Patents by Inventor Catharina Johanna Lucia Maria van den Enden

Catharina Johanna Lucia Maria van den Enden has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of operating an optical imaging system, lithographic projection apparatus, device manufacturing method, and device manufactured thereby
    Patent number: 6563564
    Abstract: The present invention provides a method of operating a lithographic projection apparatus including calculating a change in aberration effect in the projection system, due to heating effects, as a function of time, based on at least one set of predetermined parameters; and adjusting the lithographic projection apparatus to compensate for the calculated change in aberration effect. The parameters are obtained by a calibration operation, which may comprise a coarse calibration followed by at least one fine calibration. The coarse calibration yields a first estimate of at least a subset of the parameters. The estimate can be used as an input for a subsequent fine calibration. The calibration may also comprise a single fine calibration.
    Type: Grant
    Filed: June 12, 2001
    Date of Patent: May 13, 2003
    Assignee: ASM Lithography B.V.
    Inventors: Christianus Gerardus Maria de Mol, Thomas Josephus Maria Castenmiller, Marcel van Dijk, Franciscus Antonius Chrysogonus Marie Commissaris, Simon de Groot, Catharina Johanna Lucia Maria van den Enden
  • Method of operating an optical imaging system, lithographic projection apparatus, device manufacturing method, and device manufactured thereby
    Publication number: 20020036758
    Abstract: The present invention provides a method of operating a lithographic projection apparatus including calculating a change in aberration effect in the projection system, due to heating effects, as a function of time, based on at least one set of predetermined parameters; and adjusting the lithographic projection apparatus to compensate for the calculated change in aberration effect.
    Type: Application
    Filed: June 12, 2001
    Publication date: March 28, 2002
    Inventors: Christianus Gerardus Maria de Mol, Thomas Josephus Maria Castenmiller, Marcel van Dijk, Franciscus Antonius Chrysogonus Marie Commissaris, Simon de Groot, Catharina Johanna Lucia Maria van den Enden