Patents by Inventor Carlos C. Sanchez

Carlos C. Sanchez has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150182667
    Abstract: Embodiments of the presently-disclosed subject matter provide composites that comprise a tissue graft and a biofilm dispersal agent. The tissue graft can be bone tissue graft, a soft tissue graft, or the like. In specific embodiments the tissue graft is a polyurethane graft and in other embodiments the tissue graft is bone particles, such as demineralized bone matrix. The biofilm dispersal agent can be one or more D-amino acids. The presently-disclosed subject matter further includes methods for treating tissue of a subject that comprise administering the present composites as well as methods for manufacturing the present composites.
    Type: Application
    Filed: August 8, 2013
    Publication date: July 2, 2015
    Inventors: Scott A. Guelcher, Joseph C. Wenke, Carlos C. Sanchez, Jr., Kevin S. Akers, Chad A. Kruger, Edna M. Prieto, Katarzyna Zienkiewicz
  • Patent number: 8927178
    Abstract: The present invention relates to a process for the preparation of a polymeric relief structure by a) coating a substrate with a first coating composition comprising one or more radiation-sensitive ingredients, d) locally treating the coated substrate with electromagnetic radiation having a periodic or random radiation-intensity pattern, forming a latent image, e) polymerizing and/or crosslinking the resulting coated substrate to a first coating. This process is improved by applying a second coating composition on top of the first coating composition, said second coating composition comprising either an organic compound (Co) of a monomeric nature and wherein Co is also polymerized during the process, or wherein said second coating comprises a dissolved polymer (Cp). As a result a polymeric relief structure is obtained, where a substrate is coated with a functional, stacked, bi-layer, in which each layer exhibits a specific, and from each other differing function.
    Type: Grant
    Filed: February 9, 2006
    Date of Patent: January 6, 2015
    Assignee: Stichting Dutch Polymer Institute
    Inventors: Cees C. Bastiaansen, Dirk Jan Broer, Carlos C. Sanchez
  • Publication number: 20080131626
    Abstract: The present invention relates to a process for the preparation of a polymeric relief structure by a) coating a substrate with a first coating composition comprising one or more radiation-sensitive ingredients, d) locally treating the coated substrate with electromagnetic radiation having a periodic or random radiation-intensity pattern, forming a latent image, e) polymerizing and/or crosslinking the resulting coated substrate to a first coating. This process is improved by applying a second coating composition on top of the first coating composition, said second coating composition comprising either an organic compound (Co) of a monomeric nature and wherein Co is also polymerized during the process, or wherein said second coating comprises a dissolved polymer (Cp). As a result a polymeric relief structure is obtained, where a substrate is coated with a functional, stacked, bi-layer, in which each layer exhibits a specific, and from each other differing function.
    Type: Application
    Filed: February 9, 2006
    Publication date: June 5, 2008
    Inventors: Cees C. Bastiaansen, Dirk Jan D.J. Broer, Carlos C. Sanchez