Abstract: A liquid crystal display device is disclosed, comprising a first substrate, a second substrate and a liquid crystal layer. The first substrate comprises gate lines and a first transparent electrode while the second substrate is provided with a second transparent electrode. Relative to the first substrate, the inner side of the second substrate is separated into a first zone and a second zone. The first zone is locations on the second substrate to which the gate lines correspond, and the second zone is located aside to the locations on the second substrate that correspond to the gate lines. The second transparent electrode is disposed in the second zone. The liquid crystal display device of the present invention is capable of reducing parasitic capacitance of gate lines preferably, enabling the signal delay to subside in the gate lines.

Abstract: The present invention provides a display pane comprising a liquid crystal cell and two polarizers disposed at both sides of the liquid crystal cell, wherein one of the polarizers at one side of the liquid crystal cell includes a compensation film, and a first optical path difference R0 of the compensation film is 0.15 to 0.35 times an optical path difference R of the liquid crystal cell. The liquid crystal display pane of the present invention can have a low cost and a wide viewing angle, so as to solve the problems that the contrast of the conventional display panel is reduced, and the dual compensation films have a higher cost.

Abstract: The present invention discloses a pixel electrode and an LCD panel. The pixel electrode is provided with at least one gap which is inclined with respect to the edges of the pixel electrode, wherein both ends of each gap extend to the edges of the pixel electrode; both sides of each gap is provided with a plurality of equal slits with a constant depth; both sides of the two end zones of each gap have a plurality of edge slits of which the bottom sections are extended to the edges of the pixel electrode; the end zones of each gap are also provided with a plurality of gradual slits which are gradually decreased in depth from the outer to the inner of the pixel electrode; and the depth of each gradual slit is greater than or equal to that of each equal slit.

Abstract: Disclosed is a manufacture method of a double layer gate electrode by patterning the photoresist layer with a half tone mask to make thicknesses of two sides of the photoresist layer are smaller than a thickness of middle of the photoresist layer and twice wet etchings thereafter to realize the manufacture of the double layer gate electrode. The present invention also relates to a manufacture method of a thin film transistor. The manufacture methods of a double layer gate electrode and a relevant thin film transistor according to the present invention employs half tone mask and twice wet etchings thereafter for manufacturing the gate electrode to solve technical problems of high manufacture cost and great manufacture difficulty of double layer gate electrodes according to prior arts.