Abstract: An x-ray tube includes a thermionic cathode generating an electron beam propagating from the cathode to a target along a beam axis. The x-ray tube has apertures in the form of a control electrode with a first aperture opening, a focusing electrode with a second aperture opening and a beam shaping electrode with a third aperture opening. The first aperture opening is smaller than the emission surface and has a contour rotationally symmetric with respect to the beam axis. The second aperture opening is larger than the first aperture opening and has a contour rotationally symmetric with respect to the beam axis. The third aperture opening has a contour which is aligned with an xy plane and non-rotationally symmetric with respect to the beam axis. The X-ray tube has a simple structure for generating an electron beam where the number of electrons can be varied easily over a wide range.

Abstract: An analytical X-ray tube with an anode target material that emits characteristic X-rays in response to excitation by an electron beam may include any of several advantageous features. The target material is deposited on a diamond substrate layer, and a metal carbide intermediate layer may be provided between the target material and substrate that provides enhanced bonding therebetween. An interface layer may also be used that provides an acoustic impedance matching between the target material and the substrate. For a low thermal conductivity target material, a heat dissipation layer of a higher thermal conductivity material may also be included between the target material and substrate to enhance thermal transfer. The target material may have a thickness that corresponds to a maximum penetration depth of the electrons of the electron beam, and the structure may be such that a predetermined temperature range is maintained at the substrate interface.

Abstract: A method for adjusting a primary side of an X-ray diffractometer wherein the primary side comprises a collimator, X-ray optics, an X-ray source, in particular an X-ray tube, wherein the collimator, the X-ray optics and the X-ray source are mounted directly or indirectly on a base structure, and wherein the orientation and position of the X-ray optics and the position of the X-ray source are adjusted relative to the base structure, wherein the method is characterized in that the orientation and position of the X-ray optics and the position of the X-ray tube relative to the base structure are measured and set at predetermined target values, so that with these set target values, X-ray radiation emanating from the X-ray source and conditioned by the X-ray optics is detectable at the output end of the collimator.

Abstract: An analytical X-ray tube with an anode target material that emits characteristic X-rays in response to excitation by an electron beam may include any of several advantageous features. The target material is deposited on a diamond substrate layer, and a metal carbide intermediate layer may be provided between the target material and substrate that provides enhanced bonding therebetween. An interface layer may also be used that provides an acoustic impedance matching between the target material and the substrate. For a low thermal conductivity target material, a heat dissipation layer of a higher thermal conductivity material may also be included between the target material and substrate to enhance thermal transfer. The target material may have a thickness that corresponds to a maximum penetration depth of the electrons of the electron beam, and the structure may be such that a predetermined temperature range is maintained at the substrate interface.

Abstract: An x-ray apparatus (1), has an electron beam source (2), a target (4), onto which the electron beam (3) is directed to form a focal spot (5; 5a, 5b) on the target (4), x-ray optics (6) for collecting x-rays emitted from the focal spot (5; 5a, 5b) to form an x-ray beam (8) and a sample position (9) at which the x-ray beam (8) is directed. The x-ray apparatus (1) further includes an electrostatic or electromagnetic electron beam deflection device (10) suitable for moving the focal spot (5; 5a, 5b) on the target (4). The extension of the focal spot (5; 5a, 5b) in any direction (x, y, z) is at least a factor of 1.5 smaller than the extension of the target (4). An x-ray apparatus is thereby provided with simplified alignment of the x-ray optics with respect to a microfocus x-ray source.

Abstract: A method for adjusting the primary side of an X-ray diffractometer wherein the primary side comprises a collimator, an X-ray optics, an X-ray source, in particular an X-ray tube, wherein the collimator, the X-ray optics and the X-ray source are mounted directly or indirectly on a base structure, and wherein the orientation and position of the X-ray optics and the position of the X-ray source are adjusted relative to the base structure, is characterized in that the orientation and position of the X-ray optics and the position of the X-ray tube relative to the base structure are measured and set at predetermined target values, so that with these set target values, X-ray radiation emanating from the X-ray source and conditioned by the X-ray optics is detectable at the output end of the collimator.

Abstract: An x-ray apparatus (1), has an electron beam source (2), a target (4), onto which the electron beam (3) is directed to form a focal spot (5; 5a, 5b) on the target (4), x-ray optics (6) for collecting x-rays emitted from the focal spot (5; 5a, 5b) to form an x-ray beam (8) and a sample position (9) at which the x-ray beam (8) is directed. The x-ray apparatus (1) further includes an electrostatic or electromagnetic electron beam deflection device (10) suitable for moving the focal spot (5; 5a, 5b) on the target (4). The extension of the focal spot (5; 5a, 5b) in any direction (x, y, z) is at least a factor of 1.5 smaller than the extension of the target (4). An x-ray apparatus is thereby provided with simplified alignment of the x-ray optics with respect to a microfocus x-ray source.

Abstract: An X-ray optical configuration for irradiation of a sample (1) with an X-ray beam having a line-shaped cross-section, wherein the configuration contains an X-ray source (2) and a beam-conditioning X-ray optics, is characterized in that the X-ray source (2) comprises a brilliant point source (4) and the X-ray optics comprises an X-ray optical element (3) which conditions X-ray light emitted by the point source in such a fashion that the X-ray beam is rendered parallel in one direction perpendicular to the beam propagation direction and remains divergent in a direction which is perpendicular thereto and also to the beam propagation direction. An X-ray optical element of this type enables use of both point-shaped and line-shaped beam geometries without complicated and time-consuming conversion work.

Abstract: An x-ray apparatus (1), has an electron beam source (2), a target (4), onto which the electron beam (3) is directed to form a focal spot (5; 5a, 5b) on the target (4), x-ray optics (6) for collecting x-rays emitted from the focal spot (5; 5a, 5b) to form an x-ray beam (8) and a sample position (9) at which the x-ray beam (8) is directed. The x-ray apparatus (1) further includes an electrostatic or electromagnetic electron beam deflection device (10) suitable for moving the focal spot (5; 5a, 5b) on the target (4). The extension of the focal spot (5; 5a, 5b) in any direction (x, y, z) is at least a factor of 1.5 smaller than the extension of the target (4). An x-ray apparatus is thereby provided with simplified alignment of the x-ray optics with respect to a microfocus x-ray source.

Abstract: An X-ray optical configuration for irradiation of a sample (1) with an X-ray beam having a line-shaped cross-section, wherein the configuration contains an X-ray source (2) and a beam-conditioning X-ray optics, is characterized in that the X-ray source (2) comprises a brilliant point source (4) and the X-ray optics comprises an X-ray optical element (3) which conditions X-ray light emitted by the point source in such a fashion that the X-ray beam is rendered parallel in one direction perpendicular to the beam propagation direction and remains divergent in a direction which is perpendicular thereto and also to the beam propagation direction. An X-ray optical element of this type enables use of both point-shaped and line-shaped beam geometries without complicated and time-consuming conversion work.

Abstract: An X-ray analysis instrument, in particular, an X-ray diffractometer (21), has an X-ray source (22; SC) that emits an X-ray beam (23), an X-ray optics (24), in particular a multi-layer X-ray mirror, and a collimator mechanism (BM), wherein the collimator mechanism (BM) forms an aperture window (2, 2?) with an aperture opening (3, 3?) through which at least part (26) of the X-ray beam (23) passes.

Abstract: An X-ray analysis instrument, in particular, an X-ray diffractometer (21), has an X-ray source (22; SC) that emits an X-ray beam (23), an X-ray optics (24), in particular a multi-layer X-ray mirror, and a collimator mechanism (BM), wherein the collimator mechanism (BM) forms an aperture window (2, 2?) with an aperture opening (3, 3?) through which at least part (26) of the X-ray beam (23) passes.

Abstract: A device for adjusting optical elements, in particular, for X-ray analysis, comprising a holding device (2) for receiving the optical element and at least two adjusting units at least one of the two longitudinal ends of the holding device (2), wherein the adjusting units each comprise one plunger (6, 6a, 6b, 6c, 6d), characterized in that each adjusting unit comprises a rotatably disposed adjusting ring (4, 4a, 4b, 4c, 4d) with an eccentric recess, and the optical element is mechanically coupled to the inner surfaces (7) of the adjusting rings (4, 4a, 4b, 4c, 4d) via the plungers (6, 6a, 6b, 6c, 6d). The adjusting device is compact, can be flexibly used and provides simple adjustment of the optical element.

Abstract: A multiple wavelength X-ray source includes an electron-generating cathode and an anode with multiple target regions, each of which emits X-rays at a different characteristic wavelength in response to the electrons. The different X-ray radiation outputs are focused by different focusing sections of a focusing optic. The multiple focusing sections are in different respective locations, and each focuses its respective X-ray radiation onto a sample. The focusing sections may be side-by-side mirrors in a Kirkpatrick-Baez configuration, or in a single-bounce, doubly curved elliptical configuration.

Abstract: A device for adjusting optical elements, in particular, for X-ray analysis, comprising a holding device (2) for receiving the optical element and at least two adjusting units at least one of the two longitudinal ends of the holding device (2), wherein the adjusting units each comprise one plunger (6, 6a, 6b, 6c, 6d), characterized in that each adjusting unit comprises a rotatably disposed adjusting ring (4, 4a, 4b, 4c, 4d) with an eccentric recess, and the optical element is mechanically coupled to the inner surfaces (7) of the adjusting rings (4, 4a, 4b, 4c, 4d) via the plungers (6, 6a, 6b, 6c, 6d). The adjusting device is compact, can be flexibly used and provides simple adjustment of the optical element.

Abstract: A multiple wavelength X-ray source includes an electron-generating cathode and an anode with multiple target regions, each of which emits X-rays at a different characteristic wavelength in response to the electrons. The different X-ray radiation outputs are focused by different focusing sections of a focusing optic. The multiple focusing sections are in different respective locations, and each focuses its respective X-ray radiation onto a sample. The focusing sections may be side-by-side mirrors in a Kirkpatrick-Baez configuration, or in a single-bounce, doubly curved elliptical configuration.

Abstract: A method for manufacturing a reflector (5) for X-ray radiation (2, 3, 10, 11) which is curved in a non-circular arc shape, along a first cross-section (13) in a plane (XZ) which contains a x-direction, wherein the reflector (5) is also curved along a second cross-section (14) in a plane (YZ) which is perpendicular to the x-direction, is characterized in that the reflector (5) has a curvature along the second cross-section (14) which also differs from the shape of a circular arc. This makes the design of X-ray mirrors and the beam profile of reflected X-ray radiation more flexible, facilitates production of X-ray mirrors and at the same time provides high reflection capacity and good focusing properties for X-ray mirrors.

Abstract: In an apparatus and a method for the analysis of atomic or molecular elements contained in a sample by wavelength dispersive X-ray spectrometry, wherein primary x ray or electron radiation is directed onto the sample whereby fluorescence radiation is emitted from the sample, the fluorescence radiation is directed onto a mirror or focussing device consisting of a multi-layer structure including pairs of layers of which one layer of a pair comprises carbon or scandium and the other comprises a metal oxide or a metal nitride and the fluorescence radiation is reflected from the mirror or focussing device onto an analysis detector for the analysis of the atomic or molecular elements contained in the sample.

Abstract: A method for manufacturing a reflector (5) for X-ray radiation (2, 3, 10, 11) which is curved in a non-circular arc shape, along a first cross-section (13) in a plane (XZ) which contains a x-direction, wherein the reflector (5) is also curved along a second cross-section (14) in a plane (YZ) which is perpendicular to the x-direction, is characterized in that the reflector (5) has a curvature along the second cross-section (14) which also differs from the shape of a circular arc. This makes the design of X-ray mirrors and the beam profile of reflected X-ray radiation more flexible, facilitates production of X-ray mirrors and at the same time provides high reflection capacity and good focusing properties for X-ray mirrors.

Abstract: A mirror element for the reflection of x-rays, particularly for EUVL exposure systems for the manufacture of semiconductor structures, wherein the x-rays reach the mirrors under a certain incident angle, consists of a substrate with a multilayer structure disposed thereon which multilayer structure comprises at least a first layer of a lanthanum-containing compound and a second layer of a boron-containing compound alternately disposed on the substrate.