Abstract: A filtration apparatus is provided. The filtration apparatus includes a housing and a plurality of filtering sheets. The housing is enclosed by a first end cap and a second end cap. The first end cap includes a liquid inlet, and the second end cap includes a liquid outlet. The plurality of filtering sheets is disposed on an internal sidewall of the housing. A portion of the filtering sheets interlaces with another portion of the filtering sheets to form a winding flow path in the housing.

Abstract: A fluid preparation system includes a tank, a chemical supply line, a mixer, and a deionized (DI) water supply line. The tank contains a first chemical solution. The chemical supply line is coupled to the tank and configured to supply the first chemical solution. The mixer is coupled to the tank. The DI water supply line is coupled to the mixer and configured to supply DI water. The first chemicals solution and the DI water are mixed at the mixer to generate a second chemical solution.

Abstract: A method for fabricating a semiconductor device, including the steps of: providing a substrate comprising a preliminary pattern formed thereon; forming an opening through the preliminary pattern to expose a conductive portion in the substrate; forming a spacer on a sidewall of the opening; performing a wet etching process to form a hole in the conductive portion; removing the spacer; and depositing a conductive pattern over the sidewall of the opening and a surface of the hole.

Abstract: The present disclosure provides a method and a cleaning apparatus for cleaning semiconductor wafers. The cleaning apparatus includes a plurality of cleaning tanks, a dipping tank, a first robot hand, a second robot hand, and at least one drying chamber. The plurality of cleaning tanks is configured to clean a plurality of wafers held by a cassette by cleaning agents. The plurality of wafers is cleaned in the plurality of cleaning tanks through a batch process. The dipping tank is configured to rinse the plurality of wafers by a replacement agent. The at least one drying chamber is configured to dry the wafer taken by the second robot hand with single wafer process.

Abstract: A method for fabricating a semiconductor device, including the steps of: providing a substrate comprising a preliminary pattern formed thereon; forming an opening through the preliminary pattern to expose a conductive portion in the substrate; forming a spacer on a sidewall of the opening; performing a wet etching process to form a hole in the conductive portion; removing the spacer; and depositing a conductive pattern over the sidewall of the opening and a surface of the hole.

Abstract: A method for fabricating a semiconductor device is provided. The method includes the actions of: providing a substrate comprising a preliminary pattern formed thereon; forming an opening through the preliminary pattern to expose a conductive portion in the substrate; forming a spacer on a sidewall of the opening; performing an wet etching process to form a hole in the conductive portion; removing the spacer; and depositing a conductive pattern over the sidewall of the opening and a surface of the hole.

Abstract: A method for fabricating a semiconductor device is provided. The method includes the actions of: providing a substrate comprising a preliminary pattern formed thereon; forming an opening through the preliminary pattern to expose a conductive portion in the substrate; forming a dielectric layer on a sidewall of the opening; performing a dry etching process to form a hole in the conductive portion; removing the dielectric layer; and depositing a conductive pattern over the sidewall of the opening and in the hole.

Abstract: A semiconductor structure is disclosed, which comprises a substrate, a bit line (BL) stack feature and a BL spacer. The substrate has a cell area and a periphery area defined thereon. The bit line stack feature formed over an active region in the cell area, comprises a buffer liner having a U-shaped profile that opens upwardly in a cross section thereof and defining an inner surface, a BL conductor disposed in the U-shaped profile on the inner surface, and a capping layer over the BL conductor. The BL spacer covers sidewall surfaces of the BL stack feature.

Abstract: A semiconductor structure is disclosed. The semiconductor structure has a substrate, a signal line structure disposed on the substrate, a spacer disposed on the substrate, and an airgap disposed between the signal line structure and the spacer. The air gap has a upper region and a lower region below the upper region. The width of the upper region is different from the width of the lower region.

Abstract: A semiconductor device includes a semiconductor substrate, a silicon oxide layer, a titanium nitride layer, a metal layer, and a first silicon nitride layer. At least one trench is recessed inward from a surface of the semiconductor substrate. The silicon oxide layer is formed on an inner wall of the at least one trench. The titanium nitride layer is formed on a portion of the silicon oxide layer away from the surface of the semiconductor substrate. The metal layer is filled in a portion of each of the at least one trench. The metal layer is selectively deposited on the titanium nitride layer and comprises a material selected from ruthenium and cobalt. The first silicon nitride layer is filled in a remaining portion of each of the at least one trench to contact the metal layer, and is surrounded by the silicon oxide layer.

Abstract: A semiconductor structure is disclosed, which comprises a substrate, a bit line (BL) stack feature and a BL spacer. The substrate has a cell area and a periphery area defined thereon. The bit line stack feature formed over an active region in the cell area, comprises a buffer liner having a U-shaped profile that opens upwardly in a cross section thereof and defining an inner surface, a BL conductor disposed in the U-shaped profile on the inner surface, and a capping layer over the BL conductor. The BL spacer covers sidewall surfaces of the BL stack feature.

Abstract: A method for fabricating a semiconductor device is provided. The method includes the actions of: providing a substrate comprising a preliminary pattern formed thereon; forming an opening through the preliminary pattern to expose an etch stop layer in the preliminary pattern; forming a dielectric layer on a sidewall of the opening; performing a first etching process to penetrate the etching stop layer and form a hole; performing a second etching process to expand a portion of the hole in the substrate; removing the dielectric layer; and depositing a conductive preliminary pattern on the sidewall of the opening and in the hole.

Abstract: A semiconductor device includes a semiconductor substrate, a silicon oxide layer, a titanium nitride layer, a metal layer, and a first silicon nitride layer. At least one trench is recessed inward from a surface of the semiconductor substrate. The silicon oxide layer is formed on an inner wall of the at least one trench. The titanium nitride layer is formed on a portion of the silicon oxide layer away from the surface of the semiconductor substrate. The metal layer is filled in a portion of each of the at least one trench. The metal layer is selectively deposited on the titanium nitride layer and comprises a material selected from ruthenium and cobalt. The first silicon nitride layer is filled in a remaining portion of each of the at least one trench to contact the metal layer, and is surrounded by the silicon oxide layer.

Abstract: A method for fabricating a semiconductor device is provided. The method includes the actions of: providing a substrate comprising a preliminary pattern formed thereon; forming an opening through the preliminary pattern to expose a conductive portion in the substrate; forming a dielectric layer on a sidewall of the opening; performing a dry etching process to form a hole in the conductive portion; removing the dielectric layer; and depositing a conductive pattern over the sidewall of the opening and in the hole.

Abstract: A method for fabricating a semiconductor device is provided. The method includes the actions of: providing a substrate comprising a preliminary pattern formed thereon; forming an opening through the preliminary pattern to expose a conductive portion in the substrate; forming a spacer on a sidewall of the opening; performing an wet etching process to form a hole in the conductive portion; removing the spacer; and depositing a conductive pattern over the sidewall of the opening and a surface of the hole.

Abstract: A filtration apparatus is provided. The filtration apparatus includes a housing and a plurality of filtering sheets. The housing is enclosed by a first end cap and a second end cap. The first end cap includes a liquid inlet, and the second end cap includes a liquid outlet. The plurality of filtering sheets is disposed on an internal sidewall of the housing. A portion of the filtering sheets interlaces with another portion of the filtering sheets to form a winding flow path in the housing.

Abstract: An apparatus for performing a wafer spin process is provided. The apparatus includes a base member, a rotatable member, and a wafer guide. The base member includes a plurality of first magnetic components. The rotatable member is disposed over the base member and includes a plurality of second magnetic components. The wafer guide is disposed over the rotatable member for holding a wafer.

Abstract: A method for fabricating a semiconductor device is provided. The method includes the actions of: providing a substrate comprising a preliminary pattern formed thereon; forming an opening through the preliminary pattern to expose an etch stop layer in the preliminary pattern; forming a dielectric layer on a sidewall of the opening; performing a first etching process to penetrate the etching stop layer and form a hole; performing a second etching process to expand a portion of the hole in the substrate; removing the dielectric layer; and depositing a conductive preliminary pattern on the sidewall of the opening and in the hole.

Abstract: The present disclosure provides a method and a cleaning apparatus for cleaning semiconductor wafers. The cleaning apparatus includes a plurality of cleaning tanks, a dipping tank, a first robot hand, a second robot hand, and at least one drying chamber. The plurality of cleaning tanks is configured to clean a plurality of wafers held by a cassette by cleaning agents. The plurality of wafers is cleaned in the plurality of cleaning tanks through a batch process. The dipping tank is configured to rinse the plurality of wafers by a replacement agent. The at least one drying chamber is configured to dry the wafer taken by the second robot hand with single wafer process.

Abstract: A fluid preparation system includes a tank, a chemical supply line, a mixer, and a deionized (DI) water supply line. The tank contains a first chemical solution. The chemical supply line is coupled to the tank and configured to supply the first chemical solution. The mixer is coupled to the tank. The DI water supply line is coupled to the mixer and configured to supply DI water. The first chemicals solution and the DI water are mixed at the mixer to generate a second chemical solution.