Patents by Inventor C. -H. Chang

C. -H. Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7928327
    Abstract: A shielding device configured to provide EMI and ESD protection includes an anti-ESD layer, a conductive layer, and an EMI blocking layer attached to each other in sequence. In addition, a supporting layer can be optionally attached to the EMI blocking layer to increase the strength of the shielding device.
    Type: Grant
    Filed: August 18, 2008
    Date of Patent: April 19, 2011
    Assignee: Wistron Corporation
    Inventors: Lung-Fai Tuen, Andy C.H. Chang
  • Publication number: 20090114437
    Abstract: A shielding device configured to provide EMI and ESD protection includes an anti-ESD layer, a conductive layer, and an EMI blocking layer attached to each other in sequence. In addition, a supporting layer can be optionally attached to the EMI blocking layer to increase the strength of the shielding device.
    Type: Application
    Filed: August 18, 2008
    Publication date: May 7, 2009
    Inventors: Lung-Fai Tuen, Andy C.H. Chang
  • Patent number: 6730191
    Abstract: A polishing apparatus of a semiconductor wafer by a chemical-mechanical polishing method including a polishing platen having an upper surface on which a polishing pad is attached. The polishing platen is rotated in one direction along a central axis. A plurality of coaxial polishing-dressing head assemblies each having a lower surface opposed to an upper surface of the polishing pad on the polishing platen. Each of the coaxial assemblies holds a wafer to be polished while rotating along a central axis and pressing the rotating wafers on a radial portion of the rotating polishing pad. A polishing pad dressing ring is mounted coaxially encircling each of the wafer supporting heads. The applied compression on the wafer supporting heads pushes the wafer and the coaxially mounted dressing ring against the upper surface of the polishing pad therefore polishing each wafer while dressing the polishing pad.
    Type: Grant
    Filed: June 25, 2001
    Date of Patent: May 4, 2004
    Assignee: Vanguard International Semiconductor Corporation
    Inventor: Randy (C. H.) Chang
  • Publication number: 20020187651
    Abstract: A technique for controlling the oxidation of silicon is achieved by applying low temperature ammonia prior to the oxidation. The result is that the subsequent oxidation of the silicon is at a slower oxidation rate and higher nitrogen content. The higher nitrogen content is particularly beneficial for a gate dielectric because it acts as somewhat of a boron barrier and provides additional resistance to unwanted oxidation. The result is transistors with improved gate dielectric thickness uniformity across a wafer for a tighter threshold voltage distribution, reduced shift in threshold voltage, and improved time to breakdown.
    Type: Application
    Filed: June 11, 2001
    Publication date: December 12, 2002
    Inventors: Kimberly G. Reid, Hsing-Huang Tseng, Julie C.H. Chang, John R. Alvis
  • Publication number: 20020004306
    Abstract: A polishing apparatus of a semiconductor wafer by a chemical-mechanical polishing method including a polishing platen having an upper surface on which a polishing pad is attached. The polishing platen is rotated in one direction along a central axis. A plurality of coaxial polishing-dressing head assemblies each having a lower surface opposed to an upper surface of the polishing pad on the polishing platen. Each of the coaxial assemblies holds a wafer to be polished while rotating along a central axis and pressing the rotating wafers on a radial portion of the rotating polishing pad. A polishing pad dressing ring is mounted coaxially encircling each of the wafer supporting heads. The applied compression on the wafer supporting heads pushes the wafer and the coaxially mounted dressing ring against the upper surface of the polishing pad therefore polishing each wafer while dressing the polishing pad.
    Type: Application
    Filed: June 25, 2001
    Publication date: January 10, 2002
    Applicant: VANGUARD INTERNATIONAL SEMICONDUCTOR CORPORATION
    Inventor: Randy C.H. Chang
  • Patent number: 6277719
    Abstract: A method for forming a low resistance metal/polysilicon gate for use in CMOS devices comprising: (1) a novel anneal step prior to formation of a diffusion barrier layer and (2) a novel diffusion barrier layer composed of titanium nitride deposited over titanium silicide or titanium nitride deposited directly on the polysilicon. A first insulating layer is formed over a silicon substrate, and a polysilicon layer is formed over the first insulating layer. In a key step, the polysilicon layer is annealed to prevent peeling of the subsequently formed diffusion barrier layer. A diffusion barrier layer comprising titanium nitride deposited over titanium silicide or titanium nitride deposited directly on the polysilicon is formed over the polysilicon layer. A tungsten layer is formed over the diffusion barrier layer, and a capping layer comprising a silicon nitride layer over an oxide layer can be formed over the tungsten layer.
    Type: Grant
    Filed: November 15, 1999
    Date of Patent: August 21, 2001
    Assignee: Vanguard International Semiconductor Corporation
    Inventors: Jin-Dong Chern, Kwong-Jr Tsai, Ing-Ruey Liaw, Randy C. H. Chang
  • Patent number: 6271140
    Abstract: A polishing apparatus of a semiconductor wafer by a chemical-mechanical polishing method including a polishing platen having an upper surface on which a polishing pad is attached. The polishing platen is rotated in one direction along a central axis. A plurality of coaxial polishing-dressing head assemblies each having a lower surface opposed to an upper surface of the polishing pad on the polishing platen. Each of the coaxial assemblies holds a wafer to be polished while rotating along a central axis and pressing the rotating wafers on a radial portion of the rotating polishing pad. A polishing pad dressing ring is mounted coaxially encircling each of the wafer supporting heads. The applied compression on the wafer supporting heads pushes the wafer and the coaxially mounted dressing ring against the upper surface of the polishing pad therefore polishing each wafer while dressing the polishing pad.
    Type: Grant
    Filed: October 1, 1998
    Date of Patent: August 7, 2001
    Assignee: Vanguard International Semiconductor Corporation
    Inventor: Randy (C. H.) Chang
  • Patent number: 6162485
    Abstract: A system for forming fingerprints comprises a substrate bearing a designated print image-forming area and a localized coating of pressure-sensitive microcapsules containing a substantially colorless, image-forming reactant in the form of a color former or color-developer for forming a latent or visible image of a fingerprint in the designated print image-forming area. An image-developing device comprising a transparent film coated with a dual-functional adhesive composition comprising a pressure-sensitive adhesive containing an image-forming co-reactant in the form of a color developer or color former is used to form a protected visible image in the designated print image-forming area when applied to the fingerprint image.
    Type: Grant
    Filed: May 7, 1998
    Date of Patent: December 19, 2000
    Assignee: Wallace Computers Services, Inc.
    Inventor: John C. H. Chang
  • Patent number: 6060428
    Abstract: A document capable of providing information under the application of heat, which comprises a first support having a first surface and a second surface, the first surface bearing an information area including a visible principal image, and at least one of said first support or second support bearing at least one localized coating comprising a substantially colorless, non-pressure sensitive, heat-activatable chromogenic composition capable of producing a first color under the application of heat, the chromogenic composition comprising a chromogenic compound and a color developer. The chromogenic compound and the color developer are substantially colorless solids in physical contact prior to reaction, but which can chemically react to produce a visible colored image by application of heat at temperatures above room temperature.
    Type: Grant
    Filed: May 7, 1998
    Date of Patent: May 9, 2000
    Assignee: Wallace Computer Services, Inc.
    Inventors: John C. H. Chang, Donald J. Hoffmann, Ronald R. Garrison, Derrick Kraus
  • Patent number: 5970875
    Abstract: A tamper evident document for use with an impact printer having an inked ribbon, which document comprises, a substrate having a first surface and a second surface, the first surface being adapted to receive a principal visible colored image by transfer from the inked ribbon of an impact printer and being substantially free from color forming compositions which react to form visible colored images, the second surface being coated with a self-contained pressure-sensitive chromogenic composition capable of reacting to form a visible colored mirror image on the second surface, the substrate being sufficiently translucent such that the second visible colored mirror image could be viewed from the first surface, if said second visible image were not totally blocked by said principal visible image, so as to determine whether the principal and second visible colored mirror images are in register.
    Type: Grant
    Filed: September 29, 1997
    Date of Patent: October 26, 1999
    Assignee: Wallace Computer Services, Inc.
    Inventors: Donald J. Hoffmann, John C. H. Chang
  • Patent number: 5898017
    Abstract: A heat-sensitive document capable of providing multiple colors comprising a support having at least one surface bearing a first coating comprising a substantially colorless, chromogenic composition which is capable of producing a first color, a second coating covering a portion of the first coating, the second coating being an opaque coating, comprising an opacifying agent and a hydrophobic, polymeric binding agent, and a localized third coating covering at least a portion of said second coating comprising a substantially colorless, heat-activatable chromogenic composition capable of producing a second color, preferably under the application of heat. The opaque coating is "dual-functional", since it both enhances multicolor image quality and acts as a primer for adhering the localized chromogenic coating composition.
    Type: Grant
    Filed: August 19, 1997
    Date of Patent: April 27, 1999
    Assignee: Wallace Computer Services, Inc.
    Inventor: John C. H. Chang
  • Patent number: 5880063
    Abstract: Coverage of a chromogenic reaction product over a substrate is improved by incorporating a color developer in the substrate and coating the substrate with a color former to form a colored reaction product.
    Type: Grant
    Filed: March 6, 1997
    Date of Patent: March 9, 1999
    Assignee: Wallace Computer Services, Inc.
    Inventors: Donald J. Hoffman, John C. H. Chang
  • Patent number: 5759327
    Abstract: A business form comprising a substrate with at least one surface bearing a dual-functional coating comprising a copolymer of ethylene and vinyl acetate containing at least 40 weight percent ethylene and having a softening point of at least 60.degree. C. enhances adhesion of toner particles and is self-adhering under application of heat and pressure.
    Type: Grant
    Filed: May 7, 1996
    Date of Patent: June 2, 1998
    Assignee: Wallace Computer Services, Inc.
    Inventor: John C. H. Chang
  • Patent number: 5644352
    Abstract: A document capable of providing multiple colors under the application of heat comprising a support having at least one surface bearing a first coating comprising a substantially colorless, heat activatable chromogenic composition capable of producing a first color under the application of heat, and a second coating comprising a localized coating of a substantially colorless, heat activatable chromogenic composition capable of producing a second color under the application of heat. Each chromogenic composition comprises a chromogenic compound and a color developer that are substantially colorless solids in physical contact prior to reaction, but which can chemically react to produce a visible colored image by application of heat at temperatures above room temperature. Under the application of heat from a thermal printer, by quickly striking the chromogenic composition with a fingernail or blunt object to produce frictional heat, or other heat application, multicolored images are provided.
    Type: Grant
    Filed: March 6, 1996
    Date of Patent: July 1, 1997
    Assignee: Wallace Computer Services, Inc.
    Inventors: John C. H. Chang, Eric B. Wendler, Vance P. Gregory, Jr.
  • Patent number: 5618063
    Abstract: A document capable of providing multiple colors under the application of heat comprising a support having at least one surface bearing a first coating comprising a substantially colorless, heat activatable chromogenic composition capable of producing a first color under the application of heat, and a second coating comprising a localized coating of a substantially colorless, heat activatable chromogenic composition capable of producing a second color under the application of heat. Each chromogenic composition comprises a chromogenic compound and a color developer that are substantially colorless solids in physical contact prior to reaction, but which can chemically react to produce a visible colored image by application of heat at temperatures above room temperature. Under the application of heat from a thermal printer, by quickly striking the chromogenic composition with a fingernail or blunt object to produce frictional heat, or other heat application, multicolored images are provided.
    Type: Grant
    Filed: April 4, 1995
    Date of Patent: April 8, 1997
    Assignee: Wallace Computer Services, Inc.
    Inventors: John C. H. Chang, Eric B. Wendler, Vance P. Gregory, Jr.
  • Patent number: 5612541
    Abstract: An ultraviolet radiation monitoring kit comprising at least one first substrate and at least one second substrate, the second substrate being capable of being closely associated with at least one first substrate, the first substrate having an indicator area comprising a chromogenic composition, the chromogenic composition comprising (a) the colored reaction product of a chromogen and a color developer, the colored reaction product being capable of changing color when exposed to ultraviolet radiation, or (b) a substantially colorless mixture of a chromogen and a color developer capable of reacting to form color when exposed to ultraviolet radiation, the second substrate bearing a reference color chart, the reference color chart comprising at least one reference color corresponding to time exposure to ultraviolet radiation, such that comparison of the color developed by the chromogenic composition upon exposure to ultraviolet light with a reference color provides an indication of the time and degree of exposure
    Type: Grant
    Filed: May 22, 1995
    Date of Patent: March 18, 1997
    Assignee: Wallace Computer Services, Inc.
    Inventors: Donald J. Hoffmann, John C. H. Chang
  • Patent number: 5605873
    Abstract: A pressure-sensitive, laser printer heat-resistant verification system for preventing unauthorized photoduplication of security documents comprising a support bearing an information area comprising a visible principal image, and a verification area comprising a localized, autogenous coating of a pressure-sensitive chromogenic composition for producing a visible colored image by external pressure. The chromogenic composition comprises (a) pressure-rupturable microcapsules containing a chromogen and (b) a color developer capable of reacting with the chromogen to form a visible image. The pressure-rupturable microcapsules and color developer are substantially coextensive on the support, and the verification area is spaced apart from the information area.
    Type: Grant
    Filed: October 6, 1994
    Date of Patent: February 25, 1997
    Assignee: Wallace Computer Services, Inc.
    Inventor: John C. H. Chang
  • Patent number: 5595955
    Abstract: A pressure and heat-sensitive composition comprising chromogen-containing pressure-rupturable microcapsules and heat-sensitive color developer useful for verification of document authenticity system when applied as a localized coating on documents, such as checks and prescriptions. Quickly striking the chromogenic composition with a fingernail or blunt object to generate pressure and heat in the coating produces a colored image by friction. The chromogenic composition possesses a fugitive characteristic, whereby the colored image gradually disappears and can be made to reappear when the chromogenic coating is again subjected to external pressure and heat. This feature can be used for repeated verification of the authenticity of the document.
    Type: Grant
    Filed: November 16, 1994
    Date of Patent: January 21, 1997
    Assignee: Wallace Computer Services, Inc.
    Inventors: John C. H. Chang, Richard H. Johnson
  • Patent number: 5545459
    Abstract: A business form comprising a substrate with at least one surface bearing a dual-functional coating comprising a copolymer of ethylene and vinyl acetate containing at least 40 weight percent ethylene and having a softening point of at least 60.degree. C. enhances adhesion of toner particles and is self-adhering under application of heat and pressure.
    Type: Grant
    Filed: January 20, 1995
    Date of Patent: August 13, 1996
    Assignee: Wallace Computer Services, Inc.
    Inventor: John C. H. Chang
  • Patent number: 5536046
    Abstract: A heat sensitive system comprises a document having a localized, non-pressure sensitive, coating of chromogenic composition activated at moderate temperatures. Quickly striking the chromogenic composition with a fingernail or blunt object produces a colored image by frictional heat. The chromogenic composition contains a chromogenic compound and a color developer which are non-pressure sensitive and nonreactive at room temperature. The chromogenic composition can be an intimate mixture of the chromogenic compound and the developer or alternatively separate layers of each of the components.
    Type: Grant
    Filed: February 17, 1995
    Date of Patent: July 16, 1996
    Assignee: Wallace Computer Services, Inc.
    Inventor: John C. H. Chang