Abstract: In one embodiment, an integrated circuit cell includes a first circuit component and a second circuit component. The first circuit component includes fin field-effect transistors (finFETs) formed in a high fin portion of the integrated circuit cell, the high fin portion of the integrated circuit including a plurality of fin structures arranged in rows. The second circuit component that includes finFETs formed in a less fin portion of the integrated circuit cell, the less fin portion of the integrated circuit including a lesser number of fin structures than the high fin portion of the integrated circuit cell.

Abstract: An integrated circuit includes a first-voltage power rail and a second-voltage power rail in a first connection layer, and includes a first-voltage underlayer power rail and a second-voltage underlayer power rail below the first connection layer. Each of the first-voltage and second-voltage power rails extends in a second direction that is perpendicular to a first direction. Each of the first-voltage and second-voltage underlayer power rails extends in the first direction. The integrated circuit includes a first via-connector connecting the first-voltage power rail with the first-voltage underlayer power rail, and a second via-connector connecting the second-voltage power rail with the second-voltage underlayer power rail.

Abstract: A system for manufacturing an integrated circuit includes a processor coupled to a non-transitory computer readable medium configured to store executable instructions. The processor is configured to execute the instructions for generating a layout design of the integrated circuit that has a set of design rules. The generating of the layout design includes generating a set of gate layout patterns corresponding to fabricating a set of gate structures of the integrated circuit, generating a cut feature layout pattern corresponding to a cut region of a first gate of the set of gate structures of the integrated circuit, generating a first conductive feature layout pattern corresponding to fabricating a first conductive structure of the integrated circuit, and generating a first via layout pattern corresponding to a first via. The cut feature layout pattern overlaps a first gate layout pattern of the set of gate layout patterns.

Abstract: The embodiment of the present disclosure relates to a minutes processing method and apparatus, a device, and a storage medium, and the method includes: obtaining a to-be-processed text; performing minutes extraction on the to-be-processed text based on a predetermined minutes categories, and determining a minutes sentence belonging to each predetermined minutes categories; determining another sentence associated with the minutes sentence from the to-be-processed text, and storing an association relationship between each minutes sentence and the corresponding another sentence. Through the technical aspect, it is achieved that the minutes of the to-be-processed text is extracted from multiple dimensions, and compatibility of the minutes to various text forms, minutes information content and query efficiency of the to-be-processed text are improved.

Abstract: Exemplary embodiments for an exemplary dual transmission gate and various exemplary integrated circuit layouts for the exemplary dual transmission gate are disclosed. These exemplary integrated circuit layouts represent double-height, also referred to as double rule, integrated circuit layouts. These double rule integrated circuit layouts include a first group of rows from among multiple rows of an electronic device design real estate and a second group of rows from among the multiple rows of the electronic device design real estate to accommodate a first metal layer of a semiconductor stack. The first group of rows can include a first pair of complementary metal-oxide-semiconductor field-effect (CMOS) transistors, such as a first p-type metal-oxide-semiconductor field-effect (PMOS) transistor and a first n-type metal-oxide-semiconductor field-effect (NMOS) transistor, and the second group of rows can include a second pair of CMOS transistors, such as a second PMOS transistor and a second NMOS transistor.

Abstract: A cover assembly and a brushed motor are provided. The cover assembly includes a mounting portion and a flow guide portion. The mounting portion defines a first opening through the mounting portion along an axial direction of the motor. The flow guide portion includes a top wall disposed at one end thereof away from the mounting portion along the motor axial direction. The fluid guide portion defines a second opening extending to an inner wall surface of the top wall in the motor axial direction. The first opening and the second opening are in flow communication with each other. The flow guide portion further defines a winding flow passage. The flow passage has an inner inlet in flow communication with the second opening and an outer outlet in flow communication with an outside environment. The present invention facilitates absorption of the motor noise and hence reduction of the output noise.

Abstract: A cover assembly and a brushed motor are provided. The cover assembly includes a mounting portion and a flow guide portion. The mounting portion defines a first opening through the mounting portion along an axial direction of the motor. The flow guide portion includes a top wall disposed at one end thereof away from the mounting portion along the motor axial direction. The fluid guide portion defines a second opening extending to an inner wall surface of the top wall in the motor axial direction. The first opening and the second opening are in flow communication with each other. The flow guide portion further defines a winding flow passage. The flow passage has an inner inlet in flow communication with the second opening and an outer outlet in flow communication with an outside environment. The present invention facilitates absorption of the motor noise and hence reduction of the output noise.

Abstract: A centrifugal pump has a pump unit and a drive unit. The pump unit includes a volute and an impeller disposed in the volute. The drive unit has a stator and a rotor having a shaft. The volute includes an inlet, an outlet and a chamber in communication with the inlet and outlet. The inlet is coaxial with the chamber. The shaft of the rotor extends into the chamber of the volute and the impeller is attached to and driven by the shaft. The volute further includes a baffle installed in the inlet. The baffle includes a guide plate angled to the axis of the inlet.

Abstract: A centrifugal pump has a pump unit and a drive unit. The pump unit includes a volute and an impeller disposed in the volute. The drive unit has a stator and a rotor having a shaft. The volute includes an inlet, an outlet and a chamber in communication with the inlet and outlet. The inlet is coaxial with the chamber. The shaft of the rotor extends into the chamber of the volute and the impeller is attached to and driven by the shaft. The volute further includes a baffle installed in the inlet. The baffle includes a guide plate angled to the axis of the inlet.