Patents by Inventor Chien-Chang Chiang
Chien-Chang Chiang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240194758Abstract: A method for forming a gate all around transistor includes forming a plurality of semiconductor nanosheets. The method includes forming a cladding inner spacer between a source region of the transistor and a gate region of the transistor. The method includes forming sheet inner spacers between the semiconductor nanosheets in a separate deposition process from the cladding inner spacer.Type: ApplicationFiled: February 22, 2024Publication date: June 13, 2024Inventors: Zhi-Chang LIN, Kuan-Ting PAN, Shih-Cheng CHEN, Jung-Hung CHANG, Lo-Heng CHANG, Chien-Ning YAO, Kuo-Cheng CHIANG
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Publication number: 20240176093Abstract: An optical system affixed to an electronic apparatus is provided, including a first optical module, a second optical module, and a third optical module. The first optical module is configured to adjust the moving direction of a first light from a first moving direction to a second moving direction, wherein the first moving direction is not parallel to the second moving direction. The second optical module is configured to receive the first light moving in the second moving direction. The first light reaches the third optical module via the first optical module and the second optical module in sequence. The third optical module includes a first photoelectric converter configured to transform the first light into a first image signal.Type: ApplicationFiled: February 5, 2024Publication date: May 30, 2024Inventors: Chao-Chang HU, Chih-Wei WENG, Chia-Che WU, Chien-Yu KAO, Hsiao-Hsin HU, He-Ling CHANG, Chao-Hsi WANG, Chen-Hsien FAN, Che-Wei CHANG, Mao-Gen JIAN, Sung-Mao TSAI, Wei-Jhe SHEN, Yung-Ping YANG, Sin-Hong LIN, Tzu-Yu CHANG, Sin-Jhong SONG, Shang-Yu HSU, Meng-Ting LIN, Shih-Wei HUNG, Yu-Huai LIAO, Mao-Kuo HSU, Hsueh-Ju LU, Ching-Chieh HUANG, Chih-Wen CHIANG, Yu-Chiao LO, Ying-Jen WANG, Shu-Shan CHEN, Che-Hsiang CHIU
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Publication number: 20240170556Abstract: A method for forming a semiconductor structure is provided. The method includes forming a spacer layer along a first fin structure and a second fin structure, etching a first portion of the spacer layer and the first fin structure to form first fin spacers and a first recess between the first fin spacers, etching a second portion of the spacer layer and the second fin structure to form second fin spacers and a second recess between the second fin spacers, and forming a first source/drain feature in the first recess and a second source/drain feature in the second recess. The second fin structure is wider than the first fin structure. The first fin spacers have a first height, and the second fin spacers have a second height that is greater than the first height.Type: ApplicationFiled: February 20, 2023Publication date: May 23, 2024Inventors: Shih-Cheng CHEN, Zhi-Chang LIN, Jung-Hung CHANG, Chien-Ning YAO, Tsung-Han CHUANG, Kuo-Cheng CHIANG
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Publication number: 20240170337Abstract: The present disclosure describes a semiconductor structure with a dielectric liner. The semiconductor structure includes a substrate and a fin structure on the substrate. The fin structure includes a stacked fin structure, a fin bottom portion below the stacked fin structure, and an isolation layer between the stacked fin structure and the bottom fin portion. The semiconductor structure further includes a dielectric liner in contact with an end of the stacked fin structure and a spacer structure in contact with the dielectric liner.Type: ApplicationFiled: January 30, 2024Publication date: May 23, 2024Applicant: Taiwan Semiconductor Manufacturing Company Ltd.Inventors: Zhi-Chang LIN, Shih-Cheng CHEN, Kuo-Cheng CHIANG, Kuan-Ting PAN, Jung-Hung CHANG, Lo-Heng CHANG, Chien Ning YAO
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Publication number: 20240142749Abstract: An optical element driving mechanism is provided and includes a fixed assembly, a first movable assembly and a first driving assembly. The first movable assembly is configured to connect a first optical element, and the first movable assembly is movable relative to the fixed assembly. The first driving assembly is configured to drive the first movable assembly to move relative to the fixed assembly in a first dimension.Type: ApplicationFiled: January 4, 2024Publication date: May 2, 2024Inventors: Chao-Chang HU, Chen-Hsien FAN, Chih-Wen CHIANG, Chien-Yu KAO
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Patent number: 11967594Abstract: A semiconductor device structure, along with methods of forming such, are described. The structure includes a stack of semiconductor layers spaced apart from and aligned with each other, a first source/drain epitaxial feature in contact with a first one or more semiconductor layers of the stack of semiconductor layers, and a second source/drain epitaxial feature disposed over the first source/drain epitaxial feature. The second source/drain epitaxial feature is in contact with a second one or more semiconductor layers of the stack of semiconductor layers. The structure further includes a first dielectric material disposed between the first source/drain epitaxial feature and the second source/drain epitaxial feature and a first liner disposed between the first source/drain epitaxial feature and the second source/drain epitaxial feature. The first liner is in contact with the first source/drain epitaxial feature and the first dielectric material.Type: GrantFiled: August 10, 2022Date of Patent: April 23, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Shih-Cheng Chen, Zhi-Chang Lin, Jung-Hung Chang, Lo Heng Chang, Chien Ning Yao, Kuo-Cheng Chiang, Chih-Hao Wang
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Publication number: 20240111125Abstract: An optical element driving mechanism is provided and includes a fixed assembly, a first movable assembly and a first driving assembly. The first movable assembly is configured to connect a first optical element, and the first movable assembly is movable relative to the fixed assembly. The first driving assembly is configured to drive the first movable assembly to move relative to the fixed assembly in a first dimension.Type: ApplicationFiled: October 5, 2023Publication date: April 4, 2024Inventors: Chao-Chang HU, Chen-Hsien FAN, Chih-Wen CHIANG, Chien-Yu KAO
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Patent number: 11934027Abstract: An optical system affixed to an electronic apparatus is provided, including a first optical module, a second optical module, and a third optical module. The first optical module is configured to adjust the moving direction of a first light from a first moving direction to a second moving direction, wherein the first moving direction is not parallel to the second moving direction. The second optical module is configured to receive the first light moving in the second moving direction. The first light reaches the third optical module via the first optical module and the second optical module in sequence. The third optical module includes a first photoelectric converter configured to transform the first light into a first image signal.Type: GrantFiled: June 21, 2022Date of Patent: March 19, 2024Assignee: TDK TAIWAN CORP.Inventors: Chao-Chang Hu, Chih-Wei Weng, Chia-Che Wu, Chien-Yu Kao, Hsiao-Hsin Hu, He-Ling Chang, Chao-Hsi Wang, Chen-Hsien Fan, Che-Wei Chang, Mao-Gen Jian, Sung-Mao Tsai, Wei-Jhe Shen, Yung-Ping Yang, Sin-Hong Lin, Tzu-Yu Chang, Sin-Jhong Song, Shang-Yu Hsu, Meng-Ting Lin, Shih-Wei Hung, Yu-Huai Liao, Mao-Kuo Hsu, Hsueh-Ju Lu, Ching-Chieh Huang, Chih-Wen Chiang, Yu-Chiao Lo, Ying-Jen Wang, Shu-Shan Chen, Che-Hsiang Chiu
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Patent number: 11929287Abstract: The present disclosure describes a semiconductor structure with a dielectric liner. The semiconductor structure includes a substrate and a fin structure on the substrate. The fin structure includes a stacked fin structure, a fin bottom portion below the stacked fin structure, and an isolation layer between the stacked fin structure and the bottom fin portion. The semiconductor structure further includes a dielectric liner in contact with an end of the stacked fin structure and a spacer structure in contact with the dielectric liner.Type: GrantFiled: April 23, 2021Date of Patent: March 12, 2024Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Zhi-Chang Lin, Shih-Cheng Chen, Kuo-Cheng Chiang, Kuan-Ting Pan, Jung-Hung Chang, Lo-Heng Chang, Chien Ning Yao
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Patent number: 11916122Abstract: A method for forming a gate all around transistor includes forming a plurality of semiconductor nanosheets. The method includes forming a cladding inner spacer between a source region of the transistor and a gate region of the transistor. The method includes forming sheet inner spacers between the semiconductor nanosheets in a separate deposition process from the cladding inner spacer.Type: GrantFiled: July 8, 2021Date of Patent: February 27, 2024Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Zhi-Chang Lin, Kuan-Ting Pan, Shih-Cheng Chen, Jung-Hung Chang, Lo-Heng Chang, Chien-Ning Yao, Kuo-Cheng Chiang
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Publication number: 20200298218Abstract: A method of using biopolymer to synthesize titanium-containing silicon oxide material and applications thereof are disclosed. The method comprises steps: mixing a titanium source, a silicon source, an acid source, a base source, a biopolymer and a solvent to form an aqueous solution, and letting the aqueous solution react to form a semi-product; performing aging, solid-liquid separation and drying of the semi-product to obtain a dried solid; and performing calcination or extraction of the dried solid to obtain a titanium-containing silicon oxide material with a high specific surface area. The present invention adopts a biopolymer as the templating agent, which makes the fabrication process of titanium-containing silicon oxide material more environment-friendly. After calcination or extraction, the product still has superior catalytic activity, able to catalyze epoxidation of olefins and favorable for the production of epoxide.Type: ApplicationFiled: March 22, 2019Publication date: September 24, 2020Inventors: Yu-Chuan HSU, Pin-Hsuan HUANG, Chien-Chang CHIANG, Ying-Shih CHANG, Hsi-Chin TSAI, Hong-Ping LIN
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Patent number: 10780431Abstract: A method of using biopolymer to synthesize titanium-containing silicon oxide material and applications thereof are disclosed. The method comprises steps: mixing a titanium source, a silicon source, an acid source, a base source, a biopolymer and a solvent to form an aqueous solution, and letting the aqueous solution react to form a semi-product; performing aging, solid-liquid separation and drying of the semi-product to obtain a dried solid; and performing calcination or extraction of the dried solid to obtain a titanium-containing silicon oxide material with a high specific surface area. The present invention adopts a biopolymer as the templating agent, which makes the fabrication process of titanium-containing silicon oxide material more environment-friendly. After calcination or extraction, the product still has superior catalytic activity, able to catalyze epoxidation of olefins and favorable for the production of epoxide.Type: GrantFiled: March 22, 2019Date of Patent: September 22, 2020Assignee: ORIENTAL UNION CHEMICAL CORP.Inventors: Yu-Chuan Hsu, Pin-Hsuan Huang, Chien-Chang Chiang, Ying-Shih Chang, Hsi-Chin Tsai, Hong-Ping Lin
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Patent number: 10744493Abstract: A method of using biopolymer to synthesize titanium-containing silicon oxide material and applications includes mixing a titanium source, a silicon source, an acid source, a base source, a biopolymer and a solvent to form an aqueous solution, and letting the aqueous solution react to form a semi-product; performing aging, solid-liquid separation and drying of the semi-product to obtain a dried solid; and performing calcination or extraction of the dried solid to obtain a titanium-containing silicon oxide material with a high specific surface area. The present invention adopts a biopolymer as the templating agent, which makes the fabrication process of titanium-containing silicon oxide material more environment-friendly. After calcination or extraction, the product still has superior catalytic activity, able to catalyze epoxidation of olefins and favorable for the production of epoxide.Type: GrantFiled: November 6, 2019Date of Patent: August 18, 2020Assignee: Oriental Union Chemical Corp.Inventors: Yu-Chuan Hsu, Pin-Hsuan Huang, Chien-Chang Chiang, Ying-Shih Chang, Hsi-Chin Tsai, Hong-Ping Lin
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Patent number: 10214483Abstract: The present invention provides a titanium-silicalite molecular sieve and a method for preparing the same. The method includes the steps of preparing a mixture of a titanium source, a silicon source, a metal source selected from IIA to IVA elements and a template agent; heating the mixture to form a gel mixture; heating the gel mixture in a water bath; and calcining the gel mixture after the gel mixture in the water bath to form the titanium-silicalite molecular sieve. The present invention further provides a method for preparing cyclohexanone oxime by using the titanium-silicalite molecular sieve as the catalyst which results in high conversion rate, high selectivity and high usage efficiency of hydrogen peroxide.Type: GrantFiled: August 19, 2016Date of Patent: February 26, 2019Assignee: China Petrochemical Development CorporationInventors: Ya-Ping Chen, Cheng-Fa Hsieh, Pin-To Yao, Chien-Chang Chiang
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Publication number: 20160355467Abstract: The present invention provides a titanium-silicalite molecular sieve and a method for preparing the same. The method includes the steps of preparing a mixture of a titanium source, a silicon source, a metal source selected from IIA to IVA elements and a template agent; heating the mixture to form a gel mixture; heating the gel mixture in a water bath; and calcining the gel mixture after the gel mixture in the water bath to form the titanium-silicalite molecular sieve. The present invention further provides a method for preparing cyclohexanone oxime by using the titanium-silicalite molecular sieve as the catalyst which results in high conversion rate, high selectivity and high usage efficiency of hydrogen peroxide.Type: ApplicationFiled: August 19, 2016Publication date: December 8, 2016Inventors: Ya-Ping Chen, Cheng-Fa Hsieh, Pin-To Yao, Chien-Chang Chiang
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Patent number: 9434683Abstract: The present invention provides a titanium-silicalite molecular sieve and a method for preparing the same. The method includes the steps of preparing a mixture of a titanium source, a silicon source, a metal source selected from IIA to IVA elements and a template agent; heating the mixture to form a gel mixture; heating the gel mixture in a water bath; and calcining the gel mixture after the gel mixture in the water bath to form the titanium-silicalite molecular sieve. The present invention further provides a method for preparing cyclohexanone oxime by using the titanium-silicalite molecular sieve as the catalyst which results in high conversion rate, high selectivity and high usage efficiency of hydrogen peroxide.Type: GrantFiled: January 13, 2012Date of Patent: September 6, 2016Assignee: China Petrochemical Development CorporationInventors: Ya-Ping Chen, Cheng-Fa Hsieh, Pin-To Yao, Chien-Chang Chiang
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Patent number: 9371238Abstract: The present invention provides a titanium-silicalite molecular sieve and a method for preparing the same. The method includes the steps of preparing a mixture of a titanium source, a silicon source, a transition metal source, a template agent and water; heating the mixture to form a gel mixture; heating the gel mixture in a water bath; and calcining the gel mixture after the gel mixture in the water bath to form the titanium-silicalite molecular sieve. The present invention further provides a method for preparing cyclohexanone oxime by using the titanium-silicalite molecular sieve as the catalyst which results in high conversion rate, high selectivity and high usage efficiency of hydrogen peroxide.Type: GrantFiled: January 6, 2012Date of Patent: June 21, 2016Assignee: China Petrochemical Development CorporationInventors: Ya-Ping Chen, Cheng-Fa Hsieh, Pin-To Yao, Chien-Chang Chiang
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Patent number: 9133106Abstract: A method for producing a ketoxime is provided. The method includes the step of performing a reaction of a nitrogen-containing compound, ketone and an oxidant by using a titanium-silicon molecular sieve as a catalyst, so as to form the ketoxime, thereby increasing the yield and selectivity of the ketoxime.Type: GrantFiled: November 22, 2013Date of Patent: September 15, 2015Assignee: China Petrochemical Development CorporationInventors: Shih-Yao Chao, Cheng-Fa Hsieh, Chien-Chang Chiang, Pin-To Yao
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Patent number: 8772194Abstract: The present invention provides a method for preparing a large-sized titanium-silicalite molecular sieve, and a method for preparing cyclohexanone oxime using the large-sized titanium-silicalite molecular sieve. The method for preparing a large-sized titanium-silicalite molecular sieve includes preparing a mixture of a titanium source, a silicon source and a template agent; heating the mixture to form a gel mixture; mixing a colloidal silica with the gel mixture; heating the gel mixture mixed with the colloidal silica in a water bath; and calcining the gel mixture mixed with the colloidal silica. In the present invention, the average particle size of the large-sized titanium-silicalitem molecular sieve is more than 10 um, and the particle size distribution is centralized, so as to avoid the formation of titanium-oxygen-titanium bonding. The method for preparing cyclohexanone oxime using the large-sized titanium-silicalite molecular sieve results in high conversion rate, high selectivity and easy recovery.Type: GrantFiled: January 6, 2012Date of Patent: July 8, 2014Assignee: China Petrochemical Development Corporation, Taipei (Taiwan)Inventors: Shih-Yao Chao, Cheng-Fa Hsieh, Chien-Chang Chiang, Ya-Ping Chen, Pin-To Yao
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Publication number: 20140179951Abstract: A method for producing a ketoxime is provided. The method includes the step of performing a reaction of a nitrogen-containing compound, ketone and an oxidant by using a titanium-silicon molecular sieve as a catalyst, so as to form the ketoxime, thereby increasing the yield and selectivity of the ketoxime.Type: ApplicationFiled: November 22, 2013Publication date: June 26, 2014Applicant: China Petrochemical Development Corporation, Taipei (Taiwan)Inventors: Shih-Yao Chao, Cheng-Fa Hsieh, Chien-Chang Chiang, Pin-To Yao