Abstract: The present invention is a method of cleaning an object in an open aqueous cleaning system. The method is directed to an open cleaning vessel into which water used for cleaning a material or object can be introduced. A means is provided for introducing a reactant chemical to the vessel to form an aqueous solution. Cleaning of the surface is in the form of bubble formation on the part that vaporizes the chemical in order to react the oxidizer in the vapor state to the exposed surface at the bubble growth area. Treatment in the form of etching or any other process in which material is removed from a solid surface displaces the liquid residue from the surface. The resulting process produces no dissolution or emulsion of the contaminant and therefore can be easily separated from the chemical cleaner. The process also conserves chemistry, water, energy, and reduces pollution.

Abstract: The present invention discloses a surface treatment to nucleate, grow, detach, implode and collapse vapor bubbles for various cleaning and surface treatment applications. The process can be accomplished by using alternating temperature and chemical, in addition to vacuum/pressure to produce a pulsing and continuous action within a fluid. In an aspect, a thermal cycle nucleation process employs temperature cycling with controlled heating and cooling processes, and with or without vacuum cycles for cleaning delicate surfaces. In another aspect, a chemical cycle nucleation employs varying concentrations fluid mixtures of chemical vapors/fluids to either create, grow vapor bubbles to treat the surface by collapse or implode vapor bubbles. Different chemical vapors or liquids can form chemical mixtures directly on surfaces to inhibit or eliminate re-deposition of particle, and can be tailored to promote rapid chemical dissolving and breakdown of surface contaminates.

Abstract: The present invention is a method of cleaning an object in an open aqueous cleaning system. The method is directed to an open cleaning vessel into which water used for cleaning a material or object can be introduced. A means is provided for introducing a reactant chemical to the vessel to form an aqueous solution. Cleaning of the surface is in the form of bubble formation on the part that vaporizes the chemical in order to react the oxidizer in the vapor state to the exposed surface at the bubble growth area. Treatment in the form of etching or any other process in which material is removed from a solid surface displaces the liquid residue from the surface. The resulting process produces no dissolution or emulsion of the contaminant and therefore can be easily separated from the chemical cleaner. The process also conserves chemistry, water, energy, and reduces pollution.

Abstract: An enhanced Vacuum Cavitational Streaming (VCS) process focuses on the formation of vapor bubbles and the transfer of a chemical from the solvent to the surface of the object while the chemical is in the vapor state within the bubble, i.e. a chemical mechanism. There is less importance on the rapid implosion (physical mechanism) of the bubble, and more focus on the controlled formation and collapse (as opposed to implosion) of the vapor bubble.

Abstract: The invention is directed to a mehtod of cleaning an object in a controlled environment processing chamber into which solvents, water and/or gases are introduced. The process includes first applying a negative gauge pressure to the chamber to non-condensable gases and then introducing a solvent, solvent mixture, water or gas in either a liquid or vapor state to remove soluble contaminants from the surface of an object being processed in the chamber. Further steps recover residual solvent or solution from the object and chamber. A secondary cleaning step directs a vapor state fluid at high velocity at a solid surface of the object to remove insoluble material left behind after the pretreatment step. A final series of steps recovers any loose impediments or residual liquid or vapor from the chamber and returns the chamber to atmospheric pressure for removal of the cleaned object.

Abstract: The invention is directed to a controlled environment processing chamber into which solvents, water and/or gases can be introduced for cleaning of an object. The process includes first applying a negative gauge pressure to the chamber to non-condensable gases and then introducing a solvent, solvent mixture, water or gas in either a liquid or vapor state to remove soluble contaminants from the surface of an object being processed in the chamber. Further steps recover residual solvent or solution from the object and chamber. A secondary cleaning step directs a vapor state fluid at high velocity at a solid surface of the object to remove insoluble material left behind after the pretreatment step. A final series of steps recovers any loose impediments or residual liquid or vapor from the chamber and returns the chamber to atmospheric pressure for removal of the cleaned object.

Abstract: The invention is directed to a controlled environment processing chamber into which solvents, water and/or gases can be introduced for cleaning of an object. The process includes first applying a negative gauge pressure to the chamber to non-condensable gases and then introducing a solvent, solvent mixture, water or gas in either a liquid or vapor state to remove soluble contaminants from the surface of an object being processed in the chamber. Further steps recover residual solvent or solution from the object and chamber. A secondary cleaning step directs a vapor state fluid at high velocity at a solid surface of the object to remove insoluble material left behind after the pretreatment step. A final series of steps recovers any loose impediments or residual liquid or vapor from the chamber and returns the chamber to atmospheric pressure for removal of the cleaned object.

Abstract: An enclosed solvent and aqueous decompression processing system includes a chamber for holding an object to be processed. At least one vacuum pump applies a negative gauge pressure to the chamber to remove air and other non-condensable gases. Means are provided for introducing a solvent to the evacuated chamber to treat the object contained within. Treatment may be in the form of coating, etching, deposition, cleaning, stripping, plating, adhesion, dissolving, filtering or any other process in which material is removed or deposited on a solid surface by transfer from or to a liquid phase. A first system removes pressure from the chamber to produce vapor bubbles for processing. A second system increases pressure by ceasing to apply vacuum or adding non-condensable gases. The system includes recovery of the solvent from the chamber and object.