Patents by Inventor Cheng Chen Shih

Cheng Chen Shih has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Combination process of vacuum sputtering and wet coating for high conductivity and light attenuation anti-reflection coating on CRT surface
    Patent number: 6478932
    Abstract: A combination process of vacuum sputtering and wet coating produces a high conductivity and light attenuation anti-reflection coating on a substrate of a CRT surface. The coating includes five layers by vacuum sputtering and one layer on top of the coating by conventional wet process. The layers produced by vacuum sputtering provides high anti-reflection, low resistivity, and light-attenuation effect. The layer produced by wet process provides fingerprint proof effect.
    Type: Grant
    Filed: June 21, 2001
    Date of Patent: November 12, 2002
    Assignee: Applied Vacuum Coating Technologies Co., Ltd.
    Inventors: Jau-Jier Chu, Jau-Sung Lee, Cheng-Chen Shih, Shao-Chi Chang
  • ANTI-REFLECTION HIGH CONDUCTIVITY MULTI-LAYER COATING FOR FLAT CRT PRODUCTS
    Publication number: 20020141064
    Abstract: An anti-reflection with high conductivity and transmission controlled multi-layer coating for Flat CRT products is provided which includes five layers coating by vacuum sputtering and one layer coating by conventional wet process. The first layer is formed by an oxide material. The second layer is arranged on an underlying first layer and is formed by a metal. The third layer is arranged on an underlying second layer and is coated by vacuum sputtering. The third layer provides high conductivity thin film with resistance as low as 102 &OHgr;/square. The fourth layer is arranged on an underlying third layer and is formed by an oxide material. The fifth layer is formed by an oxide material. The fourth layer and fifth layer are coated by vacuum sputtering. The sixth layer is deposited on the top surface and is formed by a wet silica coating process.
    Type: Application
    Filed: January 10, 2001
    Publication date: October 3, 2002
    Inventors: Jau-Jier Chu, Chao-Sung Li, Cheng Chen Shih, Shao Chi Chang
  • Anti-reflection high conductivity multi-layer coating for flat CRT products
    Patent number: 6441964
    Abstract: An anti-reflection with high conductivity and transmission controlled multi-layer coating for Flat CRT products is provided which includes five layers coating by vacuum sputtering and one layer coating by conventional wet process. The first layer is formed by an oxide material. The second layer is arranged on an underlying first layer and is formed by a metal. The third layer is arranged on an underlying second layer and is coated by vacuum sputtering. The third layer provides high conductivity thin film with resistance as low as 102 &OHgr;/square. The fourth layer is arranged on an underlying third layer and is formed by an oxide material. The fifth layer is formed by an oxide material. The fourth layer and fifth layer are coated by vacuum sputtering. The sixth layer is deposited on the top surface and is formed by a wet silica coating process.
    Type: Grant
    Filed: January 10, 2001
    Date of Patent: August 27, 2002
    Assignee: Applied Vacuum Coating Technologies Co., Ltd.
    Inventors: Jau-Jier Chu, Chao-Sung Li, Cheng Chen Shih, Shao Chi Chang