Patents by Inventor Cedric Grouwstra

Cedric Grouwstra has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20080002162
    Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
    Type: Application
    Filed: January 23, 2007
    Publication date: January 3, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hans Jansen, Johannes Baselmans, Sjoerd Donders, Christiaan Hoogendam, Jeroen Mertens, Johannes Mulkens, Marco Stavenga, Bob Streefkerk, Jan Van Der Hoeven, Cedric Grouwstra
  • Lithographic apparatus and device manufacturing method
    Publication number: 20060132731
    Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
    Type: Application
    Filed: December 20, 2004
    Publication date: June 22, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hans Jansen, Johannes Baselmans, Sjoerd Donders, Christiaan Hoogendam, Jeroen Johannes Mertens, Johannes Mulkens, Marco Stavenga, Bob Streefkerk, Jan Cornelis Hoeven, Cedric Grouwstra
  • Method and apparatus for angular-resolved spectroscopic lithography characterization
    Publication number: 20060066855
    Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
    Type: Application
    Filed: August 15, 2005
    Publication date: March 30, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Arie Boef, Arno Bleeker, Youri Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Kiers, Paul Luehrmann, Henricus Pellemans, Maurits Schaar, Cedric Grouwstra, Markus Van Kraaij