Patents by Inventor ByeoungSu Hwang

ByeoungSu Hwang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Secondary target design for optical measurements
    Patent number: 9311431
    Abstract: The disclosure is directed to improving optical metrology for a sample with complex structural attributes utilizing custom designed secondary targets. At least one parameter of a secondary target may be controlled to improve sensitivity for a selected parameter of a primary target and/or to reduce correlation of the selected parameter with other parameters of the primary target. Parameters for the primary and secondary target may be collected. The parameters may be incorporated into a scatterometry model. Simulations utilizing the scatterometry model may be conducted to determine a level of sensitivity or a level of correlation for the selected parameter of the primary target. The controlled parameter of the secondary target may be modified until a selected level of sensitivity or a selected level of correlation is achieved.
    Type: Grant
    Filed: October 31, 2012
    Date of Patent: April 12, 2016
    Assignee: KLA-Tencor Corporation
    Inventors: Sungchul Yoo, Andrei V. Shchegrov, Thaddeus G. Dziura, InKyo Kim, SeungHwan Lee, ByeoungSu Hwang, Leonid Poslavsky