Abstract: A gas separation membrane having a polyimide structure.

Abstract: Disclosed are a diamine represented by the following formula, a polyimide and a polyamide using the same as the raw material, a cyclized product thereof, and a method for producing the same. In the formula, A represents a single bond, an ether bond, a sulfide bond, CO, CH2, SO, SO2, C(CH3)2, NHCO or C(CF3)2, or a bivalent group having an aliphatic ring, a hetero ring or an aromatic ring, R1 represents a C1-4alkyl group or a halogen group, and each of “a” and “b” independently represents an integer of 0-2, and 1?a+b?4. The polyimide and the polyamide are a fluorescent polyimide and a fluorescent polyamide that are easily soluble in organic solvents to the extent that they can be formed into a film by a wet process when making an optical device, that have heat resistance and strength when formed into a film, and that have superior fluorescent characteristics.

Abstract: [Subject] An object of the present invention is to provide a method for manufacturing a chemically strengthened glass plate having a high surface compressive stress with high efficiency using a soda-lime glass, the composition of which is not particularly suited for chemical strengthening.

Abstract: Disclosed is a water repellent additive for an immersion resist, which is composed of a fluorine-containing polymer that has a repeating unit represented by general formula (1). By adding the water repellent additive to a resist composition, the resist composition can be controlled to have high water repellency during exposure and to exhibit improved solubility in a developing solution during development. [In the formula, R1 represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group; R2 represents a heat-labile protecting group; R3 represents a fluorine atom or a fluorine-containing alkyl group; and W represents a divalent linking group.

Abstract: A water repellent protective film forming agent is provided for forming a protective film on a wafer that has an uneven pattern at its surface. The protective film is formed at least on surfaces of recessed portions of the wafer at the time of cleaning the wafer. The wafer is a wafer that contains a material including silicon element at least at the surfaces of the recessed portions of the uneven pattern or a wafer that contains at least one kind of material selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride and ruthenium at least at a part of the surfaces of the recessed portions of the uneven pattern.

Abstract: A silicon compound according to the present invention is represented by the general formula (1). This silicon compound can be easily synthesized by using a hydrolysable silicon compound such as alkoxysilane and has, in its molecule, a hydrolysable group e.g. alkoxy group and a photoacid generating group capable of being dissociated to generate an acid by irradiation with a high-energy ray. R1nAmSiB4-(n+m)??(1) where R1 is each independently a hydrogen atom, a C1-C20 straight or C3-C20 branched or cyclic hydrocarbon group; a carbon atom of the hydrocarbon group may be replaced by an oxygen atom; and the hydrocarbon group may contain a fluorine atom; A is an acid decomposable group; B is a hydrolysable group; n is an integer of 0 to 2; m is an integer of 1 to 3; and n+m is an integer of 1 to 3.

Abstract: A sulfonic acid onium salt represented by the following formula (1) useful as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt corresponding to the formula (1): in which R1 represents a monovalent organic group, and Q+ represents a sulfonium cation or iodonium cation.

Abstract: Polymer compounds derived from fluorine-containing diamine compounds represented by formula (1). in which R1 represents a condensed polycyclic type aromatic hydrocarbon group, and in which at least one —C(CF3)2OH group and at least one —NH2 group are in a relation such that they are attached to adjacent carbons of the carbon atoms constituting the condensed polycyclic type aromatic hydrocarbon group. The polymer compounds derived from this fluorine-containing diamine have superior low dielectric properties and low water-absorbing properties, and additionally exhibit low thermal expansion properties and high glass transition temperatures.