Patents by Inventor Chaitanya K. Ullal

Chaitanya K. Ullal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Stop flow interference lithography system
    Patent number: 8252517
    Abstract: Stop flow interference lithography system for high throughput synthesis of 3-dimensionally patterned polymer particles. The system includes a microfluidic channel containing a stationary oligomer film and a phase mask located adjacent to the microfluidic channel. A source of collimated light is provided for passing the collimated light through the phase mask and into the microfluidic channel for interaction with the oligomer. The passage of the collimated light through the phase mask generates a 3-dimensional distribution of light intensity to induce crosslinking of the oligomer in high intensity regions thereby forming 3-dimensional structures.
    Type: Grant
    Filed: July 16, 2009
    Date of Patent: August 28, 2012
    Assignee: Massachusetts Institute of Technology
    Inventors: Edwin L. Thomas, Patrick Seamus Doyle, Dhananjay Dendukuri, Ji-Hyun Jang, Chaitanya K. Ullal
  • Stop Flow Interference Lithography System
    Publication number: 20100099048
    Abstract: Stop flow interference lithography system for high throughput synthesis of 3-dimensionally patterned polymer particles. The system includes a microfluidic channel containing a stationary oligomer film and a phase mask located adjacent to the microfluidic channel. A source of collimated light is provided for passing the collimated light through the phase mask and into the microfluidic channel for interaction with the oligomer. The passage of the collimated light through the phase mask generates a 3-dimensional distribution of light intensity to induce crosslinking of the oligomer in high intensity regions thereby forming 3-dimensional structures.
    Type: Application
    Filed: July 16, 2009
    Publication date: April 22, 2010
    Applicant: Massachusetts Institute of Technology
    Inventors: Edwin L. Thomas, Patrick Seamus Doyle, Dhananjay Dendukuri, Ji-Hyun Jang, Chaitanya K. Ullal