Abstract: The present disclosure relates to a method for fabricating a semiconductor structure. The method includes providing a substrate with a gate structure, an insulating structure over the gate structure, and a S/D region; depositing a titanium silicide layer over the S/D region with a first chemical vapor deposition (CVD) process. The first CVD process includes a first hydrogen gas flow. The method also includes depositing a titanium nitride layer over the insulating structure with a second CVD process. The second CVD process includes a second hydrogen gas flow. The first and second CVD processes are performed in a single reaction chamber and a flow rate of the first hydrogen gas flow is higher than a flow rate of the second hydrogen gas flow.

Abstract: The present disclosure provides a shaft seal device. The shaft seal device includes a main body. The main body includes a channel, a first ring part, a second ring part, a liquid flow hole and a diversion structure. The channel passes through the main body, and includes a channel inner peripheral surface. The first ring part and the second ring part are formed on the channel inner peripheral surface. An aperture of the first ring part is greater than an aperture of the second ring part. The liquid flow hole passes through the main body from an outer surface of the main body to a first inner peripheral surface of the first ring part. The diversion structure is disposed on the first inner peripheral surface and is adjacent to the liquid flow hole.

Abstract: The present invention provides a shaft sealing device for being mounted on a rotating shaft. The shaft sealing device of the present invention includes a stationary member disposed on a housing of the shaft sealing device and having a first sealing surface; and a rotary member corresponding to the stationary member, disposed on the rotating shaft and having a second sealing surface opposite to the first sealing surface of the stationary member. A groove is disposed on the first sealing surface or the second sealing surface, and extends inwardly from the outer peripheral edge. When the groove extends inwardly, an end (a bottom wall) of the groove extends along a tangential direction of an imaginary circle containing the bottom wall of the groove.

Abstract: The present invention provides a shaft sealing device for being mounted on a rotating shaft. The shaft sealing device of the present invention includes a stationary member disposed on a housing of the shaft sealing device and having a first sealing surface; and a rotary member corresponding to the stationary member, disposed on the rotating shaft and having a second sealing surface opposite to the first sealing surface of the stationary member. A groove is disposed on the first sealing surface or the second sealing surface, and extends inwardly from the outer peripheral edge. When the groove extends inwardly, an end (a bottom wall) of the groove extends along a tangential direction of an imaginary circle containing the bottom wall of the groove.

Abstract: A seal device includes a sleeve, a gland, a sealing assembly, an end collar and a protective cushion. The sleeve is adapted to be sleeved on a rotary shaft of a pumping machine and has inner and outer end portions in an axial direction. The gland is disposed around the sleeve, and is formed with a through hole that permits extension of the sleeve, and a receiving groove that communicates fluidly with the through hole and that is adapted for receiving cooling fluid. The sealing assembly is sleeved on the sleeve and is connected to the gland. The end collar is disposed around the sleeve and outside the gland. The protective cushion is disposed around the sleeve and between the gland and the end collar.