Patents by Inventor Chieh-Ju Wang
Chieh-Ju Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11152219Abstract: A method of selectively removing aluminium oxide or nitride material from a microelectronic substrate, the method comprising contacting the material with an aqueous etching composition comprising: an etchant comprising a source of fluoride; and a metal corrosion inhibitor; wherein the composition has a pH in the range of from 3 to 8. Aqueous etching compositions and uses are also described.Type: GrantFiled: June 17, 2019Date of Patent: October 19, 2021Assignee: Entegris, Inc.Inventors: Chieh Ju Wang, Hsing-Chen Wu, Chia-Jung Hsu
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Patent number: 10790187Abstract: The disclosure relates to a cleaning composition that aids in the removal of post-etch residues and aluminum-containing material, e.g., aluminum oxide, in the production of semiconductors that utilize an aluminum-containing etch stop layer. The compositions have a high selectivity for post-etch residue and aluminum-containing materials relative to low-k dielectric materials, cobalt-containing materials and other metals on the microelectronic device.Type: GrantFiled: January 17, 2018Date of Patent: September 29, 2020Assignee: ENTEGRIS, INC.Inventors: Emanuel I. Cooper, Makonnen Payne, WonLae Kim, Eric Hong, Sheng-Hung Tu, Chieh Ju Wang, Chia-Jung Hsu
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Publication number: 20200013633Abstract: A method of selectively removing aluminium oxide or nitride material from a microelectronic substrate, the method comprising contacting the material with an aqueous etching composition comprising: an etchant comprising a source of fluoride; and a metal corrosion inhibitor; wherein the composition has a pH in the range of from 3 to 8. Aqueous etching compositions and uses are also described.Type: ApplicationFiled: June 17, 2019Publication date: January 9, 2020Inventors: Chieh Ju WANG, Hsing-Chen WU, Chia-Jung HSU
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Patent number: 10472567Abstract: Semi-aqueous compositions useful for the selective removal of titanium nitride and/or photoresist etch residue materials relative to metal conducting, e.g., tungsten and copper, and insulating materials from a microelectronic device having same thereon. The semi-aqueous compositions contain at least one oxidant, at least one etchant, and at least one organic solvent, may contain various corrosion inhibitors to ensure selectivity.Type: GrantFiled: March 4, 2014Date of Patent: November 12, 2019Assignee: ENTEGRIS, INC.Inventors: Li-Min Chen, Emanuel I. Cooper, Steven Lippy, Lingyan Song, Chia-Jung Hsu, Sheng-Hung Tu, Chieh Ju Wang
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Patent number: 10428271Abstract: Compositions useful for the selective removal of titanium nitride and/or photoresist etch residue materials relative to insulating materials from a microelectronic device having same thereon. The removal compositions contain at least one oxidant, one etchant, and one activator to enhance the etch rate of titanium nitride.Type: GrantFiled: August 28, 2014Date of Patent: October 1, 2019Assignee: Entegris, Inc.Inventors: Emanuel I. Cooper, Li-Min Chen, Steven Lippy, Chia-Jung Hsu, Sheng-hung Tu, Chieh Ju Wang
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Publication number: 20180204764Abstract: The disclosure relates to a cleaning composition that aids in the removal of post-etch residues and aluminum-containing material, e.g., aluminum oxide, in the production of semiconductors that utilize an aluminum-containing etch stop layer. The compositions have a high selectivity for post-etch residue and aluminum-containing materials relative to low-k dielectric materials, cobalt-containing materials and other metals on the microelectronic device.Type: ApplicationFiled: January 17, 2018Publication date: July 19, 2018Inventors: Emanuel I. Cooper, Makonnen Payne, WonLae Kim, Eric Hong, Sheng-Hung Tu, Chieh Ju Wang, Chia-Jung Hsu
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Publication number: 20160200975Abstract: Compositions useful for the selective removal of titanium nitride and/or photoresist etch residue materials relative to insulating materials from a microelectronic device having same thereon. The removal compositions contain at least one oxidant, one etchant, and one activator to enhance the etch rate of titanium nitride.Type: ApplicationFiled: August 28, 2014Publication date: July 14, 2016Inventors: Enamuel I. COOPER, Li-Min CHEN, Steven LIPPY, Chia-Jung HSU, Sheng-hung TU, Chieh Ju WANG
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Publication number: 20160032186Abstract: Semi-aqueous compositions useful for the selective removal of titanium nitride and/or photoresist etch residue materials relative to metal conducting, e.g., tungsten and copper, and insulating materials from a microelectronic device having same thereon. The semi-aqueous compositions contain at least one oxidant, at least one etchant, and at least one organic solvent, may contain various corrosion inhibitors to ensure selectivity.Type: ApplicationFiled: March 4, 2014Publication date: February 4, 2016Inventors: Li-Min CHEN, Emanuel I. COOPER, Steven LIPPY, Lingyan SONG, Chia-Jung HSU, Sheng-Hung TU, Chieh Ju WANG
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Patent number: 8282842Abstract: A cleaning method following an opening etching is provided. First, a semiconductor substrate having a dielectric layer is provided. The hard mask layer includes at least a metal layer. The opening etch is then carried out to form at least an opening in the dielectric layer. A nitrogen (N2) treatment process is performed to clean polymer residues having carbon-fluorine (C—F) bonds remained in the opening. Finally, a wet cleaning process is performed.Type: GrantFiled: November 29, 2007Date of Patent: October 9, 2012Assignee: United Microelectronics Corp.Inventors: Chieh-Ju Wang, Jyh-Cherng Yau, Yu-Tsung Lai, Jiunn-Hsiung Liao
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Publication number: 20100018944Abstract: A patterning method is provided. A patterned photoresist layer is formed on a bottom anti-reflective coating (BARC), having therein an opening exposing a portion of the BARC. The patterned photoresist layer is treated with a first plasma-generating gas including a fluorocarbon species to form a polymer layer on the surface of the PR layer and the sidewall of the opening. The patterned photoresist layer is used as a mask to etch the BARC with a second plasma-generating gas, which includes Ar and H2 but no fluorocarbon species or oxygen-containing species, to remove the exposed portion of the BARC.Type: ApplicationFiled: July 25, 2008Publication date: January 28, 2010Applicant: United Microelectronics Corp.Inventors: Yu-Tsung Lai, Shih-Chang Chang, Chieh-Ju Wang, Jyh-Cherng Yau, Jiunn-Hsiung Liao
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Publication number: 20090142931Abstract: A cleaning method following an opening etching is provided. First, a semiconductor substrate having a dielectric layer is provided. The hard mask layer includes at least a metal layer. The opening etch is then carried out to form at least an opening in the dielectric layer. A nitrogen (N2) treatment process is performed to clean polymer residues having carbon-fluorine (C—F) bonds remained in the opening. Finally, a wet cleaning process is performed.Type: ApplicationFiled: November 29, 2007Publication date: June 4, 2009Inventors: Chieh-Ju Wang, Jyh-Cherng Yau, Yu-Tsung Lai, Jiunn-Hsiung Liao
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Patent number: 7430727Abstract: An HCG to HDL translation method, which can automatically generate VHDL codes. The method reads a hardware component graph (HCG) to find a start node and obtain a corresponding hardware component subgraph of the start node, analyzes all information of the start node to thereby add input and output components and generate a VHDL entity, determines types on all nodes of the hardware component, graph to thereby generate corresponding VHDL components and write associated information in a VHDL architecture, generates corresponding signal connections of VHDL components in accordance with edges of the hardware component graph, and outputs the VHDL entity and architecture to a file in a text form.Type: GrantFiled: May 25, 2006Date of Patent: September 30, 2008Assignee: Tatung CompanyInventors: Fu-Chiung Cheng, Shu-Ming Chang, Jian-Yi Chen, Chieh-Ju Wang, Chin-Tai Chou, Nian-Zhi Huang, Chi-Huam Shieh, Ping-Yun Wang, Li-Kai Chang
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Publication number: 20070157132Abstract: A process of automatically translating a high level programming language into a hardware description language (HDL), which can use a three-stage translation mechanism to generate the HDL codes corresponding to the functions described by the high level programming language. The first stage translates source codes coded by the high level programming language into an extended activity diagram (EAD). The second stage translates the EAD into a hardware component graph (HCG). The third stage generates the respective signal connections of HDL components according to all edges of the HCG, and outputs an HDL entity and architecture to a file in a string form, thereby completing the entire translation.Type: ApplicationFiled: June 22, 2006Publication date: July 5, 2007Applicant: Tatung CompanyInventors: Fu-Chiung Cheng, Jian-Yi Chen, Kuan-Yu Yan, Shin-Hway Yu, Kuan-Yu Chen, Chieh-Ju Wang, Shu-Ming Chang, Ping-Yun Wang, Li-Kai Chang, Chin-Tai Chou, Chi-Huam Shieh, Ming-Shiou Chiang, Nian-Zhi Huang, Hung-Chi Wu
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Publication number: 20070157147Abstract: An HCG to HDL translation method, which can automatically generate VHDL codes. The method reads a hardware component graph (HCG) to find a start node and obtain a corresponding hardware component subgraph of the start node, analyzes all information of the start node to thereby add input and output components and generate a VHDL entity, determines types on all nodes of the hardware component, graph to thereby generate corresponding VHDL components and write associated information in a VHDL architecture, generates corresponding signal connections of VHDL components in accordance with edges of the hardware component graph, and outputs the VHDL entity and architecture to a file in a text form.Type: ApplicationFiled: May 25, 2006Publication date: July 5, 2007Applicant: Tatung CompanyInventors: Fu-Chiung Cheng, Shu-Ming Chang, Jian-Yi Chen, Chieh-Ju Wang, Chin-Tai Chou, Nian-Zhi Huang, Chi-Huam Shieh, Ping-Yun Wang, Li-Kai Chang