Patents by Inventor Cheng-Te Wang

Cheng-Te Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130209288
    Abstract: A wind turbine system that can comprise a wind power machine, a compressor, at least one energy accumulator, a dynamo, a pressurized heating system, and a depressurized cooling system; the wind power machine is driven by a wind power to transform wind energy into mechanical energy and to drive a compressor; the compressor pressurizes and stores gas in the energy accumulator; the energy accumulator stores and output the pressurized gas to drive the dynamo; the dynamo can comprise an air motor and an AC generator motor; wherein the air motor is driven by a gas outputted from the energy accumulator, and wherein the air motor drives the AC generator motor to generate electricity; the pressurized heating system can comprise a liquid/gas energy converter transforming hydraulic pressure into a gas pressure; the depressurized cooling system is connected between the energy accumulator and the dynamo.
    Type: Application
    Filed: June 17, 2011
    Publication date: August 15, 2013
    Inventor: Cheng-Te Wang
  • Publication number: 20130163850
    Abstract: A mask pattern and a correcting method thereof are provided. The correcting method includes the following steps. An original pattern having a first original contour and a second original contour is provided. The first original contour has a first original corner. The second original contour has a second original corner, which is near the first original corner. The first and second original corners are cut to form a cut pattern. An optical proximity correction (OPC) process is applied to the cut pattern to form the mask pattern.
    Type: Application
    Filed: December 27, 2011
    Publication date: June 27, 2013
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Te-Hsien Hsieh, Ming-Jui Chen, Cheng-Te Wang, Jing-Yi Lee
  • Patent number: 8383299
    Abstract: A double patterning mask set includes a first mask having a first set of via patterns, and a second mask having a second set of via patterns. The first set of via patterns includes at least two via patterns arranged along a diagonal direction, each of the at least two via patterns has at least a truncated corner. The first set of via patterns and the second set of via patterns are interlacedly arranged along a horizontal direction and a vertical direction.
    Type: Grant
    Filed: May 17, 2011
    Date of Patent: February 26, 2013
    Assignee: United Microelectronics Corp.
    Inventors: Te-Hsien Hsieh, Ming-Jui Chen, Shih-Ming Kuo, Ping-I Hsieh, Cheng-Te Wang, Jing-Yi Lee
  • Publication number: 20120295186
    Abstract: A double patterning mask set includes a first mask having a first set of via patterns, and a second mask having a second set of via patterns. The first set of via patterns includes at least two via patterns arranged along a diagonal direction, each of the at least two via patterns has at least a truncated corner. The first set of via patterns and the second set of via patterns are interlacedly arranged along a horizontal direction and a vertical direction.
    Type: Application
    Filed: May 17, 2011
    Publication date: November 22, 2012
    Inventors: Te-Hsien Hsieh, Ming-Jui Chen, Shih-Ming Kuo, Ping-I Hsieh, Cheng-Te Wang, Jing-Yi Lee
  • Patent number: 8225237
    Abstract: A method to determine a process window is disclosed. First, a pattern data is provided. Second, a bias set is determined. Then, a resizing procedure is performed on the pattern data in accordance with the bias set to obtain a usable final resized pattern to be a target pattern of changed area. The final resized pattern is consistent with a minimum spacing rule, a contact to poly rule and a contact to metal rule. Accordingly, the target pattern is output.
    Type: Grant
    Filed: November 27, 2008
    Date of Patent: July 17, 2012
    Assignee: United Microelectronics Corp.
    Inventors: Te-Hung Wu, Sheng-Yuan Huang, Cheng-Te Wang, Chia-Wei Huang, Ping-I Hsieh, Po-I Lee, Chuen Huei Yang, Pei-Ru Tsai
  • Publication number: 20100131914
    Abstract: A method to determine a process window is disclosed. First, a pattern data is provided. Second, a bias set is determined. Then, a resizing procedure is performed on the pattern data in accordance with the bias set to obtain a usable final resized pattern to be a target pattern of changed area. The final resized pattern is consistent with a minimum spacing rule, a contact to poly rule and a contact to metal rule. Accordingly, the target pattern is output.
    Type: Application
    Filed: November 27, 2008
    Publication date: May 27, 2010
    Inventors: Te-Hung Wu, Sheng-Yuan Huang, Cheng-Te Wang, Chia-Wei Huang, Ping-I Hsieh, Po-I Lee, Chuen Huei Yang, Pei-Ru Tsai
  • Publication number: 20040012278
    Abstract: A protection device of a drive mechanism of a clock is provided. The drive mechanism includes a driven member, and a driving member for driving the driven member. The protection device is mounted between the driving member and the driven member, and includes a first magnetic member mounted in the driven member, and a second magnetic member mounted in the driving member and attracted with the first magnetic member by a magnetic force, so that the driven member may be rotated by rotation of the driving member. Thus, when a resistance exerted on the driven member is greater than the magnetic force between the first magnetic member and the second magnetic member, the driving member idles, so as to protect the direct current small motor.
    Type: Application
    Filed: July 16, 2002
    Publication date: January 22, 2004
    Inventor: Cheng-Te Wang