Patents by Inventor Calvin K. Willard

Calvin K. Willard has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Unitary wafer plasma enhanced chemical vapor deposition holding device
    Patent number: 5478399
    Abstract: There is a unitary wafer plasma enhanced chemical vapor deposition (PECVD) holding device. Particularly, there is a unitary device used for holding and rotating wafers during deposition of materials. Uniquely, single wafer holder arms 31 can be mounted and removed from the unitary device. Additionally, each wafer holding arm can individually calibrate the alignment between the parallel pair of arms and calibrate the wafer positioning to the heater. For example, using a simple screw to bias the positioning of the arms.
    Type: Grant
    Filed: December 3, 1993
    Date of Patent: December 26, 1995
    Assignee: Micron Technology, Inc.
    Inventor: Calvin K. Willard