Patents by Inventor CHIEN-HSIEN LIU

CHIEN-HSIEN LIU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Overlay measuring apparatus
    Patent number: 11829078
    Abstract: The present application provides an overlay measuring apparatus, adapted to determine relative positions of two or more successive patterned layers of a device. The overlay measuring apparatus includes a stage and an imaging assembly. The device is placed on the stage. The imaging assembly includes a plurality of optical heads and a plurality of overlay marks assembled on the optical heads. The relative positions of the two or more successive patterned layers of the device are determined using light reflected from the device and passing through the overlay mark mounted on the respective optical head.
    Type: Grant
    Filed: February 25, 2022
    Date of Patent: November 28, 2023
    Assignee: NANYA TECHNOLOGY CORPORATION
    Inventor: Chien-Hsien Liu
  • METHOD AND SYSTEM OF OPERATING OVERLAY MEASURING
    Publication number: 20230273590
    Abstract: The present application provides an optical system and a method of operating an overlay measuring apparatus. The overlay measuring apparatus is adapted to determine relative positions of two or more successive patterned layers of a device. The overlay measuring apparatus includes a stage and an imaging assembly. The device is placed on the stage. The imaging assembly includes a plurality of optical heads and a plurality of overlay marks assembled on the optical heads. The relative positions of the two or more successive patterned layers of the device are determined using light reflected from the device and passing through the overlay mark mounted on the respective optical head.
    Type: Application
    Filed: February 25, 2022
    Publication date: August 31, 2023
    Inventor: Chien-Hsien LIU
  • OVERLAY MEASURING APPARATUS
    Publication number: 20230273530
    Abstract: The present application provides an overlay measuring apparatus, adapted to determine relative positions of two or more successive patterned layers of a device. The overlay measuring apparatus includes a stage and an imaging assembly. The device is placed on the stage. The imaging assembly includes a plurality of optical heads and a plurality of overlay marks assembled on the optical heads. The relative positions of the two or more successive patterned layers of the device are determined using light reflected from the device and passing through the overlay mark mounted on the respective optical head.
    Type: Application
    Filed: February 25, 2022
    Publication date: August 31, 2023
    Inventor: CHIEN-HSIEN LIU