Patents by Inventor Chian-Chen KUO

Chian-Chen KUO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Automatic adjustment method and automatic adjustment device of beam of semiconductor apparatus, and training method of parameter adjustment model
    Patent number: 11955309
    Abstract: An automatic adjustment method and an automatic adjustment device of a beam of a semiconductor apparatus, and a training method of a parameter adjustment model are provided. The automatic adjustment method of the beam of the semiconductor apparatus includes the following steps. The semiconductor apparatus generates the beam. A wave curve of the beam is obtained. The wave curve is segmented into several sections. The slope of each of the sections is obtained. Several environmental factors of the semiconductor apparatus are obtained. According to the slopes and the environmental factors, at least one parameter adjustment command of the semiconductor apparatus is analyzed through the parameter adjustment model.
    Type: Grant
    Filed: July 7, 2021
    Date of Patent: April 9, 2024
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Zheng-Yang Li, Chian-Chen Kuo, Yi-Cheng Lu, Ji-Fu Kung
  • AUTOMATIC ADJUSTMENT METHOD AND AUTOMATIC ADJUSTMENT DEVICE OF BEAM OF SEMICONDUCTOR APPARATUS, AND TRAINING METHOD OF PARAMETER ADJUSTMENT MODEL
    Publication number: 20220384139
    Abstract: An automatic adjustment method and an automatic adjustment device of a beam of a semiconductor apparatus, and a training method of a parameter adjustment model are provided. The automatic adjustment method of the beam of the semiconductor apparatus includes the following steps. The semiconductor apparatus generates the beam. A wave curve of the beam is obtained. The wave curve is segmented into several sections. The slope of each of the sections is obtained. Several environmental factors of the semiconductor apparatus are obtained. According to the slopes and the environmental factors, at least one parameter adjustment command of the semiconductor apparatus is analyzed through the parameter adjustment model.
    Type: Application
    Filed: July 7, 2021
    Publication date: December 1, 2022
    Inventors: Zheng-Yang LI, Chian-Chen KUO, Yi-Cheng LU, Ji-Fu KUNG