Patents by Inventor Charles L. Barto

Charles L. Barto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for forming photo-defined micro electrical contacts
    Patent number: 6977515
    Abstract: A method of manufacturing a probe test head for testing of semiconductor integrated circuits includes: defining shapes of a plurality of probes as one or more masks; a step for fabricating the plurality of probes using the mask; and disposing the plurality of probes through corresponding holes in a first die and a second die. The step for fabricating the plurality of probes may include one of photo-etching and photo-defined electroforming.
    Type: Grant
    Filed: October 24, 2003
    Date of Patent: December 20, 2005
    Assignee: Wentworth Laboratories, Inc.
    Inventors: Francis T. McQuade, Charles L. Barto, Phillip M. Truckle
  • Method for chemically etching photo-defined micro electrical contacts
    Patent number: 6906540
    Abstract: A method of fabricating a plurality of micro probes comprising the steps of defining the shapes of a plurality of probes as a mask, applying a photoresist to a surface of a metal foil, overlaying the mask on the metal foil, exposing the photoresist to light passed through the mask, developing the photoresist, removing a portion of the photoresist to expose a portion of the metal foil, applying an etcher to the surface of the metal foil to remove the exposed portion to produce a plurality of probes, and chemically polishing and plating the plurality of probes.
    Type: Grant
    Filed: December 20, 2001
    Date of Patent: June 14, 2005
    Assignee: Wentworth Laboratories, Inc.
    Inventors: Francis T. McQuade, Charles L. Barto
  • Method for forming photo-defined micro electrical contacts
    Publication number: 20040157350
    Abstract: A method of manufacturing a probe test head for testing of semiconductor integrated circuits includes: defining shapes of a plurality of probes as one or more masks; a step for fabricating the plurality of probes using the mask; and disposing the plurality of probes through corresponding holes in a first die and a second die. The step for fabricating the plurality of probes may include one of photo-etching and photo-defined electroforming.
    Type: Application
    Filed: October 24, 2003
    Publication date: August 12, 2004
    Applicant: Wentworth Laboratories, Inc.
    Inventors: Francis T. McQuade, Charles L. Barto, Phillip M. Truckle
  • Method for chemically etching photo-defined micro electrical contacts
    Publication number: 20030057957
    Abstract: A method of fabricating a plurality of micro probes comprising the steps of defining the shapes of a plurality of probes as a mask, applying a photoresist to a surface of a metal foil, overlaying the mask on the metal foil, exposing the photoresist to light passed through the mask, developing the photoresist, removing a portion of the photoresist to expose a portion of the metal foil, applying an etcher to the surface of the metal foil to remove the exposed portion to produce a plurality of probes, and chemically polishing and plating the plurality of probes.
    Type: Application
    Filed: December 20, 2001
    Publication date: March 27, 2003
    Applicant: Wentworth Laboratories, Inc.
    Inventors: Fran McQuade, Charles L. Barto