Patents by Inventor Chia-Ming JAN
Chia-Ming JAN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11904399Abstract: An online prediction method of tool-electrode consumption adapted for an electrical discharge machining (EDM) apparatus includes an experimental design; extracting electrode consumption variables from machining parameters of the electrical discharge machining (EDM) apparatus; and obtaining a correlation between the machining parameters and the electrode consumption variables through a correlation analysis to obtain a prediction model capable of predicting an effective contact area of a tool-electrode and a workpiece. In addition, a prediction method of machining accuracy is provided.Type: GrantFiled: November 30, 2020Date of Patent: February 20, 2024Assignee: Metal Industries Research & Development CentreInventors: Chia-Ming Jan, Wen-Chieh Wu
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Publication number: 20220168834Abstract: An online prediction method of tool-electrode consumption adapted for an electrical discharge machining (EDM) apparatus includes an experimental design; extracting electrode consumption variables from machining parameters of the electrical discharge machining (EDM) apparatus; and obtaining a correlation between the machining parameters and the electrode consumption variables through a correlation analysis to obtain a prediction model capable of predicting an effective contact area of a tool-electrode and a workpiece. In addition, a prediction method of machining accuracy is provided.Type: ApplicationFiled: November 30, 2020Publication date: June 2, 2022Applicant: Metal Industries Research & Development CentreInventors: Chia-Ming Jan, Wen-Chieh Wu
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Patent number: 10413984Abstract: A method for predicting precision of an electrical discharge machine is provided. In the method, plural sets of process data are obtained while the electrical discharge machine processes workpiece samples. Process features are established based on the process data. Each of the workpiece samples with respect to each of at least one measurement item is measured by using a metrology tool, thereby obtaining measurement values of the workpiece samples with respect to each measurement item. A correlation analysis operation is performed to obtain correlation coefficients. At least one key feature is selected from the process features as representative according to the correlation coefficients. The measurement values of the workpiece samples with respect to each measurement item, and the sets of process data corresponding to the key features are used to build a predictive model for predicting the precision of the electrical discharge machine.Type: GrantFiled: December 7, 2017Date of Patent: September 17, 2019Assignee: METAL INDUSTRIES RESEARCH & DEVELOPMENT CENTREInventors: Haw-Ching Yang, Min-Nan Wu, Cheng-Yen Chen, Wen-Chieh Wu, Chia-Ming Jan
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Patent number: 10317370Abstract: A method for acquiring a dynamic vibration frequency includes the following steps. At least five pairs of vibration measurement elements are selected. A bandwidth range of the vibration measurement elements is determined. The vibration measurement elements in sequence on a first side and a second side, which are geometrically symmetrical to each other, of a main shaft are used to measure vibration displacements in a symmetrical position arranging manner. The vibration displacements measured by the vibration measurement elements of either of the first side and second side are corrected, so as to differentially eliminate an ambient noise. Positions of nodes located on the first side and the second side are calculated. The vibration displacements in the preceding steps are used to deduce dynamic vibration frequencies of main harmonics. A vibration mode of the main shaft is confirmed.Type: GrantFiled: September 29, 2016Date of Patent: June 11, 2019Assignee: METAL INDUSTRIES RESEARCH & DEVELOPMENT CENTREInventors: Chia-Ming Jan, Wen-Chieh Wu
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Patent number: 10091493Abstract: Device and method for scanning an object outline image are provided. The scanning device includes a light source, an optical sensor and a processor. The scanning method includes: providing a polarized projection light beam; projecting the polarized projection light beam to an object, and correspondingly reflecting a polarized reflection light beam by the object according to the polarized projection light beam; capturing an image of the polarized reflection light beam; calculating polarization state of target according to the polarized projection light beam and the polarized reflection light beam, the polarization state of target having a plane angle from normal projection and a corresponding point position; and restoring an outline image of the object according to the polarization state of target.Type: GrantFiled: December 28, 2015Date of Patent: October 2, 2018Assignee: Metal Industries Research & Development CentreInventors: Chia-Ming Jan, Chung-Li Tsai, Po-Chi Hu, Chao-Yung Yeh, Chi-Cheng Yang
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Patent number: 10029280Abstract: A sieve for microparticles includes a seat having a chamber and a plurality of boards mounted in the chamber. Each of the plurality of boards includes a first face and a second face opposite to the first face. The first face includes at least one notch. The second face includes at least one groove. The first face of each of the plurality of boards abuts the second face of an adjacent board. The at least one notch and the at least one groove respectively of two adjacent boards are partially aligned and intercommunicated with each other.Type: GrantFiled: December 14, 2016Date of Patent: July 24, 2018Assignee: Metal Industries Research & Development CentreInventors: Cheng-Han Hung, Zong-Hsin Liu, Ying-Chieh Lin, Ming-Fang Tsai, Chia-Ming Jan, Yun-Lung Huang, Hai-Ching Tsou, Ying-Cheng Lu
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Publication number: 20180161819Abstract: A sieve for microparticles includes a seat having a chamber and a plurality of boards mounted in the chamber. Each of the plurality of boards includes a first face and a second face opposite to the first face. The first face includes at least one notch. The second face includes at least one groove. The first face of each of the plurality of boards abuts the second face of an adjacent board. The at least one notch and the at least one groove respectively of two adjacent boards are partially aligned and intercommunicated with each other.Type: ApplicationFiled: December 14, 2016Publication date: June 14, 2018Inventors: Cheng-Han Hung, Zong-Hsin Liu, Ying-Chieh Lin, Ming-Fang Tsai, Chia-Ming Jan, Yun-Lung Huang, Hai-Ching Tsou, Ying-Cheng Lu
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Publication number: 20180161900Abstract: A method for predicting precision of an electrical discharge machine is provided. In the method, plural sets of process data are obtained while the electrical discharge machine processes workpiece samples. Process features are established based on the process data. Each of the workpiece samples with respect to each of at least one measurement item is measured by using a metrology tool, thereby obtaining measurement values of the workpiece samples with respect to each measurement item. A correlation analysis operation is performed to obtain correlation coefficients. At least one key feature is selected from the process features as representative according to the correlation coefficients. The measurement values of the workpiece samples with respect to each measurement item, and the sets of process data corresponding to the key features are used to build a predictive model for predicting the precision of the electrical discharge machine.Type: ApplicationFiled: December 7, 2017Publication date: June 14, 2018Inventors: Haw-Ching YANG, Min-Nan WU, Cheng-Yen CHEN, Wen-Chieh WU, Chia-Ming JAN
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Patent number: 9807367Abstract: A light field image capturing apparatus includes: a main lens, configured to transmit light of an object environment, and including an optical axis; a beam generation unit, configured to receive the light transmitted by the main lens and generate plurality Bessel-beams, where the beam generation unit includes plurality slits or conical lenses arranged in an array manner and configured to generate the Bessel-beam respectively; a micro-lens unit, configured to receive the Bessel-beam generated by the beam generation unit, and including plurality micro-lens elements corresponding to the beam generation unit, wherein each micro-lens element is configured to determine a focus point generated after the Bessel-beam passes through each micro-lens element, and a focal length of a distance between the focus point and the micro-lens element; and a light sensing unit, including a focal plane, and configured to enable the focus point to be focused on the focal plane.Type: GrantFiled: December 28, 2015Date of Patent: October 31, 2017Assignee: METAL INDUSTRIES RESEARCH & DEVELOPMENT CENTREInventors: Chia-Ming Jan, Ying-Chieh Lin
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Publication number: 20170168023Abstract: A method for acquiring a dynamic vibration frequency includes the following steps. At least five pairs of vibration measurement elements are selected. A bandwidth range of the vibration measurement elements is determined. The vibration measurement elements in sequence on a first side and a second side, which are geometrically symmetrical to each other, of a main shaft are used to measure vibration displacements in a symmetrical position arranging manner. The vibration displacements measured by the vibration measurement elements of either of the first side and second side are corrected, so as to differentially eliminate an ambient noise. Positions of nodes located on the first side and the second side are calculated. The vibration displacements in the preceding steps are used to deduce dynamic vibration frequencies of main harmonics. A vibration mode of the main shaft is confirmed.Type: ApplicationFiled: September 29, 2016Publication date: June 15, 2017Inventors: Chia-Ming JAN, Wen-Chieh WU
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Publication number: 20170165787Abstract: A microstructure forming apparatus is adapted for processing a workpiece and includes: a light source for emitting light toward the workpiece; a first axicon disposed between the light source and the workpiece; and a second axicon disposed between the first axicon and the workpiece. Light emitted from the light source forms a high-order Bessel beam after passing through the first axicon and the second axicon in sequence for processing and forming a microstructure in the workpiece.Type: ApplicationFiled: December 29, 2015Publication date: June 15, 2017Inventors: Chia-Ming JAN, Cheng-Han HUNG, Ying-Chieh LIN
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Publication number: 20170163968Abstract: Device and method for scanning an object outline image are provided. The scanning device includes a light source, an optical sensor and a processor. The scanning method includes: providing a polarized projection light beam; projecting the polarized projection light beam to an object, and correspondingly reflecting a polarized reflection light beam by the object according to the polarized projection light beam; capturing an image of the polarized reflection light beam; calculating polarization state of target according to the polarized projection light beam and the polarized reflection light beam, the polarization state of target having a plane angle from normal projection and a corresponding point position; and restoring an outline image of the object according to the polarization state of target.Type: ApplicationFiled: December 28, 2015Publication date: June 8, 2017Inventors: Chia-Ming JAN, Chung-Li TSAI, Po-Chi HU, Chao-Yung YEH, Chi-Cheng YANG
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Publication number: 20170150120Abstract: A light field image capturing apparatus includes: a main lens, configured to transmit light of an object environment, and including an optical axis; a beam generation unit, configured to receive the light transmitted by the main lens and generate plurality Bessel-beams, where the beam generation unit includes plurality slits or conical lenses arranged in an array manner and configured to generate the Bessel-beam respectively; a micro-lens unit, configured to receive the Bessel-beam generated by the beam generation unit, and including plurality micro-lens elements corresponding to the beam generation unit, wherein each micro-lens element is configured to determine a focus point generated after the Bessel-beam passes through each micro-lens element, and a focal length of a distance between the focus point and the micro-lens element; and a light sensing unit, including a focal plane, and configured to enable the focus point to be focused on the focal plane.Type: ApplicationFiled: December 28, 2015Publication date: May 25, 2017Inventors: Chia-Ming JAN, Ying-Chieh LIN