Abstract: According to an embodiment of the present inventive concept, an image sensor includes a sensor including a plurality of pixels and configured to capture incident light and generate raw image data; a pre-processing processor configured to generate first image data by applying a first function to the raw image data; an image processor configured to receive the first image data and generate second image data using a machine learning model; and a post-processing processor configured to generate third image data by applying a second function to the second image data, wherein the first function is a non-linear function.

Abstract: A method for manufacturing a solar cell capable of significantly reducing the amount of wastewater generated during a wet-etching process and improving the efficiency of the solar cell. A method comprising: texturing to form an uneven structure on one semiconductor substrate surface by etching the semiconductor substrate surface with a texturing device; forming a temporary layer at an upper portion of the semiconductor substrate surface to surround a first byproduct layer formed at a predetermined region of the semiconductor substrate surface during the texturing; and doping the semiconductor substrate surface with a predetermined dopant using a doping device to form a first semiconductor layer and a second semiconductor layer disposed above the first semiconductor layer and having a different polarity than the first semiconductor layer. The first byproduct layer and the temporary layer are simultaneously removed.

Abstract: A method for manufacturing a solar cell capable of significantly reducing the amount of wastewater generated during a wet-etching process and improving the efficiency of the solar cell. A method comprising: texturing to form an uneven structure on one semiconductor substrate surface by etching the semiconductor substrate surface with a texturing device; forming a temporary layer at an upper portion of the semiconductor substrate surface to surround a first byproduct layer formed at a predetermined region of the semiconductor substrate surface during the texturing; and doping the semiconductor substrate surface with a predetermined dopant using a doping device to form a first semiconductor layer and a second semiconductor layer disposed above the first semiconductor layer and having a different polarity than the first semiconductor layer. The first byproduct layer and the temporary layer are simultaneously removed.