Abstract: A localized heating device includes a plasma deforming portion and a heating portion. The plasma deforming portion includes an inlet end having a circular hole, an outlet end having an elongated hole with a first length and a first width, and a channel smoothly connected with the circular hole and the elongated hole. The heating portion, disposed at the outlet end, includes two control covers spaced by a slot. The elongated hole and the slot being oppositely disposed with respect to the plasma deforming portion. A plasma flow provided by a plasma producing source being to enter the channel via the circular hole, then to flow through the elongated hole, and finally to reach the slot.

Abstract: A surface processing equipment using an energy beam including a measuring device, a gas source, an energy beam supply device, a multi-axis platform, and a processing device is provided. The measuring device measures a workpiece to obtain surface form information. The energy beam supply device receives a processing gas to form an energy beam. The energy beam supply device includes a rotating sleeve. Openings are on a bottom surface of the rotating sleeve. The rotating sleeve rotates along a rotation axis and supplies the energy beam from one of the openings to the workpiece. The processing device controls the gas source, the energy beam supply device, and the multi-axis platform according to the surface form information. Distances from each opening to the rotation axis are all different. The energy beam is formed into a beam shape or rings having different radii via a rotation of the energy beam supply device.

Abstract: A fluid introduction module for plasma system is adapted for being disposed in a plasma system and includes a rotating nozzle and a precursor supply device. The rotating nozzle includes a main flow channel, a plasma outlet located at an end of the main flow channel, a mixing flow channel that penetrates a side wall of the rotating nozzle and communicates with the main flow channel, an independent flow channel separated from the main flow channel, and a precursor independent outlet located at an end of the independent flow channel. The precursor supply device includes a fixed housing and a rotating bearing. The fixed housing is sleeved outside the rotating nozzle and includes a precursor inlet selectively communicating with either the mixing flow channel or the independent flow channel. The rotating bearing is disposed between the rotating nozzle and the fixed housing.

Abstract: A surface processing equipment using energy beam including a multi-axis platform, a surface profile measuring device, an energy beam generator and a computing device is provided. The multi-axis platform is configured to carry a workpiece and move the workpiece to the first position or the second position. The surface profile measuring device has a working area, and the first position is located on the working area. The surface profile measuring device is configured to measure the workpiece to obtain surface profile. The energy beam generator is configured to provide an energy beam to the workpiece for processing, and the second position is located on a transmission path of the energy beam. The computing device is connected to the surface profile measuring device and the energy beam generator. The computing device adjusts the energy beam generator according to the error profile.

Abstract: A plasma processing device includes an upper electrode assembly and a lower electrode assembly. The upper electrode assembly has a plurality of post electrodes, made of a conductive material, protruding individually out of one surface of the upper electrode assembly, and connected to a plasma source. A plasma deficiency area having no post electrode is disposed in a center portion of the upper electrode assembly. The plurality of post electrodes are disposed in a ringlike electrode distribution area surrounding concentrically the plasma deficiency area. The lower electrode assembly is rotatable, made of a conducting material, and covered by a dielectric material.

Abstract: The present invention relates to a plasma processing device, comprising: an upper electrode has a plurality of protruding posts which made by conducting material and protruded out of one surface of the upper electrode and connected to a plasma producing source and formed a plurality of circles that around a center, each circle has at least one protruding post, the surface of the upper electrode that has protruding posts is covered with dielectric material, a plurality of gas holes disposed between protruding posts and connected to working gas source; a rotatable lower electrode is made of conducting material and covered with dielectric material which has a carry surface facing the surface of the upper electrode that has protruding posts for carrying workpiece.

Abstract: An apparatus for coating a film in a container and a method for coating a film are provided. The apparatus includes a cylindrical housing having a containing space penetrating through both ends thereof; a first arc-shaped electrode and a second arc-shaped electrode surrounding and covering an outer side of the cylindrical housing with a gap formed between the first and second arc-shaped electrodes such that the first arc-shaped electrode is free from electrically connected to the second arc-shaped electrode; a first conductive ring and a second conductive ring surrounding on the first and second arc-shaped electrodes, respectively; an upper supporting seat and a lower supporting seat disposed at the both ends of the cylindrical housing, respectively, to form a sealed environment for the containing space; and a valve component furnished at the upper supporting seat and inserted into the container for providing a processing gas in a film-coating process.

Abstract: A plasma system comprises a first electrode which connecting to a power generator and a second electrode which is grounded and disposed corresponding to the first electrode, and a spacing between the first electrode and the second electrode. A conveying device transmits a substrate of non-conductive material into and through the spacing without touching the first electrode or the second electrode. A first gas-import device is positioned closed to the first electrode and comprises a plurality of first gas-import sections. A second gas-import device is positioned closed to the second electrode. A working gas imported into the spacing between the first electrode and the second electrode is stimulated by the power generator, and plasma is generated simultaneously on both sides of the substrate.

Abstract: An apparatus for coating a film in a container and a method for coating a film are provided. The apparatus includes a cylindrical housing having a containing space penetrating through both ends thereof; a first arc-shaped electrode and a second arc-shaped electrode surrounding and covering an outer side of the cylindrical housing with a gap formed between the first and second arc-shaped electrodes such that the first arc-shaped electrode is free from electrically connected to the second arc-shaped electrode; a first conductive ring and a second conductive ring surrounding on the first and second arc-shaped electrodes, respectively; an upper supporting seat and a lower supporting seat disposed at the both ends of the cylindrical housing, respectively, to form a sealed environment for the containing space; and a valve component furnished at the upper supporting seat and inserted into the container for providing a processing gas in a film-coating process.

Abstract: An electrode contamination-proof device includes a first electrode structure, a second electrode structure, a sacrificing layer, and scroll driving devices. The second electrode structure and the first electrode structure are oppositely disposed. The sacrificing layer being positioned between the first electrode structure and the second electrode structure is capable of movably and tightly clinging on the exterior surface of the first electrode structure. The scroll driving devices is capable of driving the sacrificing layer to scroll around the scroll driving device. Besides, a film coating system is also provided.

Abstract: A plasma device includes a dielectric barrier, a first electrode structure, a second electrode structure, and a third electrode structure. The dielectric barrier has an upstream terminal and a downstream terminal and defines a space, in which the first electrode structure is disposed. A gap with multiple widths is formed between the first electrode structure and the dielectric barrier. The dielectric barrier is located between the first electrode structure and the second electrode structure. The second electrode structure includes electrode blocks sequentially arranged from the upstream terminal to the downstream terminal. The dielectric barrier, the first electrode structure, and the second electrode structure are located on the same side of the third electrode structure located at the downstream terminal. A minimum distance between the electrode blocks and the third electrode structure is not less than a distance between the first electrode structure and the third electrode structure.

Abstract: A modular electrode device comprises a plurality of main bodies, a first electrode, at least one second electrode, at least one first connecting member and two second connecting members. Each main body has a side edge, an internal chamber and a gas inlet communicative in space between the chamber and the atmosphere. The first electrode is mounted at the side edge of one main body, while the in-serial second electrodes connected to one end of the first electrode are mounted at the side edges of the other main bodies. The main bodies are separated by the parallel third electrodes. The third, the second and the third electrodes are connected to each other. The first connecting member bridges in-serially the first electrode and the neighboring second electrode. The second connecting members are applied to both opposing end of the in-serial combination of the first and the second electrodes.

Abstract: A microplasma source and a sterilization system including the same are disclosed. The microplasma source includes: a microplasma-generating unit including: a gas transmission chamber having a first inlet and a first outlet wherein the first inlet is used to import a first gas; a protection and heat dissipation chamber of which a side is connected to the inner wall of the first outlet; a dielectric inner tube having a second inlet and a second outlet and penetrating through the protection and heat dissipation chamber, wherein the second inlet is communicated to the gas transmission chamber; an electrode arranged outside at the second outlet and located in the protection and heat dissipation chamber; and a hollow metal tube disposed in the gas transmission chamber and the dielectric inner tube and having a third inlet and a third outlet, wherein the third inlet is used to import a second gas.

Abstract: A plasma device includes a dielectric barrier, a first electrode structure, a second electrode structure, and a third electrode structure. The dielectric barrier has an upstream terminal and a downstream terminal and defines a space, in which the first electrode structure is disposed. A gap with multiple widths is formed between the first electrode structure and the dielectric barrier. The dielectric barrier is located between the first electrode structure and the second electrode structure. The second electrode structure includes electrode blocks sequentially arranged from the upstream terminal to the downstream terminal. The dielectric barrier, the first electrode structure, and the second electrode structure are located on the same side of the third electrode structure located at the downstream terminal. A minimum distance between the electrode blocks and the third electrode structure is not less than a distance between the first electrode structure and the third electrode structure.

Abstract: A microplasma source and a sterilization system including the same are disclosed. The microplasma source includes: a microplasma-generating unit including: a gas transmission chamber having a first inlet and a first outlet wherein the first inlet is used to import a first gas; a protection and heat dissipation chamber of which a side is connected to the inner wall of the first outlet; a dielectric inner tube having a second inlet and a second outlet and penetrating through the protection and heat dissipation chamber, wherein the second inlet is communicated to the gas transmission chamber; an electrode arranged outside at the second outlet and located in the protection and heat dissipation chamber; and a hollow metal tube disposed in the gas transmission chamber and the dielectric inner tube and having a third inlet and a third outlet, wherein the third inlet is used to import a second gas.