Patents by Inventor CHI-REN CHEN

CHI-REN CHEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240178303
    Abstract: The present disclosure provides one embodiment of a semiconductor structure. The semiconductor structure includes a semiconductor substrate having a first region and a second region; a first semiconductor mesa formed on the semiconductor substrate within the first region; a second semiconductor mesa formed on the semiconductor substrate within the second region; and a field effect transistor (FET) formed on the semiconductor substrate. The FET includes a first doped feature of a first conductivity type formed in a top portion of the first semiconductor mesa; a second doped feature of a second conductivity type formed in a bottom portion of the first semiconductor mesa, the second semiconductor mesa, and a portion of the semiconductor substrate between the first and second semiconductor mesas; a channel in a middle portion of the first semiconductor mesa and interposed between the source and drain; and a gate formed on sidewall of the first semiconductor mesa.
    Type: Application
    Filed: February 5, 2024
    Publication date: May 30, 2024
    Inventors: Harry-Hak-Lay Chuang, Yi-Ren Chen, Chi-Wen Liu, Chao-Hsiung Wang, Ming Zhu
  • Patent number: 11984261
    Abstract: Various embodiments of the present disclosure are directed towards an integrated chip including a dielectric structure sandwiched between a first electrode and a bottom electrode. A passivation layer overlies the second electrode and the dielectric structure. The passivation layer comprises a horizontal surface vertically below a top surface of the passivation layer. The horizontal surface is disposed above a top surface of the dielectric structure.
    Type: Grant
    Filed: August 25, 2021
    Date of Patent: May 14, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Anderson Lin, Chun-Ren Cheng, Chi-Yuan Shih, Shih-Fen Huang, Yi-Chuan Teng, Yi Heng Tsai, You-Ru Lin, Yen-Wen Chen, Fu-Chun Huang, Fan Hu, Ching-Hui Lin, Yan-Jie Liao
  • Publication number: 20220392861
    Abstract: An electronic package is provided and includes a carrier for carrying electronic components. Electrical contact pads of the carrier for planting solder balls are connected with a plurality of columnar conductors, and the conductors are electrically connected to a circuit portion in the carrier. By connecting a plurality of conductors with a single electrical contact pad, structural stress can be distributed and breakage of the circuit portion can be prevented.
    Type: Application
    Filed: July 7, 2021
    Publication date: December 8, 2022
    Applicant: SILICONWARE PRECISION INDUST RIES CO., LT D.
    Inventors: Chi-Ren Chen, Po-Yung Chang, Pei-Geng Weng, Yuan-Hung Hsu, Chang-Fu Lin, Don-Son Jiang
  • Patent number: 10825684
    Abstract: Provided is a material composition and method for that includes providing a substrate and forming a resist layer over the substrate. In various embodiments, the resist layer includes a multi-metal complex including an extreme ultraviolet (EUV) absorption element and a bridging element. By way of example, the EUV absorption element includes a first metal type and the bridging element includes a second metal type. In some embodiments, an exposure process is performed to the resist layer. After performing the exposure process, the exposed resist layer is developed to form a patterned resist layer.
    Type: Grant
    Filed: January 6, 2017
    Date of Patent: November 3, 2020
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Shu-Hao Chang, Chien-Chih Chen, Kuo-Chang Kau, Jeng-Horng Chen, Pi-Yeh Chia, Chi-Ren Chen, Ying-Chih Lin
  • Publication number: 20190367463
    Abstract: A novel benzotriazole UV absorber with red shift and use thereof are disclosed. The novel benzotriazole UV absorber has the following formula (I): wherein, R1, R2, R3 and X1 are defined in the specification.
    Type: Application
    Filed: May 21, 2019
    Publication date: December 5, 2019
    Inventors: Chi-Ren CHEN, Jing-Wen LIN, Meng-Huang YEN, Yao-Hsing HUANG, Ko-Lun CHEN, Chih-Wei CHEN
  • Publication number: 20170271150
    Abstract: Provided is a material composition and method for that includes providing a substrate and forming a resist layer over the substrate. In various embodiments, the resist layer includes a multi-metal complex including an extreme ultraviolet (EUV) absorption element and a bridging element. By way of example, the EUV absorption element includes a first metal type and the bridging element includes a second metal type. In some embodiments, an exposure process is performed to the resist layer. After performing the exposure process, the exposed resist layer is developed to form a patterned resist layer.
    Type: Application
    Filed: January 6, 2017
    Publication date: September 21, 2017
    Inventors: Shu-Hao CHANG, Chien-Chih CHEN, Kuo-Chang KAU, Jeng-Horng CHEN, Pi-Yeh CHIA, Chi-Ren CHEN, Ying-Chih LIN
  • Patent number: 8779788
    Abstract: A testing apparatus includes a thermal control chamber including a test room, which temperature is controlled within a testing temperature range; a carrier frame including a direction guiding unit installed securely within the test room and formed with one guiding groove and a carrier rod extending through the guiding groove in the direction guiding unit; and a clamping unit mounted on the carrier rod for clamping a display-panel module securely, wherein, movement of the carrier rod transversely within the guiding groove relative to the direction guiding unit results in disposing the display-panel module to extend along one of several testing directions for undergoing a burn-in test.
    Type: Grant
    Filed: December 30, 2011
    Date of Patent: July 15, 2014
    Assignee: Chroma Ate Inc.
    Inventors: Chi-Ren Chen, Chiang-Cheng Fan, Li-Hsun Chen
  • Publication number: 20120326740
    Abstract: A testing apparatus includes a thermal control chamber including a test room, which temperature is controlled within a testing temperature range; a carrier frame including a direction guiding unit installed securely within the test room and formed with one guiding groove and a carrier rod extending through the guiding groove in the direction guiding unit; and a clamping unit mounted on the carrier rod for clamping a display-panel module securely, wherein, movement of the carrier rod transversely within the guiding groove relative to the direction guiding unit results in disposing the display-panel module to extend along one of several testing directions for undergoing a burn-in test.
    Type: Application
    Filed: December 30, 2011
    Publication date: December 27, 2012
    Applicant: CHROMA ATE INC.
    Inventors: CHI-REN CHEN, CHIANG-CHENG FAN, LI-HSUN CHEN