Abstract: A ternary superlattice structure includes a substrate and periodic layer structure on the substrate and having alternating infrared absorbing semiconductor materials having a first layer of InAs[1-x]Sb[x] ternary alloy material, and a second layer of In[1-y]Z[y]As ternary alloy material, wherein Z is Ga or Al, wherein x is in a range of greater than zero and less than one, wherein y is in a range of greater than zero and less than one, and wherein a thickness of each of the first and second layers are substantially similar and configured to absorb light in a predetermined spectral band and prevent trapping of carriers in any particular layer. In examples, y is in a range from about 0.05 to about 0.35, and x is in a range of about 0.2 to about 0.8.

Abstract: A ternary superlattice structure includes a substrate and periodic layer structure on the substrate and having alternating infrared absorbing semiconductor materials having a first layer of InAs[1-x]Sb[x] ternary alloy material, and a second layer of In[1-y]Z[y]As ternary alloy material, wherein Z is Ga or Al, wherein x is in a range of greater than zero and less than one, wherein y is in a range of greater than zero and less than one, and wherein a thickness of each of the first and second layers are substantially similar and configured to absorb light in a predetermined spectral band and prevent trapping of carriers in any particular layer. In examples, y is in a range from about 0.05 to about 0.35, and x is in a range of about 0.2 to about 0.8.

Abstract: A photodetector includes a detector material having an upper layer, a lower layer, and at least one sidewall. Also included as part of the photodetector are a first contact electrically coupled to the detector material through the upper layer and a second contact electrically coupled to the detector material through the lower layer. Diffused into the sidewall by a passivation process is a dopant material operable to electrically isolate the first contact from the second contact via the sidewall. The dopant material is provided by a passivation layer deposited on the sidewall.

Abstract: According to some embodiments of the present invention, an avalanche photodiode includes a first electrode, a second electrode spaced apart from the first electrode, a photon absorber layer formed to be in electrical connection with the first electrode, and a charge-carrier multiplication layer formed to be in electrical connection with the second electrode. The photon absorber layer is a semiconducting material that has a first lattice constant, and the charge-carrier multiplication layer is a semiconducting material that has a second lattice constant that is different from the first lattice constant. The photon absorber layer and the charge-carrier multiplication layer are connected together by an interfacial misfit (IMF) array at an interface thereof such that the IMF array provides at least part of an acceleration potential for an avalanche region of the avalanche photodiode.