Patents by Inventor Chang Yeol Oh

Chang Yeol Oh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Network device and terminal for multi-path communication, operation method thereof, and program implementing operation method
    Patent number: 10355982
    Abstract: An approach for multipath communication of a terminal via a gateway is provided. The approach includes storing a whitelist including applications corresponding to multipath communication applicable objects, and generating, when a first application included in the whitelist is executed, at least one path connected to the gateway using at least one of multiplex communication interfaces.
    Type: Grant
    Filed: June 1, 2015
    Date of Patent: July 16, 2019
    Assignee: KT Corporation
    Inventors: Sunghoon Seo, Junghun Ryu, Chang Yeol Oh, Jai-Sop Hyun, Jinho Kim, Seonjeong Min
  • NETWORK DEVICE AND TERMINAL FOR MULTI-PATH COMMUNICATION, OPERATION METHOD THEREOF, AND PROGRAM IMPLEMENTING OPERATION METHOD
    Publication number: 20170134261
    Abstract: An approach for multipath communication of a terminal via a gateway is provided. The approach includes storing a whitelist including applications corresponding to multipath communication applicable objects, and generating, when a first application included in the whitelist is executed, at least one path connected to the gateway using at least one of multiplex communication interfaces.
    Type: Application
    Filed: June 1, 2015
    Publication date: May 11, 2017
    Applicant: KT Corporation
    Inventors: Sunghoon SEO, Junghun RYU, Chang Yeol OH, Jai-Sop HYUN, Jinho KIM, Seonjeong MIN
  • COMPOSITION FOR COATING PHOTORESIST PATTERN AND METHOD FOR FORMING FINE PATTERN USING THE SAME
    Publication number: 20170032960
    Abstract: Disclosed are a composition for coating a photoresist pattern and a method for forming a fine pattern using the same. The composition for coating a photoresist pattern includes an ammonium base-containing polymer compound and a solvent. The method for forming a fine pattern includes coating the composition on a previously formed photoresist pattern to thereby effectively reduce the size of a photoresist contact hole or space, and can be used in all semiconductor processes in which a fine pattern is required to be formed.
    Type: Application
    Filed: January 11, 2016
    Publication date: February 2, 2017
    Inventors: Sung Jae Lee, Keun Kyu Kong, Jeong Hoon An, Yun Seop Oh, Chang Yeol Oh