Abstract: A light emitting device includes an epitaxial structure and first and second electrodes on a side of the epitaxial structure. The epitaxial structure includes a first-type semiconductor layer, an active layer, and a second-type semiconductor layer. The active layer is disposed between the first-type semiconductor layer and the second-type semiconductor layer. The first electrode is disposed on the epitaxial structure to be electrically connected with the first-type semiconductor layer. The second electrode is disposed on the epitaxial structure to be electrically connected with the second-type semiconductor layer. The second electrode is in ohmic contact with a second-type window sublayer of the second-type semiconductor layer.

Abstract: A coaxial cavity gyrotron with two electron beams includes an electron gun (magnetron injection gun, “MIG,” with two beams), a coaxial beam-wave interaction cavity and an outer magnetic field tube. The coaxial beam-wave interaction cavity consists of two parts: an outer conductor and an inner conductor. The two hollow electron beams produced by the MIG are located between the outer conductor and the inner conductor. The MIG includes inner and outer anodes, with a single cathode located between the anodes. The cathode further includes two emitter rings which produce the two hollow electron beams. The entire gyrotron is immersed in the magnetic field tube such that the magnetic field profile is the same or similar to that for a coaxial gyrotron with one electron beam.

Abstract: A coaxial cavity gyrotron with two electron beams includes an electron gun (magnetron injection gun, “MIG,” with two beams), a coaxial beam-wave interaction cavity and an outer magnetic field tube. The coaxial beam-wave interaction cavity consists of two parts: an outer conductor and an inner conductor. The two hollow electron beams produced by the MIG are located between the outer conductor and the inner conductor. The MIG includes inner and outer anodes, with a single cathode located between the anodes. The cathode further includes two emitter rings which produce the two hollow electron beams. The entire gyrotron is immersed in the magnetic field tube such that the magnetic field profile is the same or similar to that for a coaxial gyrotron with one electron beam.

Abstract: A coaxial cavity gyrotron with two electron beams includes an electron gun (magnetron injection gun, “MIG,” with two beams), a coaxial cavity and a magnetic field tube. The coaxial cavity consists of two parts: an outer conductor 1 and an inner conductor 4. The two hollow electron beams 2, 3 produced by the electron gun are located between the outer conductor 1 and the inner conductor 4. The MIG with two electron beams includes inner and outer anodes 7, 8 with a cathode 9 located between the anodes. The cathode further includes two emitter rings 9a, 9b which produce the two hollow electron beams 2, 3. The entire gyrotron is immersed in the magnetic field tube such that the magnetic field profile is the same or similar to that for a coaxial gyrotron with one electron beam.

Abstract: A steady-state, glow discharge plasma is generated at one atmosphere of pressure within the volume between a pair of insulated metal plate electrodes spaced up to 5 cm apart and R.F. energized with an rms potential of 1 to 5 KV at 1 to 100 KHz. Space between the electrodes is occupied by air, nitrous oxide, a noble gas such as helium, neon, argon, etc. or mixtures thereof. The electrodes are charged by an impedance matching network adjusted to produce the most stable, uniform glow discharge.

Abstract: A steady-state, glow discharge plasma is generated within the volume between a pair of parallel, insulated metal plate electrodes spaced up to 5 cm apart and R.F. energized with an rms potential of 1 to 5 KV at 1 to 100 KHz. The electrodes are located within an enclosure capable of maintaining an atmosphere other than atmospheric air between the electrode surfaces. Space between the electrodes is occupied by a noble gas such as helium, neon, argon, etc. or mixtures thereof.