Patents by Inventor Chien-Hung TSENG

Chien-Hung TSENG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11990111
    Abstract: A noise measuring device is provided. The noise measuring device includes a soundproof box, a sound receiving device, a holding device, and a driving device. The sound receiving device is disposed in the soundproof box. The holding device is disposed in the soundproof box and configured to hold a testing object. The driving device is connected with the soundproof box and configure to drive the soundproof box to rotate.
    Type: Grant
    Filed: August 16, 2021
    Date of Patent: May 21, 2024
    Assignee: ASUSTEK COMPUTER INC.
    Inventors: Sheng-Pin Su, Yuan-I Tseng, Che-Hung Lai, Chien-Yi Wang, Chuan-Te Chang
  • Publication number: 20240162402
    Abstract: A display device includes a circuit substrate, a plurality of pad sets and a plurality of light-emitting elements. The plurality of pad sets is disposed on the circuit substrate, and each pad set includes a first pad and a second pad surrounding the first pad. The plurality of light-emitting elements is disposed above the circuit substrate, and each light-emitting element includes a first electrode, a second electrode and a light-emitting stack between the first electrode and the second electrode, wherein the first electrode is electrically connected to the first pad, the second electrode is electrically connected to the second pad, and an orthographic projection of the second electrode on the circuit substrate is overlapped with an orthographic projection of the first pad on the circuit substrate.
    Type: Application
    Filed: December 28, 2022
    Publication date: May 16, 2024
    Applicant: AUO Corporation
    Inventors: Chia-Hui Pai, Wen-Hsien Tseng, Chien-Hung Kuo
  • Patent number: 11372343
    Abstract: A method of aligning a substrate within an apparatus. The method includes determining a substrate grid based on measurements of a plurality of targets, each at different locations on a substrate. The determining includes repetitions of updating the substrate grid after each measurement of a target, and using the updated grid to align a measurement of a subsequent target.
    Type: Grant
    Filed: February 14, 2020
    Date of Patent: June 28, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Henricus Martinus Johannes Van De Groes, Johannes Hubertus Antonius Van De Rijdt, Marcel Pieter Jacobus Peeters, Chien-Hung Tseng, Henricus Petrus Maria Pellemans
  • Publication number: 20220100107
    Abstract: A method of aligning a substrate within an apparatus. The method includes determining a substrate grid based on measurements of a plurality of targets, each at different locations on a substrate. The determining includes repetitions of updating the substrate grid after each measurement of a target, and using the updated grid to align a measurement of a subsequent target.
    Type: Application
    Filed: February 14, 2020
    Publication date: March 31, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Henricus Martinus Johannes VAN DE GROES, Johannes Hubertus Antonius VAN DE RIJDT, Marcel Pieter Jacobus PEETERS, Chien-Hung TSENG, Henricus Petrus Maria PELLEMANS
  • Patent number: 10551750
    Abstract: Disclosed is a process monitoring method, and an associated metrology apparatus.
    Type: Grant
    Filed: April 24, 2019
    Date of Patent: February 4, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Adam Jan Urbanczyk, Hans Van Der Laan, Grzegorz Grzela, Alberto Da Costa Assafrao, Chien-Hung Tseng, Jay Jianhui Chen
  • Publication number: 20190250520
    Abstract: Disclosed is a process monitoring method, and an associated metrology apparatus.
    Type: Application
    Filed: April 24, 2019
    Publication date: August 15, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Adam Jan URBANCZYK, Hans VAN DER LAAN, Grzegorz GRZELA, Alberto DA COSTA ASSAFRAO, Chien-Hung TSENG, Jay Jianhui CHEN
  • Patent number: 10310388
    Abstract: Disclosed is a process monitoring method, and an associated metrology apparatus. The method comprises: comparing measured target response spectral sequence data relating to the measurement response of actual targets to equivalent reference target response sequence data relating to a measurement response of the targets as designed; and performing a process monitoring action based on the comparison of said measured target response sequence data and reference target response sequence data. The method may also comprise determining stack parameters from the measured target response spectral sequence data and reference target response spectral sequence data.
    Type: Grant
    Filed: January 19, 2018
    Date of Patent: June 4, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Adam Urbanczyk, Hans Van Der Laan, Grzegorz Grzela, Alberto Da Costa Assafrao, Chien-Hung Tseng, Jay Jianhui Chen
  • Patent number: 10107761
    Abstract: An inspection apparatus including: a substrate holder configured to hold a substrate; an aperture device; and an optical system configured to direct a first measurement beam of radiation onto the substrate, the first measurement beam having a first intensity distribution, and configured to direct a second focusing beam of radiation onto the substrate at a same time as the first measurement beam is directed on the substrate, the second focusing beam having a second intensity distribution, wherein at least part of the second intensity distribution is spatially separated from the first intensity distribution at least at the substrate and/or the aperture device.
    Type: Grant
    Filed: December 21, 2016
    Date of Patent: October 23, 2018
    Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Yevgeniy Konstantinovich Shmarev, Stanislav Smirnov, Chien-Hung Tseng, Armand Eugene Albert Koolen
  • Publication number: 20180217508
    Abstract: Disclosed is a process monitoring method, and an associated metrology apparatus. The method comprises: comparing measured target response spectral sequence data relating to the measurement response of actual targets to equivalent reference target response sequence data relating to a measurement response of the targets as designed; and performing a process monitoring action based on the comparison of said measured target response sequence data and reference target response sequence data. The method may also comprise determining stack parameters from the measured target response spectral sequence data and reference target response spectral sequence data.
    Type: Application
    Filed: January 19, 2018
    Publication date: August 2, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Adam URBANCZYK, Hans Van Der Laan, Grzegorz Grzela, Alberto Da Costa Assafrao, Chien-Hung Tseng, Jay Jianhui Chen
  • Publication number: 20170191944
    Abstract: An inspection apparatus including: a substrate holder configured to hold a substrate; an aperture device; and an optical system configured to direct a first measurement beam of radiation onto the substrate, the first measurement beam having a first intensity distribution, and configured to direct a second focusing beam of radiation onto the substrate at a same time as the first measurement beam is directed on the substrate, the second focusing beam having a second intensity distribution, wherein at least part of the second intensity distribution is spatially separated from the first intensity distribution at least at the substrate and/or the aperture device.
    Type: Application
    Filed: December 21, 2016
    Publication date: July 6, 2017
    Applicants: ASML HOLDING N.V., ASML NETHERLANDS B.V.
    Inventors: Yevgeniy Konstantinovich SHMAREV, Stanislav SMIRNOV, Chien-Hung TSENG, Armand Eugene Albert KOOLEN