Abstract: This invention discloses a structure of wet-coating transparent conductive film and the application thereof. The wet-coating transparent conductive film comprises a substrate layer, and a transparent conductive layer. The wet-coating transparent conductive film can further comprise an index matching layer between the substrate layer and the transparent conductive layer. The index matching layer and the transparent conductive layer can be formed by wet-coating process. Preferably, the mentioned wet-coating transparent conductive film can be widely applied in touch control module or touch control displaying device.

Abstract: A method of strengthening glass plate is provided. A plasma treating process is performed on a glass plate so that a surface pore variation of the glass plate after the plasma treating process is reduced relative to the surface pore variation of the glass plate before the plasma treating process, wherein the surface pore variation is a variation degree of surface pores in different unit areas of the glass plate. In the mean time, a melted network crosslinking structure is formed on the surface of the glass plate. Based on the above-mentioned mechanisms, the glass plate is strengthened. The plasma treating process is conducive to strengthen the glass plate whether the plasma treating process is performed before or after the conventional chemical strengthening process.

Abstract: A method of strengthening glass plate is provided. A plasma treating process is performed on a glass plate so that a surface pore variation of the glass plate after the plasma treating process is reduced relative to the surface pore variation of the glass plate before the plasma treating process, wherein the surface pore variation is a variation degree of surface pores in different unit areas of the glass plate. In the mean time, a melted network crosslinking structure is formed on the surface of the glass plate. Based on the above-mentioned mechanisms, the glass plate is strengthened. The plasma treating process is conducive to strengthen the glass plate whether the plasma treating process is performed before or after the conventional chemical strengthening process.

Abstract: A method of fabricating transparent conductive film including the following steps is provided. First, a reactive chamber having at least a target and at least a heating device is provided. Subsequentially, a plasma is generated in the reactive chamber, wherein the plasma is located above the target. Next, the plasma is heated by the heating device from a standby temperature to a working temperature. Simultaneously, a hard plastic substrate is passed above the plasma at a specific speed, wherein the particles of the target are bombarded by the plasma so as to form transparent conductive film on the hard plastic substrate.

Abstract: An optical film includes: a transparent substrate having a roughened surface with an average surface roughness Ra ranging from 40 nm to 120 nm; and an optical functional layer attached to the roughened surface of the transparent substrate. A method for making an optical film includes: (a) providing a transparent substrate having a surface; (b) roughening the surface of the transparent substrate such that the roughened surface has an average surface roughness Ra ranging from 40 nm to 120 nm; and (c) forming an optical functional layer on the roughened surface of the transparent substrate.

Abstract: An optical film device includes a laminate. The laminate includes a plurality of functional layers. The functional layers include a transparent anti-glare film which incorporates a plurality of water-soluble scattering particles distributed therein. The anti-glare film further includes a plurality of indentations distributed on a surface of the anti-glare film.