Patents by Inventor Charles E. Wickersham
Charles E. Wickersham has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 8785232Abstract: A method to improve CdTe-based photovoltaic device efficiency is disclosed. The CdTe-based photovoltaic device can include oxygen or silicon in semiconductor layers.Type: GrantFiled: July 18, 2013Date of Patent: July 22, 2014Assignee: First Solar, Inc.Inventors: Gang Xiong, Rick C. Powell, Aaron Roggelin, Kuntal Kumar, Arnold Allenic, Kenneth M. Ring, Charles E. Wickersham
-
Publication number: 20130298992Abstract: A method to improve CdTe-based photovoltaic device efficiency is disclosed. The CdTe-based photovoltaic device can include oxygen or silicon in semiconductor layers.Type: ApplicationFiled: July 18, 2013Publication date: November 14, 2013Applicant: First Solar, Inc.Inventors: Gang Xiong, Rick C. Powell, Aaron Roggelin, Kuntal Kumar, Arnold Allenic, Kenneth M. Ring, Charles E. Wickersham
-
Patent number: 8500928Abstract: A method of making sputter targets using rotary axial forging is described. Other thermomechanical working steps can be used prior to and/or after the forging step. Sputter targets are further described which can have unique grain size and/or crystal structures.Type: GrantFiled: July 18, 2012Date of Patent: August 6, 2013Assignee: Global Advanced Metals, USA, Inc.Inventors: John P. Matera, Robert B. Ford, Charles E. Wickersham, Jr.
-
Publication number: 20120297855Abstract: A method of making sputter targets using rotary axial forging is described. Other thermomechanical working steps can be used prior to and/or after the forging step. Sputter targets are further described which can have unique grain size and/or crystal structures.Type: ApplicationFiled: July 18, 2012Publication date: November 29, 2012Applicant: GLOBAL ADVANCED METALS, USA, INC.Inventors: John P. Matera, Robert B. Ford, Charles E. Wickersham, JR.
-
Patent number: 8252126Abstract: A method of making sputter targets using rotary axial forging is described. Other thermomechanical working steps can be used prior to and/or after the forging step. Sputter targets are further described which can have unique grain size and/or crystal structures.Type: GrantFiled: May 4, 2005Date of Patent: August 28, 2012Assignee: Global Advanced Metals, USA, Inc.Inventors: John P. Matera, Robert B. Ford, Charles E. Wickersham, Jr.
-
Patent number: 8231745Abstract: A process is described for processing metal which includes clock rolling a metal plate until the desired thickness is achieved to form a rolled plate. Sputtering targets and other metal articles are further described.Type: GrantFiled: June 27, 2011Date of Patent: July 31, 2012Assignee: Global Advanced Metals, USA, Inc.Inventors: Charles E. Wickersham, Jr., Vladimir Levit, P. Todd Alexander
-
Publication number: 20120048748Abstract: Air quality in a workplace can be monitored to ensure worker safety.Type: ApplicationFiled: August 29, 2011Publication date: March 1, 2012Inventors: Charles E. Wickersham, JR., Gerhard Meyer
-
Publication number: 20110297536Abstract: A process is described for processing metal which includes clock rolling a metal plate until the desired thickness is achieved to form a rolled plate. Sputtering targets and other metal articles are further described.Type: ApplicationFiled: June 27, 2011Publication date: December 8, 2011Applicant: CABOT CORPORATIONInventors: Charles E. Wickersham, JR., Vladimir Levit, P. Todd Alexander
-
Patent number: 7998287Abstract: A process is described for processing metal which includes clock rolling a metal plate until the desired thickness is achieved to form a rolled plate. Sputtering targets and other metal articles are further described.Type: GrantFiled: February 10, 2005Date of Patent: August 16, 2011Assignee: Cabot CorporationInventors: Charles E. Wickersham, Jr., Vladimir Levit, P. Todd Alexander
-
Publication number: 20110147579Abstract: A method for monitoring a quantity of a particle in a sample of air may include heating a particle to form a vapor; detecting the particle; measuring a change in quantity of the particle; and indicating the change in quantity.Type: ApplicationFiled: December 9, 2010Publication date: June 23, 2011Applicant: First Solar, Inc.Inventor: Charles E. Wickersham, JR.
-
Patent number: 7712514Abstract: Methods for reducing inclusion content of sputter targets and targets so produced are disclosed. Inclusions may be reduced by adding a small amount of Si to the molten Al or molten Al alloy followed by filtering of the molten metals through a filter medium. Targets having substantially no inclusions therein of greater than about 400 ?m are especially useful in the sputtering of large flat panel displays and result, upon sputtering, in a reduction in the amount of macroparticles sputtered onto the substrate.Type: GrantFiled: December 1, 2008Date of Patent: May 11, 2010Assignee: Tosoh SMD, Inc.Inventors: Charles E. Wickersham, Jr., John E. Poole, Alexander Leybovich, Lin Zhu
-
Patent number: 7561937Abstract: A system and method are provided for manufacturing workpieces, such as metal articles like sputtering target, the system comprising: comparing one or more physical or chemical values of a respective one of a plurality of metal target blanks to one or more comparable values of at least one desired criterion; selecting one of the metal target blanks from a plurality of metal target blanks as a work-in-progress; assigning a serial route for the work-in-progress; processing the work-in-progress by translating the work-in-progress from note to node with an automated transport, after completion of the events at each node; rejecting or accepting the work-in-progress as a metal target by evaluating a result of at least one event of the one or more respective events to be completed at, at least one of the plurality of nodes.Type: GrantFiled: January 18, 2006Date of Patent: July 14, 2009Assignee: Tosoh SMD, Inc.Inventors: Wiley Zane Reed, Bobby R. Cosper, Kenneth G. Schmidt, Neil D. Bultz, Charles E. Wickersham, John P. Matera
-
Publication number: 20090150095Abstract: A method for non-destructively detecting the presence of banded regions in a metal is described. The method involves sending an ultrasonic wave into the metal and obtaining reflected signals. The reflected signals are compared with each other to determine variations in signal intensity. A banded region within the metal can be observed as a weaker reflected signal than a reflected backwall signal, thus accurately identifying a location of banding within the metal. Metal articles with a low percent of banding are also described.Type: ApplicationFiled: February 17, 2009Publication date: June 11, 2009Applicant: Cabot CorporationInventor: Charles E. Wickersham, JR.
-
Publication number: 20090078391Abstract: Methods for reducing inclusion content of sputter targets and targets so produced are disclosed. Inclusions may be reduced by adding a small amount of Si to the molten Al or molten Al alloy followed by filtering of the molten metals through a filter medium. Targets having substantially no inclusions therein of greater than about 400 ?m are especially useful in the sputtering of large flat panel displays and result, upon sputtering, in a reduction in the amount of macroparticles sputtered onto the substrate.Type: ApplicationFiled: December 1, 2008Publication date: March 26, 2009Applicant: Tosoh SMD, Inc.Inventors: Charles E. Wickersham, JR., John E. Poole, Alexander Leybovich, Lin Zhu
-
Patent number: 7480976Abstract: A fixture and method is provided for gripping an article, such as a sputtering target. The fixture comprises a base, a first set of contact rollers, and a second set of contact rollers, wherein at least one of the first set and the second set are adjustably positioned relative to the other of the first set and the second set on the base. The contact rollers can be configured as v-grooved wheels that will only touch chamfered portions of an outer diameter of the sputtering target when the contact rollers are clamped against the sputtering target. At least one of the first set and the second set of contact rollers can be pivotally mounted on a slide, with the slide being adjustably positioned on the base of the fixture.Type: GrantFiled: January 18, 2006Date of Patent: January 27, 2009Assignee: Tosoh SMD Etna, LLCInventors: Wiley Zane Reed, Bobby R. Cosper, Kenneth G. Schmidt, Neil D. Bultz, Charles E. Wickersham, John P. Matera
-
Patent number: 7467741Abstract: A method of forming a sputtering target assembly and the sputtering target assembly made therefrom are described. The method includes bonding a sputtering target to a backing plate at a low temperature. Also described is a method of forming a sputtering target assembly such that a gap is formed between the sputtering target and the backing plate. Also described is a method of forming a sputtering target assembly providing a mechanism to prevent unintended sputtering into the backing plate.Type: GrantFiled: October 21, 2003Date of Patent: December 23, 2008Assignee: Cabot CorporationInventors: Charles E. Wickersham, Jr., David P. Workman
-
Publication number: 20080271305Abstract: A system and method are provided for manufacturing a sputtering target. The system is preferably automated. Sub systems of the manufacturing system include a robotic part handling sub system, a weighing sub system adapted to measure the weight of a part to be manufactured into a sputtering target, and a machining sub system adapted to finish machine a part to be manufactured into a sputtering target. The system can further include a cleaning sub system adapted to clean a part to be manufactured into a sputtering target, an inspection sub system adapted to measure dimensions of a part to be manufactured into a sputtering target, and a feedback control sub system adapted to provide control signals to one or more of the robotic handling sub system, the weighing sub system, the cleaning sub system, and the inspection sub system to control processing performed by one or more of the sub systems.Type: ApplicationFiled: January 18, 2006Publication date: November 6, 2008Applicant: Tosoh SMD ETNA, LLCInventors: Wiley Zane Reed, Bobby R. Cosper, Kenneth G. Schmidt, Neil D. Bultz, Charles E. Wickersham, John P. Matera
-
Patent number: 7425093Abstract: A method and apparatus for thermographically evaluating the bond integrity of a sputtering target assembly is described. The method includes applying a heating or cooling medium or energy to one surface of the assembly and acquiring a graphic recording of a corresponding temperature change on the opposing surface of the assembly using an imaging device. Also described is a method of mathematically analyzing the pixel data recorded in each frame to produce an integrated normalized temperature map that represents the bond integrity of the assembly.Type: GrantFiled: July 13, 2004Date of Patent: September 16, 2008Assignee: Cabot CorporationInventors: Charles E. Wickersham, Jr., Zhiguo Zhang, Larry Edwin Ellison, Mikhail Y. Kachalov, John D. White, III
-
Publication number: 20080221721Abstract: A system and method are provided for manufacturing workpieces, such as metal articles like sputtering target, the system comprising: comparing one or more physical or chemical values of a respective one of a plurality of metal target blanks to one or more comparable values of at least one desired criterion; selecting one of the metal target blanks from a plurality of metal target blanks as a work-in-progress; assigning a serial route for the work-in-progress; processing the work-in-progress by translating the work-in-progress from note to node with an automated transport, after completion of the events at each node; rejecting or accepting the work-in-progress as a metal target by evaluating a result of at least one event of the one or more respective events to be completed at, at least one of the plurality of nodes.Type: ApplicationFiled: January 18, 2006Publication date: September 11, 2008Applicant: Tosoh SMD ETNA, LLCInventors: Wiley Zane Reed, Bobby R. Cosper, Kenneth G. Schmidt, Neil D. Bultz, Charles E. Wickersham, John P. Matera
-
Publication number: 20080110011Abstract: A fixture and method is provided for gripping an article, such as a sputtering target. The fixture comprises a base, a first set of contact rollers, and a second set of contact rollers, wherein at least one of the first set and the second set are adjustably positioned relative to the other of the first set and the second set on the base. The contact rollers can be configured as v-grooved wheels that will only touch chamfered portions of an outer diameter of the sputtering target when the contact rollers are clamped against the sputtering target. At least one of the first set and the second set of contact rollers can be pivotally mounted on a slide, with the slide being adjustably positioned on the base of the fixture.Type: ApplicationFiled: January 18, 2006Publication date: May 15, 2008Inventors: Wiley Zane Reed, Bobby R. Cosper, Kenneth G. Schmidt, Neil D. Bultz, Charles E. Wickersham, John P. Matera