Patents by Inventor Chenggang Hu

Chenggang Hu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9958784
    Abstract: Provided are apparatuses and methods for super resolution imaging photolithography. An exemplary apparatus may include an illumination light generation device configured to generate illumination light for imaging a pattern included in a mask through the mask. The illumination light may include a high-frequency spatial spectrum such that a high-frequency evanescent wave component of spatial spectrum information for the light is converted to a low-frequency evanescent wave component after being transmitted through the mask pattern. For example, the illumination light generation device may be configured to form the illumination in accordance with a high numerical aperture (NA) illumination mode and/or a surface plasmon (SP) wave illumination mode.
    Type: Grant
    Filed: September 23, 2014
    Date of Patent: May 1, 2018
    Assignee: THE INSTITUTE OF OPTICS AND ELECTRONICS, CHINESE ACADEMY OF SCIENCES
    Inventors: Xiangang Luo, Changtao Wang, Zeyu Zhao, Yanqin Wang, Mingbo Pu, Na Yao, Ping Gao, Chenggang Hu, Xiong Li, Cheng Huang, Leilei Yang, Liqin Liu, Jiong Wang, Jiayu He, Yunfei Luo, Kaipeng Liu, Chengwei Zhao, Ling Liu, Xiaoliang Ma, Min Wang
  • Publication number: 20160259253
    Abstract: Provided are apparatuses and methods for super resolution imaging photolithography. An exemplary apparatus may include an illumination light generation device configured to generate illumination light for imaging a pattern included in a mask through the mask. The illumination light may include a high-frequency spatial spectrum such that a high-frequency evanescent wave component of spatial spectrum information for the light is converted to a low-frequency evanescent wave component after being transmitted through the mask pattern. For example, the illumination light generation device may be configured to form the illumination in accordance with a high numerical aperture (NA) illumination mode and/or a surface plasmon (SP) wave illumination mode.
    Type: Application
    Filed: September 23, 2014
    Publication date: September 8, 2016
    Inventors: Xiangang LUO, Changtao WANG, Zeyu ZHAO, Yanqin WANG, Mingbo PU, Na YAO, Ping GAO, Chenggang HU, Xiong LI, Cheng HUANG, Leilei YANG, Liqin LIU, Jiong WANG, Jiayu HE, Yunfei LUO, Kaipeng LIU, Chengwei ZHAO, Ling LIU, Xiaoliang MA, Min WANG
  • Publication number: 20120092152
    Abstract: The present invention provides a method and a device for obtaining an alarm solution, wherein the source alarm of the alarm currently examined is found according to the preset correlations among alarms (100), and the alarm solution corresponding to the found source alarm is used as the solution for the alarm currently examined (101), thus accurate locating for the alarm is assured, so that the maintainers are enabled to eliminate the alarm quickly by using a correct solution. In the method of the invention, the alarm locating is completed automatically, which not only improves the efficiency of problem processing, but also increases the accuracy of problem processing. For the network manager, the problem that the maintainers are required to know professional detail knowledge about software and hardware is avoided, and the problem of alarm processing is solved quickly and accurately.
    Type: Application
    Filed: May 12, 2010
    Publication date: April 19, 2012
    Applicant: ZTE CORPORATION
    Inventor: Chenggang Hu