Abstract: An integrated circuit device includes a lower electrode, an upper electrode, and a dielectric layer structure between the lower electrode and the upper electrode, the dielectric layer structure including a first surface facing the lower electrode and a second surface facing the upper electrode. The dielectric layer structure includes a first dielectric layer including a first dielectric material and a plurality of grains extending from the first surface to the second surface and a second dielectric layer including a second dielectric material and surrounding a portion of a sidewall of each of the plurality of grains of the first dielectric layer in a level lower than the second surface. The second dielectric material includes a material having bandgap energy which is higher than bandgap energy of the first dielectric material.

Abstract: A photoresist composition including an organometallic compound, and a method for fabricating a semiconductor device using the same are provided. The photoresist composition may include an organometallic compound, a radical sensitizer including a structure of Chemical formula 2-1 or Chemical formula 2-2, and a solvent. In Chemical formula 2-1, A1 is a substituted or unsubstituted hydrocarbon group having 1 to 20 carbon atoms, and R1, R2 and R3 are each independently hydrogen, a halogen, a substituted or unsubstituted hydrocarbon group having 1 to 20 carbon atoms, or a hetero-functional group. In Chemical formula 2-2, A2 is a substituted or unsubstituted hydrocarbon group having 1 to 20 carbon atoms, and R4 and R5 are each independently hydrogen, a halogen, a substituted or unsubstituted hydrocarbon group having 1 to 20 carbon atoms, or a hetero-functional group.

Abstract: An electronic component-embedded substrate includes a first core layer having a first through-hole, a first passive component disposed in the first through-hole, a second core layer disposed on the first core layer and having a second through-hole, a second passive component disposed in the second through-hole, an insulating material covering at least a portion of each of the first passive component and the second passive component and disposed in at least a portion of each of the first through-hole and the second through-hole, and a first wiring layer disposed on a level between the first passive component and the second passive component such that at least a portion of the first wiring layer is covered with the insulating material. The first passive component and the second passive component are connected to each other by the first wiring layer.

Abstract: A printed circuit board includes: a core substrate including a plurality of core layers; a plurality of magnetic members embedded in each of the plurality of core layers; a first coil pattern disposed on the core substrate; and a second coil pattern disposed below the core substrate.

Abstract: An electronic component-embedded substrate includes a first core layer having a first through-hole, a first passive component disposed in the first through-hole, a second core layer disposed on the first core layer and having a second through-hole, a second passive component disposed in the second through-hole, an insulating material covering at least a portion of each of the first passive component and the second passive component and disposed in at least a portion of each of the first through-hole and the second through-hole, and a first wiring layer disposed on a level between the first passive component and the second passive component such that at least a portion of the first wiring layer is covered with the insulating material. The first passive component and the second passive component are connected to each other by the first wiring layer.

Abstract: Provided are a window film composition, a flexible window film formed therefrom and a flexible display device containing the same, the composition comprising: a crosslinking agent represented by RX-X—Z—Y-RY (RX and RY each independently represent a glycidyl group, a glycidyl group-containing functional group, an alicyclic epoxy group or an alicyclic epoxy group-containing functional group); an epoxy group-containing siloxane resin; and an initiator.

Abstract: A semiconductor integrated circuit device and a fabrication method thereof are disclosed. The resistive memory device includes a lower electrode, a resistive layer formed in a resistance change region on the lower electrode, an upper electrode formed on the resistive layer, and an insertion layer configured to allow a reset current path of the resistive layer, which is formed from the upper electrode to the lower electrode, to be bypassed in a direction perpendicular to or parallel to a surface of the lower electrode.

Abstract: Provided are: a composition for a window film, containing a silicone resin comprising chemical formula 1 below, a cross-linking agent, and an initiator; a window film formed therefrom; and a flexible display device comprising the same. (R1SiO3/2)x(SiO3/2-Q-SiO3/2)y(R2SiO3/2)z (In chemical formula 1, R1 and R2 are each independently a cycloaliphatic epoxy group, a cycloaliphatic epoxy group-containing functional group, a glycidyl group, or a glycidyl group-containing functional group; Q is R3 or -A1-T-A2-; R3 is a substituted or unsubstituted C1 to C10 alkylene group, or a substituted or unsubstituted C6 to C30 arylene group; A1 and A2 are each independently a single bond, or a substituted or unsubstituted C1 to C5 alkylene group; T is a mono- or polyalkylene oxide group, or an imide group-containing functional group; and 0<x<1, 0<y<1, 0?z<1, and x+y+z=1.

Abstract: A composition for a window film including a first silicon resin including a compound represented by Formula 1; a second silicon resin including a crosslinkable functional group and at least one of a Q unit and a bridge unit; a crosslinking agent; and an initiator, a flexible window film formed therefrom, and a flexible display device including the same are disclosed.

Abstract: Provided are: a composition for a window film, containing a siloxane resin including chemical formula 1, a cross-linking agent, and an initiator; a flexible window film formed therefrom; and a flexible display device including the same.

Abstract: Provided are a composition for a window film, a flexible window film formed therefrom, and a flexible display device comprising same, the composition for a window film comprising: a first silicone resin comprising chemical formula 1; a second silicone resin containing a crosslinkable functional group and one or more among a Q unit and a bridge unit; a crosslinking agent; and an initiator. (R1SiO3/2)x([R2R3SiO2/2]n)y(R4R5SiO2/2)z(R6R7R8SiO1/2)w (where R1 is a crosslinkable functional group; R2 and R3 are each independently a methyl group; R4 and R5 are each independently hydrogen, a crosslinkable functional group, an unsubstituted or substituted C1-C20 alkyl group, or an unsubstituted or substituted C5-C20 cycloalkyl group; R6, R7, and R8 are each independently hydrogen, a crosslinkable functional group, an unsubstituted or substituted C1-C20 alkyl group, an unsubstituted or substituted C5-C20 cycloalkyl group, or an unsubstituted or substituted C6-C30 aryl group; n is an integer from 7 to 100; 0<x<1, 0.

Abstract: The present invention relates to: a photocurable composition containing (A) a photocurable monomer and (B) a monomer containing phosphorus and an amide group; and a device including a barrier layer formed of the composition.

Abstract: Provided are a composition for a window film, a flexible window film formed therefrom, and a flexible display device comprising the same, wherein the composition for a window film, contains: (1) a siloxane resin comprising (R1SiO3/2)x(R2SiO3/2)y (wherein, R1 is a cross-linkable functional group, R2 is a UV absorbing functional group or a UV absorbing functional group-containing group, and 0<x<1, 0<y<1, x+y=1) and (2) an initiator.

Abstract: A semiconductor integrated circuit device and a fabrication method thereof are disclosed. The resistive memory device includes a lower electrode, a resistive layer formed in a resistance change region on the lower electrode, an upper electrode formed on the resistive layer, and an insertion layer configured to allow a reset current path of the resistive layer, which is formed from the upper electrode to the lower electrode, to be bypassed in a direction perpendicular to or parallel to a surface of the lower electrode.

Abstract: Provided are a siloxane resin of chemical formula 1, a composition for a window film, the composition containing a cross-linking agent and an initiator, a flexible window film formed therefrom, and a flexible display device comprising the same.

Abstract: Provided are a window film composition, a flexible window film formed therefrom and a flexible display device containing the same, the composition comprising: a crosslinking agent represented by RX—X—Z—Y—RY (RX and RY each independently represent a glycidyl group, a glycidyl group-containing functional group, an alicyclic epoxy group or an alicyclic epoxy group-containing functional group); an epoxy group-containing siloxane resin; and an initiator.

Abstract: Provided is a composition for window films comprising a siloxane resin of formula 1, a crosslinking agent and an initiator, a flexible window film formed therefrom, and a flexible display device comprising the same. (R1SiO3/2)x(R2SiO3/2)y(R3R4SiO2/2)z(SiO4/2)w (in formula 1, R1 is a functional group containing an alicyclic epoxy group, R2 is a functional group containing a glycidyl group, R3 and R4 are each independently a hydrogen, a functional group containing an alicyclic epoxy group, a functional group containing a glycidyl group, an optionally substituted C1 to C20 alkyl group, an optionally substituted C5 to C20 cycloalkyl group or an optionally substituted C6 to C20 aryl group, wherein 0<x<1, 0<y?0.5, 0?z<1, 0?w<1, and x+y+z+w=1).

Abstract: Provided are a composition for a window film, a flexible window film formed therefrom, and a flexible display device comprising the same, wherein the composition for a window film, contains: (1) a siloxane resin comprising (R1SiO3/2)x(R2SiO3/2)y (wherein, R1 is a cross-linkable functional group, R2 is a UV absorbing functional group or a UV absorbing functional group-containing group, and 0<x<1, 0<y<1, x+y=1) and (2) an initiator.

Abstract: Provided are: a composition for a window film, containing a silicone resin comprising chemical formula 1 below, a cross-linking agent, and an initiator; a window film formed therefrom; and a flexible display device comprising the same. (R1SiO3/2)x(SiO3/2-Q-SiO3/2)y(R2SiO3/2)z (In chemical formula 1, R1 and R2 are each independently a cycloaliphatic epoxy group, a cycloaliphatic epoxy group-containing functional group, a glycidyl group, or a glycidyl group-containing functional group; Q is R3 or -A1-T-A2-; R3 is a substituted or unsubstituted C1 to C10 alkylene group, or a substituted or unsubstituted C6 to C30 arylene group; A1 and A2 are each independently a single bond, or a substituted or unsubstituted C1 to C5 alkylene group; T is a mono- or polyalkylene oxide group, or an imide group-containing functional group; and 0<x<1, 0<y<1, 0?z<1, and x+y+z=1.

Abstract: Provided are: a composition for a window film, containing a siloxane resin including chemical formula 1, a cross-linking agent, and an initiator; a flexible window film formed therefrom; and a flexible display device including the same.