Patents by Inventor Cam Endicott

Cam Endicott has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070277129
    Abstract: A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. The invention implements a minimum layout perturbation approach that addresses the RDR requirements. The invention also solves the problem of inserting dummy shapes where required, and extending the lengths of the critical shapes and/or the dummy shapes to meet ‘edge coverage’ requirements.
    Type: Application
    Filed: August 13, 2007
    Publication date: November 29, 2007
    Inventors: Robert Allen, Cam Endicott, Fook-Luen Heng, Jason Hibbeler, Kevin McCullen, Rani Narayan, Robert Walker, Xin Yuan
  • Publication number: 20070198961
    Abstract: A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. Also, a method, system and program product for migrating an integrated circuit design from a source technology without RDR to a target technology with RDR in which space may be reserved for late insertion of a feature and in which migration first occurs in a primary compaction direction having less tolerant ground rules.
    Type: Application
    Filed: April 9, 2007
    Publication date: August 23, 2007
    Applicant: International Business Machines Corporation
    Inventors: Robert Allen, Cam Endicott, Fook-Luen Heng, Jason Hibbeler, Kevin McCullen, Rani Narayan, Robert Walker, Xin Yuan
  • Publication number: 20060101357
    Abstract: A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. Also, a method, system and program product for migrating an integrated circuit design from a source technology without RDR to a target technology with RDR in which space may be reserved for late insertion of a feature and in which migration first occurs in a primary compaction direction having less tolerant ground rules.
    Type: Application
    Filed: December 9, 2004
    Publication date: May 11, 2006
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Robert Allen, Cam Endicott, Fook-Luen Heng, Jason Hibbeler, Kevin McCullen, Rani Narayan, Robert Walker, Xin Yuan
  • Publication number: 20060101356
    Abstract: A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. The invention implements a minimum layout perturbation approach that addresses the RDR requirements. The invention also solves the problem of inserting dummy shapes where required, and extending the lengths of the critical shapes and/or the dummy shapes to meet ‘edge coverage’ requirements.
    Type: Application
    Filed: October 29, 2004
    Publication date: May 11, 2006
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Robert Allen, Cam Endicott, Fook-Luen Heng, Jason Hibbeler, Kevin McCullen, Rani Narayan, Robert Walker, Xin Yuan