Patents by Inventor Chia-Haur Rau

Chia-Haur Rau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Crystal device and resonance element
    Patent number: 11784631
    Abstract: A resonance element supported by a bearing structure includes a crystal chip and an excitation electrode. The crystal chip includes a main surface having a support surface portion being in contact with the bearing structure. The excitation electrode is disposed on the main surface, has an electrode area, and includes an electrode indentation boundary partly encompassing the support surface portion. The electrode indentation boundary has a first boundary end and a second boundary end being opposite to the first boundary end. The electrode indentation boundary and a reference line segment defined by the first and the second boundary ends form an electrode indentation region having an indentation area. A ratio of the indentation area to the electrode area ranges from 0.05 to 0.2.
    Type: Grant
    Filed: March 10, 2022
    Date of Patent: October 10, 2023
    Assignee: TAI-SAW TECHNOLOGY CO., LTD.
    Inventors: Chia-Haur Rau, Kun-Yu Huang, Chi-Yun Chen
  • CRYSTAL DEVICE AND RESONANCE ELEMENT
    Publication number: 20220294419
    Abstract: A resonance element supported by a bearing structure includes a crystal chip and an excitation electrode. The crystal chip includes a main surface having a support surface portion being in contact with the bearing structure. The excitation electrode is disposed on the main surface, has an electrode area, and includes an electrode indentation boundary partly encompassing the support surface portion. The electrode indentation boundary has a first boundary end and a second boundary end being opposite to the first boundary end. The electrode indentation boundary and a reference line segment defined by the first and the second boundary ends form an electrode indentation region having an indentation area. A ratio of the indentation area to the electrode area ranges from 0.05 to 0.2.
    Type: Application
    Filed: March 10, 2022
    Publication date: September 15, 2022
    Applicant: TAI-SAW Technology Co., Ltd.
    Inventors: Chia-Haur Rau, Kun-Yu Huang, Chi-Yun Chen