Patents by Inventor Chikako Takatoh

Chikako Takatoh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240050991
    Abstract: A cleaning apparatus for cleaning member has a member cleaning part 30 that cleans a cleaning member 10 that cleans a substrate W; and a measurement part 20 that measures a degree of cleanliness of the cleaning member 10 cleaned by the member cleaning part 30.
    Type: Application
    Filed: December 14, 2021
    Publication date: February 15, 2024
    Inventors: Megumi UNO, Akira FUKUNAGA, Chikako TAKATOH, Yumiko NAKAMURA
  • Publication number: 20240024928
    Abstract: A cleaning apparatus performing cleaning treatment for a washing tool used for substrate washing by causing the washing tool to contact with a cleaning member while supplying a washing liquid to the washing tool includes a liquid extraction unit that extracts the washing liquid remaining in the washing tool or the washing liquid flowing out from the washing tool in the cleaning treatment, a color reaction unit that applies an iodine color reaction to the washing liquid extracted by the liquid extraction unit, and a determination unit that detects a coloration degree of the washing liquid subjected to the iodine color reaction and determines whether or not cleaning of the washing tool is completed based on the detected coloration degree.
    Type: Application
    Filed: July 28, 2021
    Publication date: January 25, 2024
    Inventors: Megumi UNO, Akira FUKUNAGA, Chikako TAKATOH, Yumiko NAKAMURA
  • Publication number: 20240011821
    Abstract: A machine learning apparatus (4) generates a learning model (6) to be used in a sliding-surface diagnosis apparatus (1A) for diagnosing a condition of sliding surfaces of a fixed-side sliding member and a rotation-side sliding member. The machine learning apparatus (4) includes: a learning-data memory (41) configured to store learning data including input data containing at least data on motor current value in a predetermined period, data on contact electric resistance in the predetermined period, and data on vibration (AE wave or acceleration) in the predetermined period; a machine learning section (42) configured to input the learning data to the learning model (6) to cause the learning model (6) to learn a correlation between the input data and diagnostic information of the sliding surfaces; and a learned-model memory (43) configured to store the learning model (6) that has learned by the machine learning section (42).
    Type: Application
    Filed: September 24, 2021
    Publication date: January 11, 2024
    Applicants: EBARA CORPORATION, UNIVERSITY OF FUKUI
    Inventors: Chikako TAKATOH, Yumiko NAKAMURA, Kazuhiko SUGIYAMA, Tomomi HONDA
  • Publication number: 20210384881
    Abstract: In a method for determining cleanliness of a cleaning member that contacts a substrate and with which scrub cleaning is performed, the method includes a first step of self-cleaning a cleaning member by releasing contaminants from the cleaning member into a cleaning liquid, and a second step of bringing a self-cleaning discharged liquid into contact with an electrode of a crystal oscillator, attaching the contaminants contained in the discharged liquid onto the electrode of the crystal oscillator, then measuring a frequency response of the crystal oscillator in which the contaminants are attached onto the electrode, and determining cleanliness of the cleaning member based on the measured frequency response.
    Type: Application
    Filed: May 18, 2021
    Publication date: December 9, 2021
    Inventors: Chikako Takatoh, Megumi Uno, Masahito Abe, Toshiya Kon, Yumiko Nakamura, Shohei Shima
  • Publication number: 20210039142
    Abstract: There is provided a substrate cleaning apparatus capable of highly effective self-cleaning of a cleaning tool in a short time period. The substrate cleaning apparatus includes a cleaning tool for cleaning a substrate while in contact with a surface of the substrate, a self-cleaning member for self-cleaning the cleaning tool while in contact with the cleaning tool, a rotation mechanism for rotating the cleaning tool, and a holding mechanism for holding the cleaning tool, the holding mechanism being capable of pressing the cleaning tool against the substrate and pressing the cleaning tool against the self-cleaning member.
    Type: Application
    Filed: February 18, 2019
    Publication date: February 11, 2021
    Applicant: Ebara Corporation
    Inventors: Chikako TAKATOH, Akira FUKUNAGA, Masamitsu KURASHITA, Megumi UNO, Satomi HAMADA
  • Patent number: 9242339
    Abstract: A polishing apparatus polishes a surface of a substrate by pressing the substrate against a polishing pad on a polishing table. The polishing apparatus includes a polishing liquid supply nozzle for supplying a polishing liquid onto the polishing pad, a polishing liquid storage mechanism disposed on the polishing pad for storing the polishing liquid on the polishing pad by damming the polishing liquid, and a polishing liquid sensor for measuring a physical quantity representing the freshness of the polishing liquid stored by the polishing liquid storage mechanism. The polishing apparatus further includes a freshness measuring instrument for calculating the freshness of the stored polishing liquid from the physical quantity measured by the polishing liquid sensor, and a freshness controller for controlling supply conditions of the polishing liquid or storage state of the polishing liquid, based on the freshness of the polishing liquid that is determined by the freshness measuring instrument.
    Type: Grant
    Filed: March 10, 2014
    Date of Patent: January 26, 2016
    Assignee: Ebara Corporation
    Inventors: Hisanori Matsuo, Yoshihiro Mochizuki, Chikako Takatoh, Tadashi Obo
  • Publication number: 20150346088
    Abstract: A method for judging polishing performance of a polishing liquid, which can judge freshness of a slurry by measuring a component concentration or a physical quantity corresponding to the component concentration of the slurry after polishing and by evaluating an accelerator component and an inhibitor component of the slurry is disclosed. The polishing performance judging method of a polishing liquid judges polishing performance of a polishing liquid containing an accelerator for promoting dissolution of an object to be polished and an inhibitor for inhibiting dissolution of the object to be polished. The method includes analyzing a polishing waste liquid by spectroscopy, selecting a plurality of wavelengths from wavelengths which can distinguish the accelerator, the inhibitor, and a complex compound of the accelerator and a metal to be polished, and measuring absorbance at the selected plurality of wavelengths to thereby judge the polishing performance of the polishing liquid.
    Type: Application
    Filed: May 29, 2015
    Publication date: December 3, 2015
    Inventors: Chikako TAKATOH, Yumiko NAKAMURA, Tadashi OBO, Hisanori MATSUO
  • Publication number: 20140273753
    Abstract: A polishing apparatus polishes a surface of a substrate by pressing the substrate against a polishing pad on a polishing table. The polishing apparatus includes a polishing liquid supply nozzle for supplying a polishing liquid onto the polishing pad, a polishing liquid storage mechanism disposed on the polishing pad for storing the polishing liquid on the polishing pad by damming the polishing liquid, and a polishing liquid sensor for measuring a physical quantity representing the freshness of the polishing liquid stored by the polishing liquid storage mechanism. The polishing apparatus further includes a freshness measuring instrument for calculating the freshness of the stored polishing liquid from the physical quantity measured by the polishing liquid sensor, and a freshness controller for controlling supply conditions of the polishing liquid or storage state of the polishing liquid, based on the freshness of the polishing liquid that is determined by the freshness measuring instrument.
    Type: Application
    Filed: March 10, 2014
    Publication date: September 18, 2014
    Inventors: Hisanori MATSUO, Yoshihiro MOCHIZUKI, Chikako TAKATOH, Tadashi OBO
  • Publication number: 20070065826
    Abstract: A cationic dye compound having novel uses, the cationic dye compound being capable of conveniently and rapidly detecting a nucleic acid double strand, and a detection method using the cationic dye compound are provided. This invention relates to a cationic dye compound for detecting a nucleic acid double strand, comprising: a cation group and a chromophore coupled to said cation group, wherein said chromophore has a heteropolycyclic structure containing a nitrogen atom and said cationic dye compound is capable of helically binding onto said nucleic acid double strand.
    Type: Application
    Filed: September 6, 2004
    Publication date: March 22, 2007
    Applicant: EBARA CORPORATION
    Inventors: Chikako Takatoh, Kazuyoshi Takeda, Hirokazu Sato, Takayuki Saito, Takuya Matsumoto, Tomoji Kawai