driving signal for driving a lamp based on the result from the logical circuit. The number of the lamps is identical to the number of driving signals output from the driver based on a one-to-one correspondence, and each of the lamps indicates a particular result for the respective operation states of the facility.

Abstract: There is provided a monitoring system for monitoring semiconductor device fabrication facilities by allocating a specific frequency on each of the semiconductor device fabrication facilities, and connecting between each of the facilities and a central monitoring apparatus with information transmission line and selective signal line thereby simplifying the monitoring lines.

Abstract: An exhaust system of an ion implanter that eliminates moisture in the process stream comprises: an exhaust pump positioned within the ion implanter; a main exhaust duct positioned outside the ion implanter; an exhaust line extending between the exhaust pump and the main exhaust duct; a gas introduction unit for introducing a moisture eliminating gas into the exhaust line; and a scrubber for removing a predetermined gas from the process stream. By introducing the moisture-eliminating gas (which is preferably heated nitrogen) into the process stream, moisture contained therein is removed from the stream, and the events described hereinabove that produce a corona discharge within the exhaust line are prevented.