Patents by Inventor Chang Rin Lee

Chang Rin Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cylindrical magnetic levitation stage and lithography
    Patent number: 8964167
    Abstract: The present invention provides a cylindrical magnetic levitation stage and an exposure apparatus, which can form a nanoscale pattern of a large area directly on the surface of a large cylinder. The present invention provides an exposure apparatus including a new type of cylindrical magnetic levitation stage, which can levitate, rotate, and move a cylinder in the axial direction by the principle of magnetic levitation in a non-contact manner and form a nanoscale pattern on the surface of the cylinder, and a light source for irradiating light on the surface of the cylinder, thereby reducing the position error of the cylindrical magnetic levitation stage to a nanoscale size and correcting the error caused by mechanical processing in real time.
    Type: Grant
    Filed: October 28, 2010
    Date of Patent: February 24, 2015
    Assignee: Korea Electrotechnology Research Institute
    Inventors: Jeong Woo Jeon, Hyeon Seok Oh, Mitica Caraiani, Sung Il Chung, Hyeon Taeg Kim, Chang Rin Lee, Jong Moon Kim
  • CYLINDRICAL MAGNETIC LEVITATION STAGE AND LITHOGRAPHY
    Publication number: 20130120732
    Abstract: The present invention provides a cylindrical magnetic levitation stage and an exposure apparatus, which can form a nanoscale pattern of a large area directly on the surface of a large cylinder. The present invention provides an exposure apparatus including a new type of cylindrical magnetic levitation stage, which can levitate, rotate, and move a cylinder in the axial direction by the principle of magnetic levitation in a non-contact manner and form a nanoscale pattern on the surface of the cylinder, and a light source for irradiating light on the surface of the cylinder, thereby reducing the position error of the cylindrical magnetic levitation stage to a nanoscale size and correcting the error caused by mechanical processing in real time.
    Type: Application
    Filed: October 28, 2010
    Publication date: May 16, 2013
    Applicant: Korea Electrotechnology Research Institute
    Inventors: Jeong Woo Jeon, Hyeon Seok Oh, Mitica Caraiani, Sung Il Chung, Hyeon Taeg Kim, Chang Rin Lee, Jong Moon Kim