Patents by Inventor Chen Ming-Jung

Chen Ming-Jung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cleaning composition and method for semiconductor device fabrication
    Patent number: 9881816
    Abstract: A method of cleaning a substrate such as semiconductor substrate for IC fabrication is described that includes cleaning the semiconductor substrate with a mixture of ozone and one of an acid and a base. Exemplary acids and bases include HCl, HF, and NH4OH. The cleaning mixture may further include de-ionized water. In an embodiment, the mixture is sprayed onto a heated substrate surface.
    Type: Grant
    Filed: February 1, 2013
    Date of Patent: January 30, 2018
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Wen Li, Bo-Wei Chou, Shao-Yen Ku, Chen Ming-Jung
  • CLEANING COMPOSITION AND METHOD FOR SEMICONDUCTOR DEVICE FABRICATION
    Publication number: 20140216499
    Abstract: A method of cleaning a substrate such as semiconductor substrate for IC fabrication is described that includes cleaning the semiconductor substrate with a mixture of ozone and one of an acid and a base. Exemplary acids and bases include HCl, HF, and NH4OH. The cleaning mixture may further include de-ionized water. In an embodiment, the mixture is sprayed onto a heated substrate surface.
    Type: Application
    Filed: February 1, 2013
    Publication date: August 7, 2014
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chia-Wen Li, Bo-Wei Chou, Shao-Yen Ku, Chen Ming-Jung