Patents by Inventor Cheng-Chung Lim

Cheng-Chung Lim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Buffer apparatus and thin film deposition system
    Patent number: 8328938
    Abstract: A buffer apparatus and a thin film deposition system are provided. The buffer apparatus is connected between a liquid material supply apparatus and a deposition machine. The buffer apparatus includes a container and a baffle. The container is used for containing a liquid material supplied from the liquid material supply apparatus. The top of the container has an input hole and an output hole. The baffle is disposed in the container and located under the input hole.
    Type: Grant
    Filed: August 21, 2008
    Date of Patent: December 11, 2012
    Assignee: United Microelectronics Corp.
    Inventors: Cheng-Chung Lim, Zhao-Jin Sun, Jui-Ling Tang, Chin-Khye Pang, Yu-Heng Liu
  • Method of cleaning turbo pump and chamber/turbo pump clean process
    Patent number: 8277567
    Abstract: A method of cleaning a turbo pump is described. The turbo pump is coupled with a CVD chamber of depositing a material and thus accumulates the material therein. The method includes switching off the turbo pump and using another pump to pump a reactive gas, which can react with the material to form gaseous products, through the turbo pump. Thereby, the turbo pump is cleaned up and is prevented from being a particle source in subsequent CVD operations.
    Type: Grant
    Filed: August 8, 2011
    Date of Patent: October 2, 2012
    Assignee: United Microelectronics Corp.
    Inventors: Kian-Soong Poh, Jui-Ling Tang, Chong-Tat Lee, Cheng-Chung Lim
  • METHOD OF CLEANING TURBO PUMP AND CHAMBER/TURBO PUMP CLEAN PROCESS
    Publication number: 20110284035
    Abstract: A method of cleaning a turbo pump is described. The turbo pump is coupled with a CVD chamber of depositing a material and thus accumulates the material therein. The method includes switching off the turbo pump and using another pump to pump a reactive gas, which can react with the material to form gaseous products, through the turbo pump. Thereby, the turbo pump is cleaned up and is prevented from being a particle source in subsequent CVD operations.
    Type: Application
    Filed: August 8, 2011
    Publication date: November 24, 2011
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Kian-Soong Poh, Jui-Ling Tang, Chong-Tat Lee, Cheng-Chung Lim
  • Method of cleaning turbo pump and chamber/turbo pump clean process
    Patent number: 8021492
    Abstract: A method of cleaning a turbo pump is described. The turbo pump is coupled with a CVD chamber of depositing a material and thus accumulates the material therein. The method includes using another pump to pump a reactive gas, which can react with the material to form gaseous products, through the turbo pump. Thereby, the turbo pump is cleaned up and is prevented from being a particle source in subsequent CVD operations.
    Type: Grant
    Filed: May 29, 2007
    Date of Patent: September 20, 2011
    Assignee: United Microelectronics Corp.
    Inventors: Kian-Soong Poh, Jui-Ling Tang, Chong-Tat Lee, Cheng-Chung Lim
  • BUFFER APPARATUS AND THIN FILM DEPOSITION SYSTEM
    Publication number: 20100043701
    Abstract: A buffer apparatus and a thin film deposition system are provided. The buffer apparatus is connected between a liquid material supply apparatus and a deposition machine. The buffer apparatus includes a container and a baffle. The container is used for containing a liquid material supplied from the liquid material supply apparatus. The top of the container has an input hole and an output hole. The baffle is disposed in the container and located under the input hole.
    Type: Application
    Filed: August 21, 2008
    Publication date: February 25, 2010
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Cheng-Chung Lim, Zhao-Jin Sun, Jui-Lin Tang, Chin-Khye Pang, Yu-Heng Liu
  • METHOD OF CLEANING TURBO PUMP AND CHAMBER/TURBO PUMP CLEAN PROCESS
    Publication number: 20080295867
    Abstract: A method of cleaning a turbo pump is described. The turbo pump is coupled with a CVD chamber of depositing a material and thus accumulates the material therein. The method includes using another pump to pump a reactive gas, which can react with the material to form gaseous products, through the turbo pump. Thereby, the turbo pump is cleaned up and is prevented from being a particle source in subsequent CVD operations.
    Type: Application
    Filed: May 29, 2007
    Publication date: December 4, 2008
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Kian-Soong Poh, Jui-Ling Tang, Chong-Tat Lee, Cheng-Chung Lim
  • CLEAN METHOD FOR VAPOR DEPOSITION PROCESS
    Publication number: 20080260946
    Abstract: A method for cleaning a reaction chamber having a pedestal and a carrier ring is provided. First, the pedestal and the carrier ring are cleaned with a high pressure gas. Next, the carrier ring is moved to leave the pedestal, and a low pressure gas is provided to clean the pedestal, the carrier ring, and an area lay between the pedestal and the carrier ring. Thereafter, a full flush is performed to clean the pedestal and the carrier ring.
    Type: Application
    Filed: April 20, 2007
    Publication date: October 23, 2008
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Hwee-Leong Tan, Cheng-Chung Lim, Jui-Lin Tang, Zhao-Jin Sun, Han-Chuan Fang