Patents by Inventor CHI MEI CORPORATION

CHI MEI CORPORATION has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130267651
    Abstract: A polysiloxane-grafted polyimide resin composition includes a polysiloxane-grafted polyimide resin, and a solvent. The polysiloxane-grafted polyimide resin is represented by Formula (I): wherein W represents a tetravalent organic group, R represents a trivalent organic group, and X1 and X2 independently represent a polysiloxane-containing group.
    Type: Application
    Filed: December 21, 2012
    Publication date: October 10, 2013
    Applicant: CHI MEI CORPORATION
    Inventor: CHI MEI CORPORATION
  • Publication number: 20130208215
    Abstract: A color liquid crystal display device includes a liquid crystal display element and a backlight unit. The liquid crystal display element includes a color filter having a blue filter segment, a green filter segment, and a red filter segment. The green filter segment is prepared from a green photosensitive resin composition which includes a halogenated-phthalocyanine-based green pigment component, a yellow pigment component, an alkali-soluble resin, a compound having at least one ethylenically unsaturated group, and a photoinitiator. A weight ratio of the halogenated-phthalocyanine-based green pigment component to the yellow pigment ranges from 60/40 to 95/5. The backlight unit has a color temperature ranging from 8,000 K to 20,000 K.
    Type: Application
    Filed: January 25, 2013
    Publication date: August 15, 2013
    Applicant: CHI MEI CORPORATION
    Inventor: CHI MEI CORPORATION
  • Publication number: 20130172492
    Abstract: A modified conjugated diene copolymer and a preparing method for the same are provided. The method comprising a polymerization step for polymerizing conjugated diene monomers to form a conjugated diene polymer; and a modifying step for reacting the conjugated diene polymer with a modifier to form a modified conjugated diene polymer. The modifier includes a polythiol ester compound, a polythiol alkane compound or a combination thereof, the polythiol ester compound has a chemical formula (I): (Ra)(OC(?O)Rb-SH)x??(I). The polythiol alkane compound has a chemical formula (II): HS—(CH2)m—(Rd)nCH2SH??(II).
    Type: Application
    Filed: December 5, 2012
    Publication date: July 4, 2013
    Applicant: Chi Mei Corporation
    Inventor: Chi Mei Corporation
  • Publication number: 20130161864
    Abstract: A substrate structure includes a support, a release layer releasably disposed on the support, and a flexible substrate disposed on the release layer. The release layer is made from a polymer composition including a polymer component obtained by subjecting a diamine component (A) and a tetracarboxylic dianhydride component (B) to a polymerization reaction.
    Type: Application
    Filed: December 26, 2012
    Publication date: June 27, 2013
    Applicant: CHI MEI CORPORATION
    Inventor: Chi Mei Corporation
  • Publication number: 20130164461
    Abstract: The invention relates to a positive photosensitive resin composition with good temporal stability. The invention also provides a method for manufacturing a thin-film transistor array substrate, a thin-film transistor array substrate and a liquid crystal display device.
    Type: Application
    Filed: December 11, 2012
    Publication date: June 27, 2013
    Applicant: CHI MEI CORPORATION
    Inventor: CHI MEI CORPORATION
  • Publication number: 20130155722
    Abstract: An edge light backlight device includes a light guide plate having a base portion and microstructures, LEDs, and a reflective plate. The base portion has a light emitting side, a rear side, and a light incident side. The microstructures are formed on one of the light emitting side and the rear side and each of which extends from the light incident side in a longitudinal direction. Each of the microstructures includes a curved surface with a radius of curvature (R). The light guide plate has a thickness (T). R/T ratio ranges from 0.04 to 0.15 and each of the microstructures has a height ranging from 20 ?m to 300 ?m so that the light guide plate has a performance of local lighting ranging from 1% to 40%.
    Type: Application
    Filed: December 14, 2012
    Publication date: June 20, 2013
    Applicant: CHI MEI CORPORATION
    Inventor: CHI MEI CORPORATION
  • Publication number: 20130158205
    Abstract: A modified conjugated diene polymer and a manufacturing method for the same are provided. The modified conjugated diene polymer is manufactured by the method including, forming a conjugated diene polymer by a polymerization step and making it react with a first modifier and then react with a second modifier. The modified conjugated diene polymer has over 97% of cis-1,4 structure. A PDI of the modified conjugated diene polymer is bigger than 1.8 and smaller than 2.5. The first modifier has a chemical formula of X—R1-Si(R2)3. The second modifier has a chemical formula of R3-Si(R4)3.
    Type: Application
    Filed: November 6, 2012
    Publication date: June 20, 2013
    Applicant: Chi Mei Corporation
    Inventor: Chi Mei Corporation
  • Publication number: 20130142966
    Abstract: The invention relates to a blue photosensitive resin composition, and the smoothness of the edge profile formed thereby after development is good. Furthermore, the contrast of a liquid crystal display device manufactured with the blue photosensitive resin composition is excellent. The invention also provides a method for manufacturing a color filter, a color filter and a liquid crystal display device are also provided in the invention.
    Type: Application
    Filed: November 20, 2012
    Publication date: June 6, 2013
    Applicant: CHI MEI CORPORATION
    Inventor: CHI MEI CORPORATION
  • Publication number: 20130144005
    Abstract: This invention relates to a photo-curing polysiloxane composition including a polysiloxane, a quinonediazidesulfonic acid ester, a methylene alkoxyaryl-containing compound as a curing agent, and a solvent for dispersing the polysiloxane, the quinonediazidesulfonic acid ester, and the methylene alkoxyaryl-containing compound. This invention also provides a protecting film made from the photo-curing polysiloxane composition, and an element containing the protecting film.
    Type: Application
    Filed: November 7, 2012
    Publication date: June 6, 2013
    Applicant: CHI MEI CORPORATION
    Inventor: Chi Mei Corporation
  • Publication number: 20130135763
    Abstract: A photosensitive resin composition includes (A) an alkali-soluble resin, (B) a polysiloxane, (C) an ethylenically unsaturated compound, (D) a photo-initiator, (E) a black pigment, and (F) a solvent. The alkali-soluble resin includes an unsaturated-group-containing resin obtained by subjecting a mixture containing (i) an epoxy compound having at least two epoxy groups and (ii) a compound having at least one carboxyl group and at least one ethylenically unsaturated group to polymerization. A weight ratio of the unsaturated-group-containing resin to the polysiloxane ranges from 0.1 to 3.0. Application of the photosensitive resin composition is also disclosed.
    Type: Application
    Filed: November 2, 2012
    Publication date: May 30, 2013
    Applicant: CHI MEI CORPORATION
    Inventor: CHI MEI CORPORATION
  • Publication number: 20130109803
    Abstract: A polysiloxane-grafted polyimide resin composition includes a polysiloxane-grafted polyimide resin, and a solvent. The polysiloxane-grafted polyimide resin is represented by formula (I): wherein W represents a tetravalent organic group, R represents a trivalent organic group, and X represents a polysiloxane-containing group.
    Type: Application
    Filed: October 30, 2012
    Publication date: May 2, 2013
    Applicant: CHI MEI CORPORATION
    Inventor: CHI MEI CORPORATION