Abstract: A method for determining priority of a selected workpiece in a process flow including a plurality of operations includes providing an objective function relating manufacturing losses to workpiece priority for the operations in the process flow. The objective function is solved to generate priority metrics for at least a subset of the operations remaining for the selected workpiece to allow completion of the selected workpiece in the process flow by a target completion due time.

Abstract: An automated, computer-implemented method for managing test wafers in an integrated, automated semiconductor manufacturing environment includes: managing a test wafer inventory; consuming inventoried test wafers in the automated process flow; and distributing the consumed test wafers according to their level of usage after an evaluation thereof. An automated, computer-implemented method for use in semiconductor manufacturing includes: monitoring test wafer utilization in an automated process flow; maintaining an inventory of test wafers of a plurality of different types responsive to the monitored utilization; and managing the test wafer utilization of the test wafer inventory.

Abstract: A method for processing workpieces in a process flow including a plurality of operations includes employing a fabrication simulation model of the process flow to determine an estimated completion time for a selected workpiece. The fabrication simulation model simulates the processing of the selected workpiece and other workpieces in the process flow through the plurality of operations. The priority of the selected workpiece is adjusted based on a comparison between a target completion time for the selected workpiece and the estimated completion time.

Abstract: A method for scheduling preventative maintenance tasks includes defining a set of global time periods. Members of a set of preventative maintenance tasks associated with a plurality of machines for are scheduled execution during the global time periods based on capacities of the machines and production targets for the machines. A plurality of time slots is defined for a selected global period having a selected preventative maintenance task scheduled for execution therein. A selected time slot from the plurality of time slots is scheduled for performing the selected preventative maintenance task based on work in process levels for with the associated machine over the time slots.

Abstract: The system includes a plurality of process modules and an independent module controller for each of the plurality of process modules that is adapted to control the process tools within each of the process modules. Each of the independent module controllers performs at least run-to-run control of the processing tools, yield management analysis, scheduling of materials provided to and sent from the process module, and movement of wafers within the process module. One method of the present invention involves providing a plurality of process modules, each of which has an independent module controller that is adapted to perform at least run-to-run control of the processing tools within the process module, yield management analysis, scheduling of materials, and movement of wafers within the process module. The independent module controller for each of the process modules controls the process tools within its respective process module that are employed in forming a portion of the integrated circuit device.

Abstract: A method for determining metrology sampling rates for workpieces in a process flow includes determining a current status of the process flow. Future processing of the workpieces in the process flow is simulated based on the current status of the process flow over a predetermined time horizon to predict sampling rates for the workpieces. During the simulating, sampling rules are implemented that consider capacity constraints of a metrology resource in the process flow. Actual workpieces in the process flow are sampled based on the predicted metrology sampling rates.