Abstract: A local server system and a method of relaying data in the local server system are disclosed. The local server system includes a database configured to store image data downloaded from a remote server, and a processor configured to request the image data from the remote server and download the image data. The processor requests first image data corresponding to first result data from the remote server. The processor downloads the first image data from the remote server. The processor generates second result data based on the downloaded first image data. The processor provides the second result data to the local client when the local client requests the second result data corresponding to the first image data from the remote server.

Abstract: A system and method for simulating the reconstructive surgery of a cruciate ligament using medical images are disclosed herein. The system includes a processor, the processor is configured to acquire a first image of a knee region of a subject, and a 3D model including the knee region, identify the locations of reference points, on the 3D model, acquire a second image corresponding to the changes in the movement of the knee region, and track changes in the locations of the reference points using the acquired second image, and simulate changes in the length of a virtual ligament attributable to the changes in the movement of the knee region based on the tracked changes in the locations of the reference points and the location of the insertion of the virtual ligament received from a user.

Abstract: Disclosed are an apparatus and method for storing and displaying images in a picture archiving and communication system (PACS). The apparatus, comprising: a processor configured to: generate a two-dimensional (2D) medical image for a three-dimensional (3D) medical image at each of reference points of a predetermined (3D) screen model; and store the generated (2D) medical image along with attribute information related to the generation of the (2D) medical image to a storage device or a memory.

Abstract: A supporter and a vacuum cleaner having the same are provided. The supporter includes: a suction channel portion that includes one end removably connected with a vacuum cleaning unit and the other end connected with a suction nozzle, thereby guiding dirt drawn in through the suction nozzle to the vacuum cleaning unit; an accessory that is received in a receiving recess formed on one side of the suction channel portion; a hinge portion that is disposed in the suction channel portion and supports the accessory to pivot by a predetermined angle; and an unlocking portion that is disposed in the suction channel portion to lock and unlock the accessory with respect to the receiving recess.

Abstract: A hydraulic system for a construction machine is provided, which enables a user to set or release a preferential function when an excavation work or leveling work using an excavator is performed.

Abstract: A method of forming an active region structure includes preparing a semiconductor substrate including a cell array region and a peripheral circuit region, forming preliminary cell active regions in the cell array region of the semiconductor substrate, and forming cell active regions in the preliminary cell active regions and at least one peripheral active region in the peripheral circuit region of the semiconductor substrate, such that the preliminary cell active regions, the cell active regions, and the at least one peripheral active region are integrally formed with the semiconductor substrate and protrude from the semiconductor substrate.

Abstract: A method of designing a lithographic mask for use in lithographic processing of a substrate is disclosed. The lithographic processing comprises irradiating mask features of a lithographic mask using a predetermined irradiation configuration. In one aspect, the method comprises obtaining an initial design for the lithographic mask comprising a plurality of initial design features having an initial position. The method further comprises applying at least one shift to at least one initial design feature and deriving there from an altered design so as to compensate for shadowing effects when irradiating the substrate using a lithographic mask corresponding to the altered design in the predetermined irradiation configuration. Also disclosed herein are a corresponding design, a method of setting up lithographic processing, a system for designing a lithographic mask, a lithographic mask, and a method of manufacturing it.

Abstract: A method of forming an active region structure includes preparing a semiconductor substrate including a cell array region and a peripheral circuit region, forming preliminary cell active regions in the cell array region of the semiconductor substrate, and forming cell active regions in the preliminary cell active regions and at least one peripheral active region in the peripheral circuit region of the semiconductor substrate, such that the preliminary cell active regions, the cell active regions, and the at least one peripheral active region are integrally formed with the semiconductor substrate and protrude from the semiconductor substrate.

Abstract: There are provided methods of performing a photolithography process for forming asymmetric semiconductor patterns and methods of forming a semiconductor device using the same. These methods provide a way of forming asymmetric semiconductor patterns on a photoresist layer through two exposure processes. To this end, a semiconductor substrate is prepared. A planarized insulating interlayer and a photoresist layer are sequentially formed on the overall surface of the semiconductor substrate. A first semiconductor pattern of a photolithography mask is transferred to the photoresist layer, thereby forming a photoresist pattern on the photoresist layer. A second semiconductor pattern of a second photolithography mask is continuously transferred to the photoresist layer, thereby forming a second photoresist pattern on the photoresist layer.

Abstract: A multiple exposure system and a multiple exposure method using the same enhance the resolution of the image of the mask pattern transferred to a substrate. The system includes NA controllers that provide excellent resolution with respect to the directions of the short axis and long axis of the mask pattern. In one form of the method, a first exposure process is performed using a first NA controller that provides excellent resolution with respect to the direction of the short axis of the mask pattern and subsequently, a second exposure process is performed using a second NA controller that provides excellent resolution with respect to the direction of the long axis of the mask pattern. Alternatively, the first exposure process and the second or high order exposure process can be sequentially performed using the first and second NA controllers simultaneously.