Patents by Inventor CHIHIRO TACHINO

CHIHIRO TACHINO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240150698
    Abstract: A cell culture device includes a substrate, a wire disposed on a main surface of the substrate, an insulating film disposed on the main surface of the substrate and having a part that overlaps the wire, and the electrodes disposed on the insulating film and having a part that overlaps the wire. The insulating film has a contact hole at a position overlapping the wire and the electrode. A plurality of grooves are formed on at least the surface of a part of the electrode that overlaps the contact hole.
    Type: Application
    Filed: October 25, 2023
    Publication date: May 9, 2024
    Inventors: Chihiro TACHINO, Tomoko TERANISHI, Satoshi IHIDA, Takeshi HARA
  • Publication number: 20230323266
    Abstract: A cell culture substrate includes a base, a first segment disposed on the base and occupying a part of one surface of the cell culture substrate, and a second segment disposed on the base and occupying another part of the one surface. The second segment is formed of a metal material and thus has a relatively higher surface free energy than the first segment formed of an inorganic material. The second segment is disposed such that a percentage of an area of the second segment in a total area of the first segment and the second segment increases in a gradation direction (first direction) along the one surface.
    Type: Application
    Filed: March 17, 2023
    Publication date: October 12, 2023
    Inventors: Chihiro TACHINO, Takeshi HARA, Tomoko TERANISHI, Satoshi IHIDA
  • Publication number: 20230243774
    Abstract: A cell signal measurement electrode plate includes a first transistor including a gate terminal connected to a first selection line and a source terminal connected to a second selection line, a second transistor including a gate terminal connected to a drain terminal of the first transistor, a source terminal connected to an electrode, and a drain terminal connected to a common wiring line, and a first capacitor including one capacitance electrode connected to the drain terminal of the first transistor and another capacitance electrode connected to a capacitance element potential fixing wiring line.
    Type: Application
    Filed: April 21, 2021
    Publication date: August 3, 2023
    Inventors: FUMITOSHI YASUO, KENICHI KITOH, TOMOKO TERANISHI, CHIHIRO TACHINO
  • Patent number: 11577245
    Abstract: An electrowetting device includes a first substrate, a plurality of first electrodes formed on the first substrate, a dielectric layer formed on the plurality of first electrodes, a first water-repellent layer formed on the dielectric layer, a second substrate, a second electrode formed on the second substrate, and a second water-repellent layer formed on the second electrode. The first substrate and the second substrate are arranged with a gap between the first water-repellent layer and the second water-repellent layer. The first electrode includes an indium oxide-zinc oxide layer, the dielectric layer includes a silicon nitride layer, and the silicon nitride layer is formed directly on the indium oxide-zinc oxide layer.
    Type: Grant
    Filed: September 6, 2019
    Date of Patent: February 14, 2023
    Assignee: SHARP KABUSHIKI KAISHA
    Inventors: Chihiro Tachino, Kazuya Tsujino, Atsushi Hachiya
  • Publication number: 20230023499
    Abstract: A cell culture apparatus includes: a substrate having a first surface; a pair of structures each having a wall surface intersecting the first surface, the wall surfaces facing each other; and an electrode disposed on the first surface and traversing a space between the wall surfaces, the electrode and each of the wail surfaces forming an angle other than 90 degrees.
    Type: Application
    Filed: July 1, 2022
    Publication date: January 26, 2023
    Inventors: Manabu DAIO, TOMOKO TERANISHI, Satoshi IHIDA, CHIHIRO TACHINO
  • Publication number: 20200078790
    Abstract: An electrowetting device includes a first substrate, a plurality of first electrodes formed on the first substrate, a dielectric layer formed on the plurality of first electrodes, a first water-repellent layer formed on the dielectric layer, a second substrate, a second electrode formed on the second substrate, and a second water-repellent layer formed on the second electrode. The first substrate and the second substrate are arranged with a gap between the first water-repellent layer and the second water-repellent layer. The first electrode includes an indium oxide-zinc oxide layer, the dielectric layer includes a silicon nitride layer, and the silicon nitride layer is formed directly on the indium oxide-zinc oxide layer.
    Type: Application
    Filed: September 6, 2019
    Publication date: March 12, 2020
    Inventors: CHIHIRO TACHINO, KAZUYA TSUJINO, ATSUSHI HACHIYA