Patents by Inventor Cesar Gensoli

Cesar Gensoli has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Systems and methods for contact immersion lithography
    Patent number: 11892777
    Abstract: The present application relates to contact immersion lithography exposure units and methods of their use. An example contact exposure unit includes a container configured to contain a fluid material and a substrate disposed within the container. The substrate has a first surface and a second surface, and the substrate includes a photoresist material on at least the first surface. The contact exposure unit includes a photomask disposed within the container. The photomask is optically coupled to the photoresist material by way of a gap comprising the fluid material. The contact exposure unit also includes an inflatable balloon configured to be controllably inflated so as to apply a desired force to the second surface of the substrate to controllably adjust the gap between the photomask and the photoresist material.
    Type: Grant
    Filed: October 13, 2022
    Date of Patent: February 6, 2024
    Assignee: Waymo LLC
    Inventors: Hongqin Shi, Yeh-Jiun Tung, James Dunphy, Cesar Gensoli
  • Systems and Methods for Contact Immersion Lithography
    Publication number: 20230055675
    Abstract: The present application relates to contact immersion lithography exposure units and methods of their use. An example contact exposure unit includes a container configured to contain a fluid material and a substrate disposed within the container. The substrate has a first surface and a second surface, and the substrate includes a photoresist material on at least the first surface. The contact exposure unit includes a photomask disposed within the container. The photomask is optically coupled to the photoresist material by way of a gap comprising the fluid material. The contact exposure unit also includes an inflatable balloon configured to be controllably inflated so as to apply a desired force to the second surface of the substrate to controllably adjust the gap between the photomask and the photoresist material.
    Type: Application
    Filed: October 13, 2022
    Publication date: February 23, 2023
    Inventors: Hongqin Shi, Yeh-Jiun Tung, James Dunphy, Cesar Gensoli
  • Systems and methods for contact immersion lithography
    Patent number: 11500295
    Abstract: The present application relates to contact immersion lithography exposure units and methods of their use. An example contact exposure unit includes a container configured to contain a fluid material and a substrate disposed within the container. The substrate has a first surface and a second surface, and the substrate includes a photoresist material on at least the first surface. The contact exposure unit includes a photomask disposed within the container. The photomask is optically coupled to the photoresist material by way of a gap comprising the fluid material. The contact exposure unit also includes an inflatable balloon configured to be controllably inflated so as to apply a desired force to the second surface of the substrate to controllably adjust the gap between the photomask and the photoresist material.
    Type: Grant
    Filed: February 3, 2021
    Date of Patent: November 15, 2022
    Assignee: Waymo LLC
    Inventors: Hongqin Shi, Yeh-Jiun Tung, James Dunphy, Cesar Gensoli
  • Systems and Methods for Contact Immersion Lithography
    Publication number: 20210191276
    Abstract: The present application relates to contact immersion lithography exposure units and methods of their use. An example contact exposure unit includes a container configured to contain a fluid material and a substrate disposed within the container. The substrate has a first surface and a second surface, and the substrate includes a photoresist material on at least the first surface. The contact exposure unit includes a photomask disposed within the container. The photomask is optically coupled to the photoresist material by way of a gap comprising the fluid material. The contact exposure unit also includes an inflatable balloon configured to be controllably inflated so as to apply a desired force to the second surface of the substrate to controllably adjust the gap between the photomask and the photoresist material.
    Type: Application
    Filed: February 3, 2021
    Publication date: June 24, 2021
    Inventors: Hongqin Shi, Yeh-Jiun Tung, James Dunphy, Cesar Gensoli
  • Systems and methods for lithography
    Patent number: 10948830
    Abstract: The present application relates to contact immersion lithography exposure units and methods of their use. An example contact exposure unit includes a container configured to contain a fluid material and a substrate disposed within the container. The substrate has a first surface and a second surface, and the substrate includes a photoresist material on at least the first surface. The contact exposure unit includes a photomask disposed within the container. The photomask is optically coupled to the photoresist material by way of a gap comprising the fluid material. The contact exposure unit also includes an inflatable balloon configured to be controllably inflated so as to apply a desired force to the second surface of the substrate to controllably adjust the gap between the photomask and the photoresist material.
    Type: Grant
    Filed: December 23, 2019
    Date of Patent: March 16, 2021
    Assignee: Waymo LLC
    Inventors: Hongqin Shi, Yeh-Jiun Tung, James Dunphy, Cesar Gensoli