Patents by Inventor Cheng-Li Chao

Cheng-Li Chao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11916200
    Abstract: The disclosure herein relates to rechargeable batteries and solid electrolytes therefore which include lithium-stuffed garnet oxides, for example, in a thin film, pellet, or monolith format wherein the density of defects at a surface or surfaces of the solid electrolyte is less than the density of defects in the bulk. In certain disclosed embodiments, the solid-state anolyte, electrolyte, and catholyte thin films, separators, and monoliths consist essentially of an oxide that conducts Li+ ions. In some examples, the disclosure herein presents new and useful solid electrolytes for solid-state or partially solid-state batteries. In some examples, the disclosure presents new lithium-stuffed garnet solid electrolytes and rechargeable batteries which include these electrolytes as separators between a cathode and a lithium metal anode.
    Type: Grant
    Filed: October 19, 2017
    Date of Patent: February 27, 2024
    Inventors: David Cao, Cheng-Chieh Chao, Zhebo Chen, Lei Cheng, Niall Donnelly, Wes Hermann, Tim Holme, Tommy Huang, Kian Kerman, Yang Li, Harsh Maheshwari
  • Publication number: 20240059824
    Abstract: A polyurethane resin and a method for manufacturing the same are provided. The method includes the following steps: mixing a polyester polyol, a polyether polyol, a first chain extender, diisocyanate, and a mixed solvent for polymerization, so as to obtain a prepolymer; and adding a second chain extender into the prepolymer for chain extension, so as to obtain the polyurethane resin. The mixed solvent includes diethylformamide and methyl ethyl ketone, and a mass ratio of the diethylformamide to the methyl ethyl ketone in the mixed solvent ranges from 0.45 to 1.80. Based on a total weight of the polyurethane resin being 100 wt %, a total added amount of the first chain extender and the second chain extender ranges from 0.9 wt % to 2.5 wt %.
    Type: Application
    Filed: November 23, 2022
    Publication date: February 22, 2024
    Inventors: TE-CHAO LIAO, CHENG-LI CHAO, Hui-Chun Chuang
  • Publication number: 20230374200
    Abstract: A plasticizer and a method for manufacturing the plasticizer are provided. The method for manufacturing the plasticizer includes steps as follows: mixing a dicarboxylic acid, a diol, and a catalyst to form a reactant mixture; reacting the reactant mixture at a temperature ranging from 130° C. to 220° C. so as to form a semi-product; adding an endcapping alcohol into the semi-product at a temperature ranging from 205° C. to 220° C. so as to form a coarse plasticizer; purifying the coarse plasticizer under a pressure ranging from 760 Torr to 5 Torr so as to obtain the plasticizer. The dicarboxylic acid includes adipic acid. The diol includes a polyglycol and a saturated fatty alcohol. The endcapping alcohol includes isooctyl alcohol, isodecyl alcohol, or 2-propylheptanol. The dicarboxylic acid, the diol, and the endcapping alcohol have a molar ratio ranging from 1:0.6 to 0.9:0.3 to 0.6.
    Type: Application
    Filed: November 2, 2022
    Publication date: November 23, 2023
    Inventors: TE-CHAO LIAO, CHENG-LI CHAO, CHAO-TUNG WU, JUNG-TSU WU
  • Publication number: 20230139067
    Abstract: A thermoplastic polyester elastomer conjugate fiber including a core and a sheath is provided. A volume ratio of the core to the sheath is in a range of 4:6 to 6:4.
    Type: Application
    Filed: December 28, 2021
    Publication date: May 4, 2023
    Applicant: NAN YA PLASTICS CORPORATION
    Inventors: Te-Chao Liao, Cheng-Li Chao, Chao-Quan Wu
  • Publication number: 20170183551
    Abstract: A polyurethane adhesive is formulated using a modified polyurethane copolymer, a curing agent and an antistatic agent, and the modified polyurethane copolymer is grafted a polysiloxane compound to a polyurethane polymer and made by esterifying a polyol, a hydroxyl-containing polysiloxane compound, a multi-functional isocyanate compound and a fatty acid ester; since the polyurethane adhesive is not yellowish and easy to dry as well as has excellent fabricability, air bleeding performance and transparency, when attached to surfaces of an optical or electronic device, the protective film leaves no residue and protects the surface of the device keeping no flaws.
    Type: Application
    Filed: December 20, 2016
    Publication date: June 29, 2017
    Inventors: Te-Chao LIAO, Cheng-Li CHAO, Chuan CHOU, Yung-Sheng WANG
  • Patent number: 9663617
    Abstract: A modified bismaleimide resin is made by modify bismaleimide with aromatic diamine that contains fluoro substituents through chain-growth polymerization; and modified bismaleimide resin is excellent in physical properties including a low dielectric constant Dk (3 GHz) less than 3.0, a dissipation factors (3 GHz) less than 0.02, a low resin water absorptivity ranging from 0.21% to 0.33% and an excellent processability, and is particularly suited for producing a copper clad laminate that is required to have dielectric constant Dk (3 GHz) less than 3.
    Type: Grant
    Filed: December 3, 2015
    Date of Patent: May 30, 2017
    Assignee: NAN YA PLASTICS CORPORATION
    Inventors: Te-Chao Liao, Dein-Run Fung, Cheng-Li Chao, Hao-Sheng Chen, Yung-Sheng Wang
  • Publication number: 20160168330
    Abstract: A modified bismaleimide resin is made by modify bismaleimide with aromatic diamine that contains fluoro substituents through chain-growth polymerization; and modified bismaleimide resin is excellent in physical properties including a low dielectric constant Dk (3 GHz) less than 3.0, a dissipation factors (3 GHz) less than 0.02, a low resin water absorptivity ranging from 0.21% to 0.33% and an excellent processability, and is particularly suited for producing a copper clad laminate that is required to have dielectric constant Dk (3 GHz) less than 3.
    Type: Application
    Filed: December 3, 2015
    Publication date: June 16, 2016
    Inventors: Te-Chao LIAO, Dein-Run FUNG, Cheng-Li CHAO, Hao-Sheng CHEN, Yung-Sheng WANG
  • Patent number: 6713230
    Abstract: Provided is a novel photosensitive resistive ink composition, comprising: (A) a photo curable prepolymer containing at least two ethylenically unsaturated bonds with an a,&bgr;-unsaturated carboxylic acid, represented by the formula I, (B) a photocurable monomer containing at least three vinyl groups and an a,&bgr;-unsaturated carboxylic acid, (C) a photo-initiator, (D) organic solvents, (E) an epoxy compound containing at least one vinyl group and one epoxy group in the molecule unit, (F) a curing agent capable of allowing a photocurable prepolymer (A) undergo a thermal reaction, and (G) a clay nano-composite capable of increasing the surface area of inorganic materials of the photosensitive resistive ink composition.
    Type: Grant
    Filed: September 10, 2001
    Date of Patent: March 30, 2004
    Assignee: Nan Ya Plastics Corporation
    Inventors: Chi-Ming Chang, Hsiao-Loung Lu, Chun-Che Tsao, Cheng-Li Chao, Chung-Chi Su
  • Publication number: 20020136986
    Abstract: A novel photosensitive resistive ink composition, comprising
    Type: Application
    Filed: September 10, 2001
    Publication date: September 26, 2002
    Inventors: Chi-Ming Chang, Hsiao-Loung Lu, Chun-Che Tsao, Cheng-Li Chao, Chung-Chi Su