Patents by Inventor C. Singh Bhatia

C. Singh Bhatia has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7268966
    Abstract: A method for adjusting fly heights for a plurality of heads of a hard disk drive is disclosed. The method includes measuring respective magnetic and mechanical performance for the plurality of heads and varying the density of an environment within the hard disk drive. This variation of the environment is such that the respective fly heights of the plurality of heads are adjusted to achieve a preferred distribution with respect to an ideal fly height.
    Type: Grant
    Filed: September 30, 2004
    Date of Patent: September 11, 2007
    Assignee: Hitachi Global Storage Technologies Netherlands, B.V.
    Inventors: Remmelt Pit, C. Singh Bhatia
  • Patent number: 5851475
    Abstract: A process for producing an article with improved ceramic surface properties including providing an article having a ceramic surface, and placing the article onto a conductive substrate holder in a hermetic enclosure. Thereafter a low pressure ambient is provided in the hermetic enclosure. A plasma including ions of solid materials is produced the ceramic surface of the article being at least partially immersed in a macroparticle free region of the plasma. While the article is immersed in the macroparticle free region, a bias of the substrate holder is biased between a low voltage at which material from the plasma condenses on the surface of the article and a high negative voltage at which ions from the plasma are implanted into the article.
    Type: Grant
    Filed: June 21, 1996
    Date of Patent: December 22, 1998
    Assignees: Regents of the University of California, IBM
    Inventors: Kyriakos Komvopoulos, Ian G. Brown, Bo Wei, Simone Anders, Andre Anders, C. Singh Bhatia
  • Patent number: 5838522
    Abstract: Surface modification of magnetic recording heads using plasma immersion ion implantation and deposition is disclosed. This method may be carried out using a vacuum arc deposition system with a metallic or carbon cathode. By operating a plasma gun in a long-pulse mode and biasing the substrate holder with short pulses of a high negative voltage, direct ion implantation, recoil implantation, and surface deposition are combined to modify the near-surface regions of the head or substrate in processing times which may be less than 5 min. The modified regions are atomically mixed into the substrate. This surface modification improves the surface smoothness and hardness and enhances the tribological characteristics under conditions of contact-start-stop and continuous sliding. These results are obtained while maintaining original tolerances.
    Type: Grant
    Filed: February 3, 1997
    Date of Patent: November 17, 1998
    Assignee: The Regents of the University of California
    Inventors: Kyriakos Komvopoulos, Ian G. Brown, Bo Wei, Simone Anders, Andre Anders, C. Singh Bhatia