Abstract: An SRAM array circuit in which a horizontal N-well of a well tap cell in a first row separated from a horizontal N-well of a well tap cell in a second row by a P-type substrate region is disclosed. The well tap cells include a bilateral P-type well tap disposed in the P-type substrate region between the horizontal N-wells in the first and second rows providing ground voltage to the P-type substrate on both sides of a column of well tap cells in the SRAM array circuit, rather than one P-type well tap for each side. Well tap cells without a vertical N-well reduces width, which corresponds to a reduction in width of the SRAM array circuit. The bilateral P-type well tap in a P-type implant region may include a plurality of folded fingers providing the ground voltage to the P-type substrate.

Abstract: An SRAM array circuit in which a horizontal N-well of a well tap cell in a first row separated from a horizontal N-well of a well tap cell in a second row by a P-type substrate region is disclosed. The well tap cells include a bilateral P-type well tap disposed in the P-type substrate region between the horizontal N-wells in the first and second rows providing ground voltage to the P-type substrate on both sides of a column of well tap cells in the SRAM array circuit, rather than one P-type well tap for each side. Well tap cells without a vertical N-well reduces width, which corresponds to a reduction in width of the SRAM array circuit. The bilateral P-type well tap in a P-type implant region may include a plurality of folded fingers providing the ground voltage to the P-type substrate.

Abstract: An IC includes a first memory block, a second memory block, and a first memory border cell between the first memory block and the second memory block. The first memory border cell includes a first memory core endcap to the first memory block on a first side of the cell. The first memory border cell further includes a second memory core endcap to the second memory block on a second side of the cell. The second side is opposite the first side. The first memory border cell further includes a memory gap portion between the first memory core endcap and the second memory core endcap. The memory gap portion provides a gap between the first memory core endcap and the second memory core endcap.

Abstract: SRAM cell circuits have a minimum distance between a storage circuit active region and a read port circuit active region to reduce area. SRAM cell circuits are formed in FinFETs in a storage circuit active area and a read port active area each including one or more diffusion regions of a substrate. Design rule constraints limit a minimum center-to-center distance between adjacent parallel fins. The SRAM bit cell has a reduced total area because a distance between the storage circuit active area and the read port active area is reduced to a minimum separation distance of between 1.0 and 2.15 times the smallest center-to-center distance between adjacent fins. Minimizing a separation distance may include relocating a gate contact of a write access transistor from a location between the storage circuit active region and the read port active region to a location overlapping the storage circuit active area.

Abstract: SRAM cell circuits have a minimum distance between a storage circuit active region and a read port circuit active region to reduce area. SRAM cell circuits are formed in FinFETs in a storage circuit active area and a read port active area each including one or more diffusion regions of a substrate. Design rule constraints limit a minimum center-to-center distance between adjacent parallel fins. The SRAM bit cell has a reduced total area because a distance between the storage circuit active area and the read port active area is reduced to a minimum separation distance of between 1.0 and 2.15 times the smallest center-to-center distance between adjacent fins. Minimizing a separation distance may include relocating a gate contact of a write access transistor from a location between the storage circuit active region and the read port active region to a location overlapping the storage circuit active area.

Abstract: An IC includes a first memory block, a second memory block, and a first memory border cell between the first memory block and the second memory block. The first memory border cell includes a first memory core endcap to the first memory block on a first side of the cell. The first memory border cell further includes a second memory core endcap to the second memory block on a second side of the cell. The second side is opposite the first side. The first memory border cell further includes a memory gap portion between the first memory core endcap and the second memory core endcap. The memory gap portion provides a gap between the first memory core endcap and the second memory core endcap.

Abstract: A memory is provided with a plurality of cores that power up according to a power-up order from a first core to a final core. As the core power supply voltage for a current core powers up according to the power-up order, it triggers the power-up of a succeeding core in the power-up order responsive to the core power supply voltage exceeding the threshold voltage of a control transistor in the succeeding core.

Abstract: A memory is provided with a plurality of cores that power up according to a power-up order from a first core to a final core. As the core power supply voltage for a current core powers up according to the power-up order, it triggers the power-up of a succeeding core in the power-up order responsive to the core power supply voltage exceeding the threshold voltage of a control transistor in the succeeding core.