Abstract: Provided is a method for depositing a fluorine-doped silicon oxide film on the surface of a substrate made of a material comprising at least 50 mass % of an ethylene/tetrafluoroethylene copolymer. This method comprises flowing a mixed gas into between electrodes, exposing the mixed gas to electric power applied between the electrodes so that the electrical power density between the electrodes becomes from 0.5 to 1.1 W/cm3 to cause discharge, and forming plasma of the mixed gas and depositing the fluorine-doped silicon oxide film on the surface of the substrate. In this method, the mixed gas for forming the fluorine-doped silicon oxide film comprises silicon tetrafluoride, oxygen and a hydrocarbon, the atomic ratio of oxygen atoms to carbon atoms (O/C) is from 1 to 10, and the atomic ratio of oxygen atoms to silicon atoms (O/Si) is from 1.7 to 25 in the mixed gas.

Abstract: The present invention relates to a method for production of a synthetic quartz glass having a fluorine concentration of 1,000 ppm by mass or higher, comprising the following steps (a) to (c): (a) depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass-forming material onto a substrate, to thereby form a porous glass body; (b) maintaining the porous glass body in a reaction vessel under an elemental fluorine (F2)-containing atmosphere of a pressure of Pb1 and a temperature of 400° C. or lower, and followed by maintaining in the reaction vessel under condition of a pressure Pb2 lower than the pressure Pb1 and a temperature of 400° C. or lower, to thereby obtain a fluorine-containing porous glass body; and (c) heating the fluorine-containing porous glass body in a vitrification furnace to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body.

Abstract: The present invention relates to a method for production of a synthetic quartz glass having a fluorine concentration of 1,000 ppm by mass or higher, comprising the following processes steps (a) to (c): (a) depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass-forming material onto a substrate, to thereby form a porous glass body; (b) maintaining the porous glass body in a reaction vessel under an elemental fluorine (F2)-containing atmosphere of 400° C. or lower, to thereby obtain a fluorine-containing porous glass body; and (c) heating the fluorine-containing porous glass body in a vitrification furnace to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body, wherein, in step (b), elemental fluorine (F2) is continuously or intermittently supplied to the reaction vessel and the gas in the reaction vessel is continuously or intermittently discharged from the reaction vessel.

Abstract: The present invention relates to a process for production of a synthetic quartz glass having a fluorine concentration of 1,000 mass ppm or more, the process comprising: (a) a step of depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass forming raw material onto a substrate, to thereby form a porous glass body; (b) a step of keeping the porous glass body in a reaction vessel that is filled with elemental fluorine (F2) or a mixed gas comprising elemental fluorine (F2) diluted with an inert gas and contains a solid metal fluoride, to thereby obtain a fluorine-containing porous glass body; and (c) a step of heating the fluorine-containing porous glass body to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body.

Abstract: The present invention is to provide a synthetic quartz glass body having a high light transmittance. The present invention provides a synthetic quartz glass body having pores in a surface part thereof.

Abstract: The present invention is to provide a synthetic quartz glass body having a high light transmittance. The present invention provides a synthetic quartz glass body having pores in a surface part thereof.

Abstract: The present invention relates to an optical member including a TiO2-containing silica glass having: a TiO2 concentration of from 3 to 10% by mass; a Ti3+ concentration of 100 wt ppm or less; a thermal expansion coefficient at from 0 to 100° C., CTE0-100, of 0±150 ppb/° C.; and an internal transmittance in the wavelength range of 400 to 700 nm per a thickness of 1 mm, T400-700, of 80% or more, in which the optical member has a ratio of variation of Ti3+ concentration to an average value of the Ti3+ concentration, ?Ti3+/Ti3+, on an optical use surface, is 0.2 or less.

Abstract: The present invention is to provide a synthetic quartz glass body having a high light transmittance. The present invention provides a synthetic quartz glass body having pores in a surface part thereof.

Abstract: To provide a novel fluorination treatment method whereby the surface of oxide glass can be treated for fluorination at low cost and with excellent adhesiveness. A method for treating the surface of oxide glass, which comprises contacting the surface of oxide glass with a gas of a fluorinating agent or a mixed gas having a fluorinating agent diluted with an inert gas, wherein the fluorinating agent is an elemental fluorine, or a fluorine compound capable of cleaving a bond between an oxygen atom and a metal atom in the framework of the oxide glass and forming a bond between a fluorine atom and the metal atom; and the concentration of hydrogen fluoride at the surface of oxide glass with which the fluorinating agent is in contact, is controlled to be at most 1 mol %.

Abstract: To provide a method for producing a fluoropolymer excellent in adhesion to a substrate and film strength. A method for producing a fluoropolymer thin film, which comprises forming a fluoropolymer thin film on a substrate by a physical vapor deposition method using, as an evaporation source, a fluoropolymer having a fluorinated aliphatic ring structure in its main chain and having a weight average molecular weight of from 3,000 to 80,000.

Abstract: To provide an ethylene/tetrafluoroethylene (ETFE) copolymer molded product of which the surface has a high hydrophilicity and which is excellent in the light transmission property; and a method for producing the molded product. A method for producing an ETFE copolymer molded product comprising a substrate 12 made of a material containing at least 50 mass % of an ETFE copolymer, and a fluorine-doped silicon oxide film 14 formed on the surface of the substrate 12, characterized by supplying electric power between electrodes so that the electrical power density between the electrodes becomes from 0.5 to 1.1 W/cm3 to cause discharge and thus to plasmatize the following mixed gas so as to form the silicon oxide film 14 on the substrate 12: Mixed gas comprising silicon tetrafluoride, oxygen and a hydrocarbon, wherein the atomic ratio of oxygen atoms to carbon atoms (O/C) is from 1 to 10, and the atomic ratio of oxygen atoms to silicon atoms (O/Si) is from 1.7 to 25.

Abstract: To provide an ethylene/tetrafluoroethylene copolymer molding, and a method for producing the ethylene/tetrafluoroethylene copolymer molding in which the operation for the production is simple, and the surface can be highly hydrophilized. An ethylene/tetrafluoroethylene copolymer molding is produced by conducting discharge treatment of a surface of a molding to be treated, under reduced pressure in a mixed gas containing oxygen and a hydrocarbon, said surface being made of a material comprising an ethylene/tetrafluoroethylene copolymer as the main component.

Abstract: To provide a process for producing a fluorocarbon film, which is capable of constantly forming a fluorocarbon film excellent in durability and functionality. The process for producing a fluorocarbon film of the present invention is a process for producing a fluorocarbon film at least a part of which is chemically bonded to a substrate surface, and is characterized by conducting, in sequence, step (a) for applying plasma to a substrate surface in a continuous or pulse manner to form active points on the substrate surface and step (b) for applying plasma to the substrate surface in a continuous or pulse manner in the presence of a gas of a fluorocompound represented by the formula CxFy and/or CxFyOz under such a condition that active species impinge on the substrate surface at a relatively lower collision energy than in step (a).